DE69113929D1 - System für die Zufuhr reaktiver Gase von einer Gasquelle zu einer Vorrichtung. - Google Patents
System für die Zufuhr reaktiver Gase von einer Gasquelle zu einer Vorrichtung.Info
- Publication number
- DE69113929D1 DE69113929D1 DE69113929T DE69113929T DE69113929D1 DE 69113929 D1 DE69113929 D1 DE 69113929D1 DE 69113929 T DE69113929 T DE 69113929T DE 69113929 T DE69113929 T DE 69113929T DE 69113929 D1 DE69113929 D1 DE 69113929D1
- Authority
- DE
- Germany
- Prior art keywords
- gas source
- reactive gases
- supplying reactive
- supplying
- gases
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C13/00—Details of vessels or of the filling or discharging of vessels
- F17C13/04—Arrangement or mounting of valves
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C7/00—Methods or apparatus for discharging liquefied, solidified, or compressed gases from pressure vessels, not covered by another subclass
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C2201/00—Vessel construction, in particular geometry, arrangement or size
- F17C2201/01—Shape
- F17C2201/0104—Shape cylindrical
- F17C2201/0109—Shape cylindrical with exteriorly curved end-piece
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C2201/00—Vessel construction, in particular geometry, arrangement or size
- F17C2201/01—Shape
- F17C2201/0104—Shape cylindrical
- F17C2201/0119—Shape cylindrical with flat end-piece
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C2205/00—Vessel construction, in particular mounting arrangements, attachments or identifications means
- F17C2205/01—Mounting arrangements
- F17C2205/0123—Mounting arrangements characterised by number of vessels
- F17C2205/013—Two or more vessels
- F17C2205/0134—Two or more vessels characterised by the presence of fluid connection between vessels
- F17C2205/0146—Two or more vessels characterised by the presence of fluid connection between vessels with details of the manifold
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C2205/00—Vessel construction, in particular mounting arrangements, attachments or identifications means
- F17C2205/03—Fluid connections, filters, valves, closure means or other attachments
- F17C2205/0302—Fittings, valves, filters, or components in connection with the gas storage device
- F17C2205/0338—Pressure regulators
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C2221/00—Handled fluid, in particular type of fluid
- F17C2221/01—Pure fluids
- F17C2221/014—Nitrogen
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C2221/00—Handled fluid, in particular type of fluid
- F17C2221/01—Pure fluids
- F17C2221/016—Noble gases (Ar, Kr, Xe)
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C2227/00—Transfer of fluids, i.e. method or means for transferring the fluid; Heat exchange with the fluid
- F17C2227/01—Propulsion of the fluid
- F17C2227/0114—Propulsion of the fluid with vacuum injectors, e.g. venturi
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C2227/00—Transfer of fluids, i.e. method or means for transferring the fluid; Heat exchange with the fluid
- F17C2227/04—Methods for emptying or filling
- F17C2227/044—Methods for emptying or filling by purging
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C2270/00—Applications
- F17C2270/05—Applications for industrial use
- F17C2270/0518—Semiconductors
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/4238—With cleaner, lubrication added to fluid or liquid sealing at valve interface
- Y10T137/4245—Cleaning or steam sterilizing
- Y10T137/4259—With separate material addition
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/572,834 US5137047A (en) | 1990-08-24 | 1990-08-24 | Delivery of reactive gas from gas pad to process tool |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69113929D1 true DE69113929D1 (de) | 1995-11-23 |
DE69113929T2 DE69113929T2 (de) | 1996-04-11 |
Family
ID=24289556
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69113929T Expired - Fee Related DE69113929T2 (de) | 1990-08-24 | 1991-08-19 | System für die Zufuhr reaktiver Gase von einer Gasquelle zu einer Vorrichtung. |
Country Status (4)
Country | Link |
---|---|
US (1) | US5137047A (de) |
EP (1) | EP0473040B1 (de) |
DE (1) | DE69113929T2 (de) |
ES (1) | ES2080867T3 (de) |
Families Citing this family (44)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5220517A (en) * | 1990-08-31 | 1993-06-15 | Sci Systems, Inc. | Process gas distribution system and method with supervisory control |
US5368062A (en) * | 1992-01-29 | 1994-11-29 | Kabushiki Kaisha Toshiba | Gas supplying system and gas supplying apparatus |
US5449294A (en) * | 1993-03-26 | 1995-09-12 | Texas Instruments Incorporated | Multiple valve assembly and process |
EP0619450A1 (de) * | 1993-04-09 | 1994-10-12 | The Boc Group, Inc. | Gasgehäuse ohne Toträume |
US5359787A (en) * | 1993-04-16 | 1994-11-01 | Air Products And Chemicals, Inc. | High purity bulk chemical delivery system |
US5398712A (en) * | 1993-05-27 | 1995-03-21 | American Air Liquide | Purgeable connection for gas cylinders |
JP3361162B2 (ja) * | 1993-10-27 | 2003-01-07 | 清原 まさ子 | タンク室付ブロックバルブ |
JP2813856B2 (ja) * | 1993-11-29 | 1998-10-22 | 日本エア・リキード株式会社 | シリンダ付ガス供給装置 |
US5660201A (en) * | 1993-12-21 | 1997-08-26 | Lockheed Martin Idaho Technologies Company | Multiple source/multiple target fluid transfer apparatus |
US5749389A (en) * | 1993-12-22 | 1998-05-12 | Liquid Air Corporation | Purgeable connection for gas supply cabinet |
US5601108A (en) * | 1995-12-20 | 1997-02-11 | Scott M. Perry | Gas line safety evacuation apparatus and method |
JP3208062B2 (ja) * | 1996-07-15 | 2001-09-10 | シーケーディ株式会社 | パージシステム及びパージ継手 |
JP3726168B2 (ja) * | 1996-05-10 | 2005-12-14 | 忠弘 大見 | 流体制御装置 |
DE19632015C1 (de) * | 1996-08-08 | 1998-01-15 | Sauerstoffwerk Guttroff F Gmbh | Versorgungsanlage, insbesondere für toxische und brennbare Gase |
ES2178025T3 (es) * | 1996-11-28 | 2002-12-16 | Solvay Fluor & Derivate | Preparacion de mezclas gaseosas homogeneas con sf6 |
US6536460B1 (en) * | 1997-03-21 | 2003-03-25 | Advanced Micro Devices, Inc. | Process line purge system and method |
US6142169A (en) * | 1997-03-28 | 2000-11-07 | Tetra Laval Holdings & Finance, Sa | Sterile tank venting system for a filling machine |
WO1998048215A1 (en) * | 1997-04-22 | 1998-10-29 | Air Liquide Japan, Ltd. | Gas supply facility |
JP3737869B2 (ja) * | 1997-05-13 | 2006-01-25 | シーケーディ株式会社 | プロセスガス供給ユニット |
JP4235759B2 (ja) * | 1997-08-05 | 2009-03-11 | 忠弘 大見 | 流体制御装置 |
GB9724168D0 (en) | 1997-11-14 | 1998-01-14 | Air Prod & Chem | Gas control device and method of supplying gas |
US6158454A (en) * | 1998-04-14 | 2000-12-12 | Insync Systems, Inc. | Sieve like structure for fluid flow through structural arrangement |
US6345642B1 (en) * | 1999-02-19 | 2002-02-12 | Applied Materials, Inc. | Method and apparatus for removing processing liquid from a processing liquid path |
JP2000271471A (ja) * | 1999-03-24 | 2000-10-03 | Nippon M K S Kk | 液体ソース供給システム及びその洗浄方法、気化器 |
FR2794844B1 (fr) * | 1999-06-08 | 2001-08-03 | Air Liquide | Procede et dispositif de mise en gaz d'une ligne de distribution de gaz corrosif |
US6302139B1 (en) * | 1999-07-16 | 2001-10-16 | Advanced Technology Materials, Inc. | Auto-switching gas delivery system utilizing sub-atmospheric pressure gas supply vessels |
US6691728B2 (en) | 2000-10-10 | 2004-02-17 | Sempra Fiber Links | Methods and systems for installing a pipeline within a pipeline |
US6691734B2 (en) | 2000-10-10 | 2004-02-17 | Sempra Fiber Links | Methods and systems for installing cable and conduit in pipelines |
US6736156B2 (en) * | 2000-10-10 | 2004-05-18 | Sempra Fiber Links | Method and system for installing cable in pressurized pipelines |
JP2003014193A (ja) * | 2001-06-27 | 2003-01-15 | Nec Corp | シリンダキャビネット及びその配管内の残留ガスのパージ方法 |
US20040037768A1 (en) * | 2001-11-26 | 2004-02-26 | Robert Jackson | Method and system for on-site generation and distribution of a process gas |
US20090001524A1 (en) * | 2001-11-26 | 2009-01-01 | Siegele Stephen H | Generation and distribution of a fluorine gas |
US7051749B2 (en) * | 2003-11-24 | 2006-05-30 | Advanced Technology Materials, Inc. | Gas delivery system with integrated valve manifold functionality for sub-atmospheric and super-atmospheric pressure applications |
US7044147B2 (en) * | 2004-03-15 | 2006-05-16 | Atmel Corporation | System, apparatus and method for contaminant reduction in semiconductor device fabrication equipment components |
