DE68918117D1 - Verfahren zur Herstellung von Flachdruckplatten. - Google Patents

Verfahren zur Herstellung von Flachdruckplatten.

Info

Publication number
DE68918117D1
DE68918117D1 DE68918117T DE68918117T DE68918117D1 DE 68918117 D1 DE68918117 D1 DE 68918117D1 DE 68918117 T DE68918117 T DE 68918117T DE 68918117 T DE68918117 T DE 68918117T DE 68918117 D1 DE68918117 D1 DE 68918117D1
Authority
DE
Germany
Prior art keywords
production
printing plates
planographic printing
planographic
plates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68918117T
Other languages
English (en)
Other versions
DE68918117T2 (de
Inventor
Tadao C O Fuji Photo Fi Toyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Application granted granted Critical
Publication of DE68918117D1 publication Critical patent/DE68918117D1/de
Publication of DE68918117T2 publication Critical patent/DE68918117T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE1989618117 1988-01-07 1989-01-04 Verfahren zur Herstellung von Flachdruckplatten. Expired - Fee Related DE68918117T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP170188A JPH01177541A (ja) 1988-01-07 1988-01-07 平版印刷版の製造方法

Publications (2)

Publication Number Publication Date
DE68918117D1 true DE68918117D1 (de) 1994-10-20
DE68918117T2 DE68918117T2 (de) 1995-01-12

Family

ID=11508845

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1989618117 Expired - Fee Related DE68918117T2 (de) 1988-01-07 1989-01-04 Verfahren zur Herstellung von Flachdruckplatten.

Country Status (3)

Country Link
EP (1) EP0323836B1 (de)
JP (1) JPH01177541A (de)
DE (1) DE68918117T2 (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2573668B2 (ja) * 1988-08-16 1997-01-22 富士写真フイルム株式会社 感光性平版印刷版現像処理方法および装置
DE3937442A1 (de) * 1989-11-10 1991-05-16 Nokia Unterhaltungselektronik Verfahren zum bereichsweisen entfernen von schichten von einem substrat
US5766826A (en) * 1996-10-11 1998-06-16 Eastman Kodak Company Alkaline developing composition and method of use to process lithographic printing plates
US5897985A (en) * 1996-10-11 1999-04-27 Kodak Polychrome Graphics, Llc Potassium silicate developing composition and method of use to process lithographic printing plates
US6083662A (en) * 1997-05-30 2000-07-04 Kodak Polychrome Graphics Llc Methods of imaging and printing with a positive-working infrared radiation sensitive printing plate
US5811221A (en) * 1997-05-30 1998-09-22 Kodak Polychrome Graphics, Llc Alkaline developing composition and method of use to process lithographic printing plates
DE19755295A1 (de) * 1997-12-12 1999-06-17 Agfa Gevaert Ag Entwickler für bestrahlte, strahlungsempfindliche Aufzeichnungsmaterialien
US6100016A (en) * 1999-09-14 2000-08-08 Agfa-Gevaert Ag Developer for irradiated, radiation-sensitive recording materials
EP1093024A1 (de) * 1999-10-11 2001-04-18 Fuji Photo Film B.V. Ein wässriger Entwickler für Flachdruckplatten
JP4040539B2 (ja) 2003-06-13 2008-01-30 東京応化工業株式会社 レジスト用現像液組成物およびレジストパターンの形成方法
JP4040544B2 (ja) * 2003-06-27 2008-01-30 東京応化工業株式会社 レジスト用現像液組成物およびレジストパターンの形成方法
US7883833B2 (en) 2007-06-20 2011-02-08 Eastman Kodak Company Use of highly alkaline developer regenerator composition
US8846299B2 (en) 2010-03-26 2014-09-30 Eastman Kodak Company Methods for preparing lithograhic printing plates
US20110236832A1 (en) 2010-03-26 2011-09-29 Celin Savariar-Hauck Lithographic processing solutions and methods of use
CN114517094B (zh) * 2020-11-20 2023-08-22 苏州阿特斯阳光电力科技有限公司 一种丝网印刷电化学刻蚀用浆料及其制备方法和应用

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2318322A (en) * 1940-08-07 1943-05-04 Meulendyke Charles Edmund Method for producing lacquer or varnish resist
GB1102952A (en) * 1963-09-05 1968-02-14 Howson Ltd W H Processing of presensitized photolithographic printing plates
US3608464A (en) * 1968-05-14 1971-09-28 Western Litho Plate & Supply Apparatus for developing lithographic plates
FR2172914A1 (en) * 1972-02-25 1973-10-05 Visual Graphics Corp Thickening photographic processing solns - with guar gum and/or carragheen
CA1251350A (en) * 1983-06-17 1989-03-21 James M. Lewis High contrast photoresist developer
US4613561A (en) * 1984-10-17 1986-09-23 James Marvin Lewis Method of high contrast positive O-quinone diazide photoresist developing using pretreatment solution

Also Published As

Publication number Publication date
EP0323836B1 (de) 1994-09-14
DE68918117T2 (de) 1995-01-12
EP0323836A2 (de) 1989-07-12
JPH01177541A (ja) 1989-07-13
EP0323836A3 (en) 1990-02-07

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee