DE69111770T2 - Verfahren zur Abscheidung einer Zinkoxidschicht auf ein Substrat. - Google Patents
Verfahren zur Abscheidung einer Zinkoxidschicht auf ein Substrat.Info
- Publication number
- DE69111770T2 DE69111770T2 DE69111770T DE69111770T DE69111770T2 DE 69111770 T2 DE69111770 T2 DE 69111770T2 DE 69111770 T DE69111770 T DE 69111770T DE 69111770 T DE69111770 T DE 69111770T DE 69111770 T2 DE69111770 T2 DE 69111770T2
- Authority
- DE
- Germany
- Prior art keywords
- deposition
- substrate
- oxide layer
- zinc oxide
- zinc
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/25—Oxides by deposition from the liquid phase
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
- C23C18/1216—Metal oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1229—Composition of the substrate
- C23C18/1245—Inorganic substrates other than metallic
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1258—Spray pyrolysis
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1291—Process of deposition of the inorganic material by heating of the substrate
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/216—ZnO
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/23—Mixtures
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/11—Deposition methods from solutions or suspensions
- C03C2218/112—Deposition methods from solutions or suspensions by spraying
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Thermal Sciences (AREA)
- Physics & Mathematics (AREA)
- Metallurgy (AREA)
- Inorganic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Ceramic Engineering (AREA)
- Surface Treatment Of Glass (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/626,515 US5094882A (en) | 1990-12-12 | 1990-12-12 | Zinc oxide film growth rate accelerator |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69111770D1 DE69111770D1 (de) | 1995-09-07 |
DE69111770T2 true DE69111770T2 (de) | 1995-12-07 |
Family
ID=24510698
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69111770T Expired - Fee Related DE69111770T2 (de) | 1990-12-12 | 1991-11-14 | Verfahren zur Abscheidung einer Zinkoxidschicht auf ein Substrat. |
Country Status (4)
Country | Link |
---|---|
US (1) | US5094882A (de) |
EP (1) | EP0490492B1 (de) |
CA (1) | CA2052991A1 (de) |
DE (1) | DE69111770T2 (de) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9574271B2 (en) | 2009-09-02 | 2017-02-21 | Toshiba Mitsubishi-Electric Industrial Systems Corporation | Method for forming metal oxide film, metal oxide film and apparatus for forming metal oxide film |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6174564B1 (en) | 1991-12-13 | 2001-01-16 | Symetrix Corporation | Method of making metal polyoxyalkylated precursor solutions |
DE4304679C2 (de) * | 1992-02-17 | 1996-03-21 | Mitsubishi Electric Corp | Verfahren zur Herstellung einer dünnen dielektrischen Schicht eines Oxid-Systems unter Verwendung des CVD-Verfahrens |
ATE174072T1 (de) * | 1994-08-16 | 1998-12-15 | Symetrix Corp | Vorstufenlösungen bestehend aus einem polyalkoxylierten metall in einem octanlösungsmittel sowie verfahren zu deren herstellung |
WO2012129358A1 (en) * | 2011-03-23 | 2012-09-27 | Pilkington Group Limited | Method of depositing zinc oxide coatings by chemical vapor deposition |
US9776914B2 (en) * | 2012-03-16 | 2017-10-03 | Pilkington Group Limited | Chemical vapor deposition process for depositing zinc oxide coatings, method for forming a conductive glass article and the coated glass articles produced thereby |
CN105349970B (zh) * | 2014-01-24 | 2017-12-05 | 重庆文理学院 | 一种性能优异的电子薄膜制备方法 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3679386A (en) * | 1969-06-30 | 1972-07-25 | Nippon Sheet Glass Co Ltd | Process and apparatus for forming a metal oxide coating on flat glass |
BE785763A (de) * | 1971-07-08 | 1973-01-03 | Glaverbel | |
US3850665A (en) * | 1971-07-08 | 1974-11-26 | Glaverbel | Process for forming a metal oxide coating on a substrate and resulting products |
US4129434A (en) * | 1971-07-08 | 1978-12-12 | Glaverbell | Process for forming a metal oxide coating |
DE2160723C3 (de) * | 1971-12-07 | 1974-11-28 | United Glass Ltd., Staines, Middlesex (Grossbritannien) | Verfahren zur Herstellung von Glasbehältern hoher mechanischer Festigkeit und Abriebbeständigkeit |
JPS4980119A (de) * | 1972-12-06 | 1974-08-02 | ||
US4160061A (en) * | 1975-03-29 | 1979-07-03 | Central Glass Company, Limited | Heat-reflecting glass plate and method of producing same |
DE2630438A1 (de) * | 1976-07-07 | 1978-04-13 | Schlafhorst & Co W | Verfahren und vorrichtung zur abgabe von textilspulen aus einem schwingfoerderer |
US4204028A (en) * | 1978-03-16 | 1980-05-20 | Ppg Industries, Inc. | Conductive metal oxide film for solar energy control |
CA1146702A (en) * | 1978-07-03 | 1983-05-24 | Stanley M. Ohlberg | Pyrolytic deposition of a cobalt/tin oxide spinel film |
US4239816A (en) * | 1978-12-01 | 1980-12-16 | Ppg Industries, Inc. | Organic additives for organometallic compositions |
US4259371A (en) * | 1979-07-25 | 1981-03-31 | Ppg Industries, Inc. | Method for improving the alkali durability of metal oxide films formed by pyrolysis |
US4292347A (en) * | 1979-12-03 | 1981-09-29 | Ppg Industries, Inc. | Pyrolytic coating reactant for defect and durability control |
JPS56109842A (en) * | 1980-01-29 | 1981-08-31 | Nippon Sheet Glass Co Ltd | Manufacture of glass coated with metal oxide |
US4397671A (en) * | 1981-11-30 | 1983-08-09 | Ford Motor Company | Method of placing a metal oxide film on a surface of a heated glass substrate |
US4393098A (en) * | 1982-07-29 | 1983-07-12 | Ford Motor Company | Process for developing a coating film on a heated glass sheet |
JPH01249634A (ja) * | 1988-03-30 | 1989-10-04 | Nippon Sheet Glass Co Ltd | 導電性ガラスおよびその製造方法 |
-
1990
- 1990-12-12 US US07/626,515 patent/US5094882A/en not_active Expired - Lifetime
-
1991
- 1991-10-08 CA CA002052991A patent/CA2052991A1/en not_active Abandoned
- 1991-11-14 EP EP91310525A patent/EP0490492B1/de not_active Expired - Lifetime
- 1991-11-14 DE DE69111770T patent/DE69111770T2/de not_active Expired - Fee Related
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9574271B2 (en) | 2009-09-02 | 2017-02-21 | Toshiba Mitsubishi-Electric Industrial Systems Corporation | Method for forming metal oxide film, metal oxide film and apparatus for forming metal oxide film |
Also Published As
Publication number | Publication date |
---|---|
EP0490492A2 (de) | 1992-06-17 |
CA2052991A1 (en) | 1992-06-13 |
EP0490492B1 (de) | 1995-08-02 |
DE69111770D1 (de) | 1995-09-07 |
US5094882A (en) | 1992-03-10 |
EP0490492A3 (en) | 1992-07-29 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE69123802T2 (de) | Verfahren zum Auftragen einer Dünnschicht auf ein Substrat durch Sputtern | |
DE68928402T2 (de) | Verfahren zur Entfernung einer Oxidschicht auf einem Substrat | |
DE69209896T2 (de) | Verfahren zur Herstellung degradierter Beschichtung auf einem Substrat | |
DE69421467T2 (de) | Verfahren zum Ablegen einer Dünnschicht auf Basis von einem Titannitrid auf einem transparenten Substrat | |
DE68909395D1 (de) | Verfahren zur Ablagerung eines dünnen Oxydfilms. | |
DE69114595D1 (de) | Verfahren zur Bestimmung der vollständigen Abtragung einer Dünnschicht auf einem nichtplanaren Substrat. | |
DE59202154D1 (de) | Verfahren zur herstellung einer leuchtstoffschicht auf einem substrat. | |
DE69123807T2 (de) | Verfahren zum Verbessern der Eigenschaften einer Dünnschicht auf einem Substrat | |
DE69111770T2 (de) | Verfahren zur Abscheidung einer Zinkoxidschicht auf ein Substrat. | |
DE69114823T2 (de) | Verfahren zur Abscheidung einer Zinkoxidschicht auf ein Substrat. | |
DE68912638D1 (de) | Verfahren zur Herstellung einer Kristallschicht auf einem Substrat. | |
DE69510906D1 (de) | Verfahren zur Herstellung einer unlöslichen Beschichtung auf einem Substrat | |
DE68908325D1 (de) | Verfahren zur herstellung einer indiumphosphid-epitaxialschicht auf einer substratoberflaeche. | |
DE68921253D1 (de) | Verfahren zur Abscheidung einer dünnen Supraleiterschicht. | |
DE3886863D1 (de) | Verfahren zur Herstellung einer supraleitenden Oxydschicht auf einem Substrat. | |
DE69303853D1 (de) | Verfahren zur Bildung einer Dünnschicht auf einem Substrat mittels reaktiven Gleichstrom-Sputtern | |
DE69114942T2 (de) | In situ-Messung einer dünnen Schicht auf einem Substrat. | |
DE69304130D1 (de) | Verfahren zur Abscheidung eines ohmischen Kontaktes auf einer ZnSe-Schicht | |
DE69019869D1 (de) | Verfahren zur Plattierung einer metallischen Schicht zwischen funktionellen Bahnen auf einem Substrat. | |
DE69114615T2 (de) | Verfahren zur Herstellung einer dünnen Schicht auf der Faserstirnfläche. | |
DE3886033T2 (de) | Verfahren zur herstellung einer t-gate metallstruktur auf einem substrat. | |
DE69129722D1 (de) | Verfahren für das selektive Wachstum einer Dünnschicht auf einem gemusterten Substrat | |
ATA81890A (de) | Verfahren zur herstellung einer duennen nitridoder oxidschicht auf einer oberflaeche | |
DE59703686D1 (de) | Verfahren zur beschichtung von substraten durch cvd mit einer siliziumhaltigen schutzschicht | |
DE243451T1 (de) | Verfahren zur herstellung einer abschleifechten beschichtung auf einen durchsichtigen substrat. |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |