DE69132285D1 - Verfahren und Gerät zur Bilddateninspektion - Google Patents

Verfahren und Gerät zur Bilddateninspektion

Info

Publication number
DE69132285D1
DE69132285D1 DE69132285T DE69132285T DE69132285D1 DE 69132285 D1 DE69132285 D1 DE 69132285D1 DE 69132285 T DE69132285 T DE 69132285T DE 69132285 T DE69132285 T DE 69132285T DE 69132285 D1 DE69132285 D1 DE 69132285D1
Authority
DE
Germany
Prior art keywords
image data
data inspection
inspection
image
data
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69132285T
Other languages
English (en)
Other versions
DE69132285T2 (de
Inventor
Shogo Matsui
Kenichi Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Application granted granted Critical
Publication of DE69132285D1 publication Critical patent/DE69132285D1/de
Publication of DE69132285T2 publication Critical patent/DE69132285T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • G06T7/001—Industrial image inspection using an image reference approach
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F15/00—Digital computers in general; Data processing equipment in general
    • G06F15/02—Digital computers in general; Data processing equipment in general manually operated with input through keyboard and computation using a built-in program, e.g. pocket calculators
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95607—Inspecting patterns on the surface of objects using a comparative method
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30108—Industrial image inspection
    • G06T2207/30148—Semiconductor; IC; Wafer

Landscapes

  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Immunology (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Quality & Reliability (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Pathology (AREA)
  • General Engineering & Computer Science (AREA)
  • Computing Systems (AREA)
  • Computer Hardware Design (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Image Processing (AREA)
  • Image Analysis (AREA)
  • Length Measuring Devices By Optical Means (AREA)
DE69132285T 1990-11-05 1991-11-05 Verfahren und Gerät zur Bilddateninspektion Expired - Fee Related DE69132285T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29948190A JP2747105B2 (ja) 1990-11-05 1990-11-05 画像データ検証方法及び装置

Publications (2)

Publication Number Publication Date
DE69132285D1 true DE69132285D1 (de) 2000-08-10
DE69132285T2 DE69132285T2 (de) 2000-11-09

Family

ID=17873133

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69132285T Expired - Fee Related DE69132285T2 (de) 1990-11-05 1991-11-05 Verfahren und Gerät zur Bilddateninspektion

Country Status (5)

Country Link
US (1) US5850467A (de)
EP (1) EP0485274B1 (de)
JP (1) JP2747105B2 (de)
KR (1) KR960013357B1 (de)
DE (1) DE69132285T2 (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5795688A (en) * 1996-08-14 1998-08-18 Micron Technology, Inc. Process for detecting defects in photomasks through aerial image comparisons
US6076465A (en) * 1996-09-20 2000-06-20 Kla-Tencor Corporation System and method for determining reticle defect printability
US6400838B2 (en) * 1997-07-29 2002-06-04 Kabushiki Kaisha Toshiba Pattern inspection equipment, pattern inspection method, and storage medium storing pattern inspection program
US6466314B1 (en) * 1998-09-17 2002-10-15 Applied Materials, Inc. Reticle design inspection system
JP4206192B2 (ja) * 2000-11-09 2009-01-07 株式会社日立製作所 パターン検査方法及び装置
JP2000267254A (ja) * 1999-03-17 2000-09-29 Fujitsu Ltd パターンデータ検証方法及び記憶媒体
US6642529B1 (en) 2000-03-28 2003-11-04 Koninklijke Philips Electronics N.V. Methods for the automated testing of reticle feature geometries
DE10017333C2 (de) * 2000-04-07 2003-02-13 Pilz Gmbh & Co Schutzvorrichtung zum Absichern eines Gefahrenbereichs sowie Verfahren zum Überprüfen der Funktionssicherheit einer solchen
AU2001252223A1 (en) 2000-04-07 2001-10-23 Pilz Gmbh And Co. Protective device for safeguarding a dangerous area and method for verifying thefunctional reliability of such device
DE10017344C1 (de) * 2000-04-07 2001-11-29 Pilz Gmbh & Co Verfahren und Vorrichtung zum Überprüfen der Funktionssicherheit einer Bildaufnahmeeinheit
JP4044297B2 (ja) * 2001-03-29 2008-02-06 株式会社東芝 パターン欠陥検査装置
JP4275345B2 (ja) * 2002-01-30 2009-06-10 株式会社日立製作所 パターン検査方法及びパターン検査装置
US6850321B1 (en) * 2002-07-09 2005-02-01 Kla-Tencor Technologies Corporation Dual stage defect region identification and defect detection method and apparatus
US7271891B1 (en) * 2003-08-29 2007-09-18 Kla-Tencor Technologies Corporation Apparatus and methods for providing selective defect sensitivity
JP4824987B2 (ja) * 2005-10-28 2011-11-30 株式会社日立ハイテクノロジーズ パターンマッチング装置およびそれを用いた半導体検査システム
US7369236B1 (en) * 2006-10-31 2008-05-06 Negevtech, Ltd. Defect detection through image comparison using relative measures
JP4943304B2 (ja) 2006-12-05 2012-05-30 株式会社 Ｎｇｒ パターン検査装置および方法
JP4970101B2 (ja) * 2007-03-26 2012-07-04 大日本スクリーン製造株式会社 欠陥検出方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4589140A (en) * 1983-03-21 1986-05-13 Beltronics, Inc. Method of and apparatus for real-time high-speed inspection of objects for identifying or recognizing known and unknown portions thereof, including defects and the like
US4853967A (en) * 1984-06-29 1989-08-01 International Business Machines Corporation Method for automatic optical inspection analysis of integrated circuits
JPS61241996A (ja) * 1985-04-19 1986-10-28 株式会社日立製作所 パタ−ン発生方法
JPS61108134A (ja) * 1984-11-01 1986-05-26 Hitachi Ltd マスク検査装置
JPS61251705A (ja) * 1985-04-30 1986-11-08 Sumitomo Metal Ind Ltd パタ−ン検査方法及び装置
KR900007548B1 (ko) * 1985-10-04 1990-10-15 다이닛뽕스쿠링세이소오 가부시키가이샤 패턴 마스킹 방법 및 그 장치
US4809341A (en) * 1986-07-18 1989-02-28 Fujitsu Limited Test method and apparatus for a reticle or mask pattern used in semiconductor device fabrication
KR900001976A (ko) * 1988-07-07 1990-02-27 조재광 수압을 이용 수중량(중력)을 동력으로 바꾸는 장치
JPH02170279A (ja) * 1988-12-23 1990-07-02 Hitachi Ltd 被検査対象パターンの欠陥検出方法及びその装置
US5144681A (en) * 1989-03-31 1992-09-01 Dainnippon Screen Mfg. Co., Ltd. Method of and apparatus for inspecting conductive pattern on printed board
JP3132565B2 (ja) * 1989-08-30 2001-02-05 株式会社日立製作所 欠陥検査方法及びその装置

Also Published As

Publication number Publication date
EP0485274B1 (de) 2000-07-05
EP0485274A2 (de) 1992-05-13
EP0485274A3 (en) 1992-12-02
KR960013357B1 (ko) 1996-10-04
US5850467A (en) 1998-12-15
JP2747105B2 (ja) 1998-05-06
DE69132285T2 (de) 2000-11-09
JPH04261538A (ja) 1992-09-17
KR920010471A (ko) 1992-06-26

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee