DE69201782T2 - Optoelektronische Vorrichtung mit sehr niedrigem Serienwiderstand. - Google Patents
Optoelektronische Vorrichtung mit sehr niedrigem Serienwiderstand.Info
- Publication number
- DE69201782T2 DE69201782T2 DE69201782T DE69201782T DE69201782T2 DE 69201782 T2 DE69201782 T2 DE 69201782T2 DE 69201782 T DE69201782 T DE 69201782T DE 69201782 T DE69201782 T DE 69201782T DE 69201782 T2 DE69201782 T2 DE 69201782T2
- Authority
- DE
- Germany
- Prior art keywords
- optoelectronic device
- series resistance
- low series
- low
- optoelectronic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/227—Buried mesa structure ; Striped active layer
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/227—Buried mesa structure ; Striped active layer
- H01S5/2275—Buried mesa structure ; Striped active layer mesa created by etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/305—Structure or shape of the active region; Materials used for the active region characterised by the doping materials used in the laser structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/305—Structure or shape of the active region; Materials used for the active region characterised by the doping materials used in the laser structure
- H01S5/3072—Diffusion blocking layer, i.e. a special layer blocking diffusion of dopants
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/323—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/3235—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength longer than 1000 nm, e.g. InP-based 1300 nm and 1500 nm lasers
- H01S5/32391—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength longer than 1000 nm, e.g. InP-based 1300 nm and 1500 nm lasers based on In(Ga)(As)P
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/34306—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength longer than 1000nm, e.g. InP based 1300 and 1500nm lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/3434—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer comprising at least both As and P as V-compounds
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Nanotechnology (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biophysics (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Crystallography & Structural Chemistry (AREA)
- Geometry (AREA)
- Semiconductor Lasers (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR9115000A FR2684805B1 (fr) | 1991-12-04 | 1991-12-04 | Dispositif optoelectronique a tres faible resistance serie. |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69201782D1 DE69201782D1 (de) | 1995-04-27 |
DE69201782T2 true DE69201782T2 (de) | 1995-10-05 |
Family
ID=9419648
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69201782T Expired - Fee Related DE69201782T2 (de) | 1991-12-04 | 1992-12-01 | Optoelektronische Vorrichtung mit sehr niedrigem Serienwiderstand. |
Country Status (4)
Country | Link |
---|---|
US (1) | US5306923A (de) |
EP (1) | EP0545808B1 (de) |
DE (1) | DE69201782T2 (de) |
FR (1) | FR2684805B1 (de) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6664605B1 (en) * | 2000-03-31 | 2003-12-16 | Triquint Technology Holding Co. | Dopant diffusion blocking for optoelectronic devices using InAlAs and/or InGaAlAs |
JP2003234541A (ja) * | 2001-12-07 | 2003-08-22 | Furukawa Electric Co Ltd:The | 分布帰還型半導体レーザ素子 |
US11726332B2 (en) | 2009-04-27 | 2023-08-15 | Digilens Inc. | Diffractive projection apparatus |
US11300795B1 (en) | 2009-09-30 | 2022-04-12 | Digilens Inc. | Systems for and methods of using fold gratings coordinated with output couplers for dual axis expansion |
US10795160B1 (en) | 2014-09-25 | 2020-10-06 | Rockwell Collins, Inc. | Systems for and methods of using fold gratings for dual axis expansion |
US11320571B2 (en) * | 2012-11-16 | 2022-05-03 | Rockwell Collins, Inc. | Transparent waveguide display providing upper and lower fields of view with uniform light extraction |
WO2012136970A1 (en) | 2011-04-07 | 2012-10-11 | Milan Momcilo Popovich | Laser despeckler based on angular diversity |
