DE69121258T2 - Verfahren zur Detektion von Lageabweichungen - Google Patents
Verfahren zur Detektion von LageabweichungenInfo
- Publication number
- DE69121258T2 DE69121258T2 DE1991621258 DE69121258T DE69121258T2 DE 69121258 T2 DE69121258 T2 DE 69121258T2 DE 1991621258 DE1991621258 DE 1991621258 DE 69121258 T DE69121258 T DE 69121258T DE 69121258 T2 DE69121258 T2 DE 69121258T2
- Authority
- DE
- Germany
- Prior art keywords
- detection
- position deviations
- deviations
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7073—Alignment marks and their environment
- G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2548990A JP2862307B2 (ja) | 1990-02-05 | 1990-02-05 | 位置ずれ検出方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69121258D1 DE69121258D1 (de) | 1996-09-19 |
DE69121258T2 true DE69121258T2 (de) | 1997-01-09 |
Family
ID=12167473
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE1991621258 Expired - Fee Related DE69121258T2 (de) | 1990-02-05 | 1991-02-04 | Verfahren zur Detektion von Lageabweichungen |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP0441578B1 (de) |
JP (1) | JP2862307B2 (de) |
DE (1) | DE69121258T2 (de) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109654994A (zh) * | 2019-01-07 | 2019-04-19 | 佛山市瑞创智能科技有限公司 | 一种移动感应器 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL8600638A (nl) * | 1986-03-12 | 1987-10-01 | Philips Nv | Inrichting voor het ten opzichte van elkaar uitrichten van een masker en een substraat. |
JP2546364B2 (ja) * | 1988-02-16 | 1996-10-23 | キヤノン株式会社 | 位置合わせ装置 |
-
1990
- 1990-02-05 JP JP2548990A patent/JP2862307B2/ja not_active Expired - Fee Related
-
1991
- 1991-02-04 DE DE1991621258 patent/DE69121258T2/de not_active Expired - Fee Related
- 1991-02-04 EP EP19910300894 patent/EP0441578B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE69121258D1 (de) | 1996-09-19 |
JPH03229104A (ja) | 1991-10-11 |
JP2862307B2 (ja) | 1999-03-03 |
EP0441578A2 (de) | 1991-08-14 |
EP0441578A3 (en) | 1992-04-22 |
EP0441578B1 (de) | 1996-08-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |