DE69201013T2 - Gegenstand oder System mit optischer Vorrichtung auf Siliziumbasis. - Google Patents

Gegenstand oder System mit optischer Vorrichtung auf Siliziumbasis.

Info

Publication number
DE69201013T2
DE69201013T2 DE69201013T DE69201013T DE69201013T2 DE 69201013 T2 DE69201013 T2 DE 69201013T2 DE 69201013 T DE69201013 T DE 69201013T DE 69201013 T DE69201013 T DE 69201013T DE 69201013 T2 DE69201013 T2 DE 69201013T2
Authority
DE
Germany
Prior art keywords
silicon
optical device
based optical
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69201013T
Other languages
English (en)
Other versions
DE69201013D1 (de
Inventor
Janet Lee Benton
Dale Conrad Jacobson
Lionel Cooper Kimerling
Jurgen Michel
John Milo Poate
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
AT&T Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by AT&T Corp filed Critical AT&T Corp
Application granted granted Critical
Publication of DE69201013D1 publication Critical patent/DE69201013D1/de
Publication of DE69201013T2 publication Critical patent/DE69201013T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/26—Materials of the light emitting region
    • H01L33/34—Materials of the light emitting region containing only elements of Group IV of the Periodic Table
    • H01L33/343—Materials of the light emitting region containing only elements of Group IV of the Periodic Table characterised by the doping materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/50—Amplifier structures not provided for in groups H01S5/02 - H01S5/30
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/16—Solid materials
    • H01S3/1601—Solid materials characterised by an active (lasing) ion
    • H01S3/1603—Solid materials characterised by an active (lasing) ion rare earth
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/16—Solid materials
    • H01S3/1601—Solid materials characterised by an active (lasing) ion
    • H01S3/1603—Solid materials characterised by an active (lasing) ion rare earth
    • H01S3/1608—Solid materials characterised by an active (lasing) ion rare earth erbium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/16—Solid materials
    • H01S3/1628—Solid materials characterised by a semiconducting matrix
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/305—Structure or shape of the active region; Materials used for the active region characterised by the doping materials used in the laser structure
    • H01S5/3068—Structure or shape of the active region; Materials used for the active region characterised by the doping materials used in the laser structure deep levels

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
  • Semiconductor Lasers (AREA)
  • Led Devices (AREA)
  • Led Device Packages (AREA)
  • Optical Integrated Circuits (AREA)
DE69201013T 1991-06-06 1992-05-29 Gegenstand oder System mit optischer Vorrichtung auf Siliziumbasis. Expired - Fee Related DE69201013T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/711,243 US5107538A (en) 1991-06-06 1991-06-06 Optical waveguide system comprising a rare-earth Si-based optical device

Publications (2)

Publication Number Publication Date
DE69201013D1 DE69201013D1 (de) 1995-02-09
DE69201013T2 true DE69201013T2 (de) 1995-05-11

Family

ID=24857304

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69201013T Expired - Fee Related DE69201013T2 (de) 1991-06-06 1992-05-29 Gegenstand oder System mit optischer Vorrichtung auf Siliziumbasis.

Country Status (4)

Country Link
US (1) US5107538A (de)
EP (1) EP0517440B1 (de)
JP (1) JPH081974B2 (de)
DE (1) DE69201013T2 (de)

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DE4011860A1 (de) * 1990-04-09 1991-10-10 Siemens Ag Halbleiterelement mit einer silizium-schicht
JP2755471B2 (ja) * 1990-06-29 1998-05-20 日立電線株式会社 希土類元素添加光導波路及びその製造方法
FR2675592B1 (fr) * 1991-04-22 1993-07-16 Alcatel Nv Amplificateur optique dans le domaine spectral 1,26 a 1,34 mum.
FR2685135B1 (fr) * 1991-12-16 1994-02-04 Commissariat A Energie Atomique Mini cavite laser pompee optiquement, son procede de fabrication et laser utilisant cette cavite.
US5322813A (en) * 1992-08-31 1994-06-21 International Business Machines Corporation Method of making supersaturated rare earth doped semiconductor layers by chemical vapor deposition
US5384795A (en) * 1992-09-15 1995-01-24 Texas Instruments Incorporated Light emission from rare-earth element-doped CaF2 thin films by electroluminescence
US5369657A (en) * 1992-09-15 1994-11-29 Texas Instruments Incorporated Silicon-based microlaser by doped thin films
JPH06203959A (ja) * 1992-09-30 1994-07-22 Texas Instr Inc <Ti> エレクトロルミネセンスによりＮｄでドープされたＣａＦ２薄膜から発光せしめる装置および方法
US5259046A (en) * 1992-10-01 1993-11-02 At&T Bell Laboratories Article comprising an optical waveguide containing a fluorescent dopant
JPH087286B2 (ja) * 1992-10-28 1996-01-29 インターナショナル・ビジネス・マシーンズ・コーポレイション 光導波管装置
US5757986A (en) * 1993-09-21 1998-05-26 Bookham Technology Limited Integrated silicon pin diode electro-optic waveguide
US5491768A (en) * 1994-07-27 1996-02-13 The Chinese University Of Hong Kong Optical waveguide employing modified gallium arsenide
EP0799495A4 (de) * 1994-11-10 1999-11-03 Lawrence Semiconductor Researc Silizium-germanium-kohlenstoff-verbindung und dazugehörende prozesse
US5548128A (en) * 1994-12-14 1996-08-20 The United States Of America As Represented By The Secretary Of The Air Force Direct-gap germanium-tin multiple-quantum-well electro-optical devices on silicon or germanium substrates
KR100377716B1 (ko) * 1998-02-25 2003-03-26 인터내셔널 비지네스 머신즈 코포레이션 광학적 방사를 위해 희토류 원소로 도핑된 실리콘 구조체 및 방사방법
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FR2789496B1 (fr) * 1999-02-10 2002-06-07 Commissariat Energie Atomique Dispositif emetteur et guide de lumiere, avec une region active de silicium contenant des centres radiatifs, et procede de fabrication d'un tel dispositif
US6255669B1 (en) * 1999-04-23 2001-07-03 The University Of Cincinnati Visible light emitting device formed from wide band gap semiconductor doped with a rare earth element
US6351578B1 (en) * 1999-08-06 2002-02-26 Gemfire Corporation Thermo-optic switch having fast rise-time
EP1081812A1 (de) * 1999-09-02 2001-03-07 STMicroelectronics S.r.l. Halbleitervorrichtung für elektro-optische Verwendung, Herstellungsverfahren und Halbleiterlaservorrichtung
JP2001135893A (ja) 1999-11-05 2001-05-18 Fujitsu Ltd 光半導体装置および光電子集積回路装置
WO2001040540A1 (en) * 1999-12-02 2001-06-07 Tegal Corporation Improved reactor with heated and textured electrodes and surfaces
US6506289B2 (en) 2000-08-07 2003-01-14 Symmorphix, Inc. Planar optical devices and methods for their manufacture
US6734453B2 (en) * 2000-08-08 2004-05-11 Translucent Photonics, Inc. Devices with optical gain in silicon
US6533907B2 (en) 2001-01-19 2003-03-18 Symmorphix, Inc. Method of producing amorphous silicon for hard mask and waveguide applications
US7469558B2 (en) * 2001-07-10 2008-12-30 Springworks, Llc As-deposited planar optical waveguides with low scattering loss and methods for their manufacture
US7404877B2 (en) * 2001-11-09 2008-07-29 Springworks, Llc Low temperature zirconia based thermal barrier layer by PVD
US7290407B1 (en) 2001-12-19 2007-11-06 Jesse Chienhua Shan Triangle-shaped planar optical waveguide having reduced scattering loss
US20030175142A1 (en) * 2002-03-16 2003-09-18 Vassiliki Milonopoulou Rare-earth pre-alloyed PVD targets for dielectric planar applications
US7378356B2 (en) * 2002-03-16 2008-05-27 Springworks, Llc Biased pulse DC reactive sputtering of oxide films
US6884327B2 (en) 2002-03-16 2005-04-26 Tao Pan Mode size converter for a planar waveguide
US6924510B2 (en) 2002-05-06 2005-08-02 Intel Corporation Silicon and silicon/germanium light-emitting device, methods and systems
US8021778B2 (en) 2002-08-09 2011-09-20 Infinite Power Solutions, Inc. Electrochemical apparatus with barrier layer protected substrate
US20070264564A1 (en) 2006-03-16 2007-11-15 Infinite Power Solutions, Inc. Thin film battery on an integrated circuit or circuit board and method thereof
US8445130B2 (en) 2002-08-09 2013-05-21 Infinite Power Solutions, Inc. Hybrid thin-film battery
US8236443B2 (en) 2002-08-09 2012-08-07 Infinite Power Solutions, Inc. Metal film encapsulation
US8394522B2 (en) 2002-08-09 2013-03-12 Infinite Power Solutions, Inc. Robust metal film encapsulation
US7993773B2 (en) 2002-08-09 2011-08-09 Infinite Power Solutions, Inc. Electrochemical apparatus with barrier layer protected substrate
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WO2004021532A1 (en) * 2002-08-27 2004-03-11 Symmorphix, Inc. Optically coupling into highly uniform waveguides
US7205662B2 (en) 2003-02-27 2007-04-17 Symmorphix, Inc. Dielectric barrier layer films
US7238628B2 (en) * 2003-05-23 2007-07-03 Symmorphix, Inc. Energy conversion and storage films and devices by physical vapor deposition of titanium and titanium oxides and sub-oxides
US8728285B2 (en) 2003-05-23 2014-05-20 Demaray, Llc Transparent conductive oxides
WO2005002006A2 (en) * 2003-06-30 2005-01-06 University Of Cincinnati Impurity-based electroluminescent waveguide amplifier and methods for amplifying optical data signals
JP2005116709A (ja) * 2003-10-06 2005-04-28 Sony Corp 半導体集積回路装置およびその製造方法
US7440180B2 (en) * 2004-02-13 2008-10-21 Tang Yin S Integration of rare-earth doped amplifiers into semiconductor structures and uses of same
JP2006133723A (ja) * 2004-10-08 2006-05-25 Sony Corp 光導波モジュール及び光・電気複合デバイス、並びにこれらの製造方法
US7959769B2 (en) 2004-12-08 2011-06-14 Infinite Power Solutions, Inc. Deposition of LiCoO2
CN101931097B (zh) 2004-12-08 2012-11-21 希莫菲克斯公司 LiCoO2的沉积
WO2006066611A1 (en) * 2004-12-24 2006-06-29 Pirelli & C. S.P.A. Photodetector in germanium on silicon
US7037806B1 (en) * 2005-02-09 2006-05-02 Translucent Inc. Method of fabricating silicon-on-insulator semiconductor substrate using rare earth oxide or rare earth nitride
JP2006332137A (ja) * 2005-05-23 2006-12-07 Nippon Telegr & Teleph Corp <Ntt> 発光素子
US7838133B2 (en) * 2005-09-02 2010-11-23 Springworks, Llc Deposition of perovskite and other compound ceramic films for dielectric applications
CN101313395B (zh) * 2005-12-09 2013-03-27 山米奎普公司 通过植入碳团簇制造半导体装置的系统和方法
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JP5705549B2 (ja) 2008-01-11 2015-04-22 インフィニット パワー ソリューションズ， インコーポレイテッド 薄膜電池および他のデバイスのための薄膜カプセル化
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Also Published As

Publication number Publication date
EP0517440A3 (en) 1993-01-20
JPH081974B2 (ja) 1996-01-10
EP0517440A2 (de) 1992-12-09
US5107538A (en) 1992-04-21
EP0517440B1 (de) 1994-12-28
DE69201013D1 (de) 1995-02-09
JPH05175592A (ja) 1993-07-13

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Free format text: BLUMBACH, KRAMER & PARTNER, 65193 WIESBADEN

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