EP2748670B1 (de) | 2011-08-24 | 2015-11-18 | Rockwell Collins, Inc. | Tragbare datenanzeige |
WO2016020630A2 (en) | 2014-08-08 | 2016-02-11 | Milan Momcilo Popovich | Waveguide laser illuminator incorporating a despeckler |
WO2013163347A1 (en) | 2012-04-25 | 2013-10-31 | Rockwell Collins, Inc. | Holographic wide angle display |
US9933684B2 (en) | 2012-11-16 | 2018-04-03 | Rockwell Collins, Inc. | Transparent waveguide display providing upper and lower fields of view having a specific light output aperture configuration |
WO2016042283A1 (en) | 2014-09-19 | 2016-03-24 | Milan Momcilo Popovich | Method and apparatus for generating input images for holographic waveguide displays |
US10437064B2 (en) | 2015-01-12 | 2019-10-08 | Digilens Inc. | Environmentally isolated waveguide display |
US9632226B2 (en) | 2015-02-12 | 2017-04-25 | Digilens Inc. | Waveguide grating device |
US10126552B2 (en) | 2015-05-18 | 2018-11-13 | Rockwell Collins, Inc. | Micro collimator system and method for a head up display (HUD) |
US11366316B2 (en) | 2015-05-18 | 2022-06-21 | Rockwell Collins, Inc. | Head up display (HUD) using a light pipe |
US10690916B2 (en) | 2015-10-05 | 2020-06-23 | Digilens Inc. | Apparatus for providing waveguide displays with two-dimensional pupil expansion |
CN108780224B (zh) | 2016-03-24 | 2021-08-03 | 迪吉伦斯公司 | 用于提供偏振选择性全息波导装置的方法和设备 |
EP3433658B1 (de) | 2016-04-11 | 2023-08-09 | DigiLens, Inc. | Holographische wellenleitervorrichtung für die projektion von strukturiertem licht |
US11513350B2 (en) | 2016-12-02 | 2022-11-29 | Digilens Inc. | Waveguide device with uniform output illumination |
WO2018129398A1 (en) | 2017-01-05 | 2018-07-12 | Digilens, Inc. | Wearable heads up displays |
JP2022520472A (ja) | 2019-02-15 | 2022-03-30 | ディジレンズ インコーポレイテッド | 統合された格子を使用してホログラフィック導波管ディスプレイを提供するための方法および装置 |
EP3980825A4 (de) | 2019-06-07 | 2023-05-03 | Digilens Inc. | Wellenleiter mit durchlässigen und reflektierenden gittern sowie zugehörige herstellungsverfahren |
EP4022370A4 (de) | 2019-08-29 | 2023-08-30 | Digilens Inc. | Evakuierungs-bragg-gitter und herstellungsverfahren |
CN112542770B (zh) * | 2020-12-04 | 2021-10-15 | 苏州长光华芯光电技术股份有限公司 | 一种半导体器件及其制备方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5688388A (en) * | 1979-12-19 | 1981-07-17 | Matsushita Electric Ind Co Ltd | Semiconductor laser device |
US4479222A (en) * | 1982-04-27 | 1984-10-23 | The United States Of America As Represented By The Secretary Of The Air Force | Diffusion barrier for long wavelength laser diodes |
JPS61228684A (ja) * | 1985-04-02 | 1986-10-11 | Sumitomo Electric Ind Ltd | 半導体発光素子 |
JPS647667A (en) * | 1987-06-30 | 1989-01-11 | Shimadzu Corp | Light-emitting diode of edge emission type |
CA2008379C (en) * | 1989-01-24 | 1993-08-31 | Hajime Sakiyama | Semiconductor lasers |
JPH0449691A (ja) * | 1990-06-18 | 1992-02-19 | Mitsubishi Electric Corp | 可視光レーザダイオード |
JPH04100288A (ja) * | 1990-08-20 | 1992-04-02 | Denki Kagaku Kogyo Kk | 半導体レーザおよびその製造方法 |
JP2653562B2 (ja) * | 1991-02-05 | 1997-09-17 | 三菱電機株式会社 | 半導体レーザおよびその製造方法 |
JP2863648B2 (ja) * | 1991-04-16 | 1999-03-03 | 三菱電機株式会社 | 可視光半導体レーザ |
US5212705A (en) * | 1992-02-18 | 1993-05-18 | Eastman Kodak Company | AlAS Zn-stop diffusion layer in AlGaAs laser diodes |
-
1991
- 1991-12-04 FR FR9115000A patent/FR2684805B1/fr not_active Expired - Fee Related
-
1992
- 1992-11-23 US US07/980,263 patent/US5306923A/en not_active Expired - Lifetime
- 1992-12-01 DE DE69201782T patent/DE69201782T2/de not_active Expired - Fee Related
- 1992-12-01 EP EP92403237A patent/EP0545808B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE69201782D1 (de) | 1995-04-27 |
US5306923A (en) | 1994-04-26 |
FR2684805A1 (fr) | 1993-06-11 |
FR2684805B1 (fr) | 1998-08-14 |
EP0545808A1 (de) | 1993-06-09 |
EP0545808B1 (de) | 1995-03-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: AVANEX CORP.(N.D.GES.D.STAATES DELAWARE), FREMONT, |
|
8339 | Ceased/non-payment of the annual fee |