US7163036B2 (en) * | 2004-12-22 | 2007-01-16 | The Boc Group Plc | Method of supplying fluorine |
US7264013B2 (en) * | 2005-05-13 | 2007-09-04 | Air Products And Chemicals, Inc. | Enhanced purge effect in gas conduit |
US7300849B2 (en) * | 2005-11-04 | 2007-11-27 | Atmel Corporation | Bandgap engineered mono-crystalline silicon cap layers for SiGe HBT performance enhancement |
US7651919B2 (en) * | 2005-11-04 | 2010-01-26 | Atmel Corporation | Bandgap and recombination engineered emitter layers for SiGe HBT performance optimization |
US7439558B2 (en) | 2005-11-04 | 2008-10-21 | Atmel Corporation | Method and system for controlled oxygen incorporation in compound semiconductor films for device performance enhancement |
US20070102729A1 (en) * | 2005-11-04 | 2007-05-10 | Enicks Darwin G | Method and system for providing a heterojunction bipolar transistor having SiGe extensions |
WO2007081246A1 (en) | 2006-01-12 | 2007-07-19 | St. Jude Medical Ab | Implantable sensor lead |
US7789961B2 (en) * | 2007-01-08 | 2010-09-07 | Eastman Kodak Company | Delivery device comprising gas diffuser for thin film deposition |
CN102747338A (zh) * | 2011-04-18 | 2012-10-24 | 北大方正集团有限公司 | 一种气体传输管路和二氧化硅沉积装置 |
CN111189965A (zh) * | 2018-11-14 | 2020-05-22 | 中国石油化工股份有限公司 | 快速评价硫化氢清除剂性能的装置 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2872397A (en) * | 1955-01-10 | 1959-02-03 | Union Carbide Corp | Method and apparatus for producing ozone-carrier gas mixture |
US3029575A (en) * | 1958-11-03 | 1962-04-17 | Exxon Research Engineering Co | Chlorine separation process |
US3226914A (en) * | 1962-09-04 | 1966-01-04 | Union Carbide Corp | Pressure cycle for molecular sieve separation of normal paraffins from hydrocarbon mixtures |
US3279153A (en) * | 1963-07-08 | 1966-10-18 | Chemical Projects Ltd | Process for the separation of gases by adsorption |
US4169486A (en) * | 1977-05-06 | 1979-10-02 | Gray William M | Gas supply system with purge means |
US4305734A (en) * | 1979-09-19 | 1981-12-15 | Mcgill Incorporated | Recovery of hydrocarbon components from a hydrocarbon-carrier gas mixture |
US4383547A (en) * | 1981-03-27 | 1983-05-17 | Valin Corporation | Purging apparatus |
US4539020A (en) * | 1983-07-10 | 1985-09-03 | Kawasaki Steel Corporation | Methods for obtaining high-purity carbon monoxide |
US4640221A (en) * | 1985-10-30 | 1987-02-03 | International Business Machines Corporation | Vacuum deposition system with improved mass flow control |
US4699805A (en) * | 1986-07-03 | 1987-10-13 | Motorola Inc. | Process and apparatus for the low pressure chemical vapor deposition of thin films |
IT1198290B (it) * | 1986-12-02 | 1988-12-21 | Sgs Microelettronica Spa | Metodo di decontaminazione di una camera utilizzata nei processi sotto vuoto di deposizione,attacco o crescita di films di elevata purezza,di particolare applicazione nella tecnologia dei semiconduttori |
US4741354A (en) * | 1987-04-06 | 1988-05-03 | Spire Corporation | Radial gas manifold |
DE3725358A1 (de) * | 1987-07-30 | 1989-02-09 | Telog Systems Gmbh | Vorrichtung und verfahren zur oberflaechenbehandlung von materialien |
JP2602880B2 (ja) * | 1988-03-05 | 1997-04-23 | 忠弘 大見 | シリンダーキャビネット配管装置 |
JPH0644986B2 (ja) * | 1988-05-08 | 1994-06-15 | 忠弘 大見 | プロセスガス供給配管装置 |
EP0352061B1 (de) * | 1988-07-20 | 1994-09-21 | Hashimoto Chemical Industries Co., Ltd. | Metallischer Werkstoff mit durch Fluorierung passiviertem Film und aus dem metallischen Werkstoff bestehende Anlage |
EP0382985A1 (de) * | 1989-02-13 | 1990-08-22 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Purgiervorrichtung |
-
1990
- 1990-08-24 US US07/572,834 patent/US5137047A/en not_active Expired - Lifetime
-
1991
- 1991-08-19 ES ES91113871T patent/ES2080867T3/es not_active Expired - Lifetime
- 1991-08-19 EP EP19910113871 patent/EP0473040B1/de not_active Expired - Lifetime
- 1991-08-19 DE DE69113929T patent/DE69113929T2/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE69113929T2 (de) | 1996-04-11 |
EP0473040A1 (de) | 1992-03-04 |
EP0473040B1 (de) | 1995-10-18 |
ES2080867T3 (es) | 1996-02-16 |
US5137047A (en) | 1992-08-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |