DE69115661D1 - Alcoxyalkylester als Löslichkeitinhibitoren für Phenolharze - Google Patents
Alcoxyalkylester als Löslichkeitinhibitoren für PhenolharzeInfo
- Publication number
- DE69115661D1 DE69115661D1 DE69115661T DE69115661T DE69115661D1 DE 69115661 D1 DE69115661 D1 DE 69115661D1 DE 69115661 T DE69115661 T DE 69115661T DE 69115661 T DE69115661 T DE 69115661T DE 69115661 D1 DE69115661 D1 DE 69115661D1
- Authority
- DE
- Germany
- Prior art keywords
- alcoxyalkyl
- esters
- phenolic resins
- solubility inhibitors
- inhibitors
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 150000002148 esters Chemical class 0.000 title 1
- 239000003112 inhibitor Substances 0.000 title 1
- 239000005011 phenolic resin Substances 0.000 title 1
- 229920001568 phenolic resin Polymers 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/111—Polymer of unsaturated acid or ester
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/618,212 US5085972A (en) | 1990-11-26 | 1990-11-26 | Alkoxyalkyl ester solubility inhibitors for phenolic resins |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69115661D1 true DE69115661D1 (de) | 1996-02-01 |
DE69115661T2 DE69115661T2 (de) | 1996-08-22 |
Family
ID=24476785
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69115661T Expired - Fee Related DE69115661T2 (de) | 1990-11-26 | 1991-10-28 | Alcoxyalkylester als Löslichkeitinhibitoren für Phenolharze |
Country Status (4)
Country | Link |
---|---|
US (1) | US5085972A (de) |
EP (1) | EP0488525B1 (de) |
JP (1) | JP2580418B2 (de) |
DE (1) | DE69115661T2 (de) |
Families Citing this family (33)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5225316A (en) * | 1990-11-26 | 1993-07-06 | Minnesota Mining And Manufacturing Company | An imagable article comprising a photosensitive composition comprising a polymer having acid labile pendant groups |
US6340552B1 (en) | 1990-12-27 | 2002-01-22 | Kabushiki Kaisha Toshiba | Photosensitive composition containing a dissolution inhibitor and an acid releasing compound |
JP2919142B2 (ja) * | 1990-12-27 | 1999-07-12 | 株式会社東芝 | 感光性組成物およびそれを用いたパターン形成方法 |
EP0599779A1 (de) * | 1992-10-29 | 1994-06-01 | OCG Microelectronic Materials AG | Hochauflösender negativ arbeitender Photoresist mit grossem Prozessspielraum |
US5372912A (en) * | 1992-12-31 | 1994-12-13 | International Business Machines Corporation | Radiation-sensitive resist composition and process for its use |
US5340699A (en) * | 1993-05-19 | 1994-08-23 | Eastman Kodak Company | Radiation-sensitive composition containing a resole resin and a novolac resin and use thereof in lithographic printing plates |
EP0672954B1 (de) * | 1994-03-14 | 1999-09-15 | Kodak Polychrome Graphics LLC | Strahlungsempfindliche Zusammensetzung, enthaltend ein Resolharz, ein Novolakharz, einen Infrarotabsorber und ein Triazin, und seine Verwendung in lithographischen Druckplatten |
ATE195590T1 (de) * | 1994-06-22 | 2000-09-15 | Ciba Sc Holding Ag | Positiv-photoresist |
US5466557A (en) * | 1994-08-29 | 1995-11-14 | Eastman Kodak Company | Radiation-sensitive composition containing a resole resin, a novolac resin, a latent bronsted acid, an infrared absorber and terephthalaldehyde and use thereof in lithographic printing plates |
US6165673A (en) * | 1995-12-01 | 2000-12-26 | International Business Machines Corporation | Resist composition with radiation sensitive acid generator |
RU2153986C2 (ru) | 1996-04-23 | 2000-08-10 | Хорселл Грэфик Индастриз Лимитед | Термочувствительная композиция и способ ее применения для изготовления литографической печатной формы |
US6090526A (en) * | 1996-09-13 | 2000-07-18 | Shipley Company, L.L.C. | Polymers and photoresist compositions |
US6117610A (en) * | 1997-08-08 | 2000-09-12 | Kodak Polychrome Graphics Llc | Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use |
US5919601A (en) * | 1996-11-12 | 1999-07-06 | Kodak Polychrome Graphics, Llc | Radiation-sensitive compositions and printing plates |
US6060222A (en) | 1996-11-19 | 2000-05-09 | Kodak Polcyhrome Graphics Llc | 1Postitve-working imaging composition and element and method of forming positive image with a laser |
US6090532A (en) * | 1997-03-21 | 2000-07-18 | Kodak Polychrome Graphics Llc | Positive-working infrared radiation sensitive composition and printing plate and imaging method |
US6063544A (en) * | 1997-03-21 | 2000-05-16 | Kodak Polychrome Graphics Llc | Positive-working printing plate and method of providing a positive image therefrom using laser imaging |
US5985524A (en) * | 1997-03-28 | 1999-11-16 | International Business Machines Incorporated | Process for using bilayer photoresist |
JP4159058B2 (ja) * | 1997-06-13 | 2008-10-01 | コニカミノルタホールディングス株式会社 | 画像形成材料及び画像形成方法 |
WO1999001796A2 (en) | 1997-07-05 | 1999-01-14 | Kodak Polychrome Graphics Llc | Pattern-forming methods |
GB9722861D0 (en) * | 1997-10-29 | 1997-12-24 | Horsell Graphic Ind Ltd | Improvements in relation to the manufacture of lithographic printing forms |
US6060217A (en) * | 1997-09-02 | 2000-05-09 | Kodak Polychrome Graphics Llc | Thermal lithographic printing plates |
US6261740B1 (en) | 1997-09-02 | 2001-07-17 | Kodak Polychrome Graphics, Llc | Processless, laser imageable lithographic printing plate |
TW473459B (en) * | 1998-12-10 | 2002-01-21 | Ibm | Method for forming transparent conductive film using chemically amplified resist |
US6124425A (en) * | 1999-03-18 | 2000-09-26 | American Dye Source, Inc. | Thermally reactive near infrared absorption polymer coatings, method of preparing and methods of use |
KR20010009339A (ko) * | 1999-07-09 | 2001-02-05 | 박찬구 | 카르복시산 유도체 및 그 제조방법 |
EP1072404B1 (de) * | 1999-07-30 | 2003-05-21 | Lastra S.P.A. | Infrarotstrahlungs- und wärme-empfindliche Zusammensetzung, und lithographische Druckplatte, die mit dieser Zusammensetzung beschichtet ist |
ATE240833T1 (de) | 1999-07-30 | 2003-06-15 | Lastra Spa | Infrarotstrahlungs- und wärme-empfindliche zusammensetzung, und lithographische druckplatte, die mit dieser zusammensetzung beschichtet ist |
CA2314520A1 (en) * | 1999-07-30 | 2001-01-30 | Domenico Tiefenthaler | Composition sensitive to ir radiation and to heat and lithographic plate coated therewith |
US6251559B1 (en) | 1999-08-03 | 2001-06-26 | Kodak Polychrome Graphics Llc | Heat treatment method for obtaining imagable coatings and imagable coatings |
US6706466B1 (en) | 1999-08-03 | 2004-03-16 | Kodak Polychrome Graphics Llc | Articles having imagable coatings |
US6787281B2 (en) | 2002-05-24 | 2004-09-07 | Kodak Polychrome Graphics Llc | Selected acid generating agents and their use in processes for imaging radiation-sensitive elements |
CN100440040C (zh) * | 2002-12-31 | 2008-12-03 | 北京师范大学 | 非重氮萘醌型阳图ps版感光组合物及阳图热敏ctp版成像组合物 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH621416A5 (de) * | 1975-03-27 | 1981-01-30 | Hoechst Ag | |
US4256828A (en) * | 1975-09-02 | 1981-03-17 | Minnesota Mining And Manufacturing Company | Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials |
US4708925A (en) * | 1984-12-11 | 1987-11-24 | Minnesota Mining And Manufacturing Company | Photosolubilizable compositions containing novolac phenolic resin |
EP0249139B2 (de) * | 1986-06-13 | 1998-03-11 | MicroSi, Inc. (a Delaware corporation) | Lackzusammensetzung und -anwendung |
DE3837513A1 (de) * | 1988-11-04 | 1990-05-10 | Basf Ag | Strahlungsempfindliches gemisch |
GB8923459D0 (en) * | 1989-10-18 | 1989-12-06 | Minnesota Mining & Mfg | Positive-acting photoresist compositions |
JPH03198059A (ja) * | 1989-12-27 | 1991-08-29 | Sony Corp | 感光性樹脂組成物 |
US4985332A (en) * | 1990-04-10 | 1991-01-15 | E. I. Du Pont De Nemours And Company | Resist material with carbazole diazonium salt acid generator and process for use |
JP2676981B2 (ja) * | 1990-06-01 | 1997-11-17 | 三菱電機株式会社 | 感光性樹脂組成物 |
JP2723350B2 (ja) * | 1990-09-27 | 1998-03-09 | 三菱電機株式会社 | 感光性樹脂組成物 |
-
1990
- 1990-11-26 US US07/618,212 patent/US5085972A/en not_active Expired - Lifetime
-
1991
- 1991-10-28 EP EP91309940A patent/EP0488525B1/de not_active Expired - Lifetime
- 1991-10-28 DE DE69115661T patent/DE69115661T2/de not_active Expired - Fee Related
- 1991-11-25 JP JP3309070A patent/JP2580418B2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JP2580418B2 (ja) | 1997-02-12 |
US5085972A (en) | 1992-02-04 |
DE69115661T2 (de) | 1996-08-22 |
EP0488525B1 (de) | 1995-12-20 |
EP0488525A1 (de) | 1992-06-03 |
JPH055985A (ja) | 1993-01-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |