DE69102380D1 - Verfahren zur Herstellung eines Elektrodenmusters. - Google Patents
Verfahren zur Herstellung eines Elektrodenmusters.Info
- Publication number
- DE69102380D1 DE69102380D1 DE69102380T DE69102380T DE69102380D1 DE 69102380 D1 DE69102380 D1 DE 69102380D1 DE 69102380 T DE69102380 T DE 69102380T DE 69102380 T DE69102380 T DE 69102380T DE 69102380 D1 DE69102380 D1 DE 69102380D1
- Authority
- DE
- Germany
- Prior art keywords
- making
- electrode pattern
- electrode
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/08—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed by electric discharge, e.g. by spark erosion
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23H—WORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OF ELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKES THE PLACE OF A TOOL; SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL
- B23H9/00—Machining specially adapted for treating particular metal objects or for obtaining special effects or results on metal objects
- B23H9/06—Marking or engraving
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/18—Acidic compositions for etching copper or alloys thereof
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
- G02F1/13439—Electrodes characterised by their electrical, optical, physical properties; materials therefor; method of making
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1884—Manufacture of transparent electrodes, e.g. TCO, ITO
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/032—Materials
- H05K2201/0326—Inorganic, non-metallic conductor, e.g. indium-tin oxide [ITO]
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/01—Tools for processing; Objects used during processing
- H05K2203/0104—Tools for processing; Objects used during processing for patterning or coating
- H05K2203/0121—Patterning, e.g. plating or etching by moving electrode
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Optics & Photonics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mathematical Physics (AREA)
- Computer Hardware Design (AREA)
- Electromagnetism (AREA)
- General Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Power Engineering (AREA)
- Materials Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Thermal Sciences (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Liquid Crystal (AREA)
- ing And Chemical Polishing (AREA)
- Manufacturing Of Electric Cables (AREA)
- Electroluminescent Light Sources (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2230648A JP2874986B2 (ja) | 1990-09-03 | 1990-09-03 | 電極のパターン形成方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69102380D1 true DE69102380D1 (de) | 1994-07-14 |
DE69102380T2 DE69102380T2 (de) | 1995-01-12 |
Family
ID=16911089
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69102380T Expired - Fee Related DE69102380T2 (de) | 1990-09-03 | 1991-08-27 | Verfahren zur Herstellung eines Elektrodenmusters. |
Country Status (6)
Country | Link |
---|---|
US (1) | US5223687A (de) |
EP (1) | EP0476856B1 (de) |
JP (1) | JP2874986B2 (de) |
KR (1) | KR940008181B1 (de) |
DE (1) | DE69102380T2 (de) |
TW (1) | TW209329B (de) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4229578A1 (de) * | 1992-09-04 | 1994-03-10 | Licentia Gmbh | Flüssigkristall-Anzeigevorrichtung |
US5504338A (en) * | 1993-06-30 | 1996-04-02 | The United States Of America As Represented By The Secretary Of The Navy | Apparatus and method using low-voltage and/or low-current scanning probe lithography |
JP2826470B2 (ja) * | 1994-05-13 | 1998-11-18 | 日本電気株式会社 | 自動車電話装置 |
US5757125A (en) * | 1995-11-09 | 1998-05-26 | Astronics Corporation, Inc. | Electroluminescent lamp with lead attachment isolation structure, and rotary abrasion method of manufacture thereof |
DE19715048C2 (de) * | 1997-04-11 | 1999-08-19 | Bosch Gmbh Robert | Verfahren zum Strukturieren einer transparenten, elektrisch leitfähigen Schicht |
US6379509B2 (en) * | 1998-01-20 | 2002-04-30 | 3M Innovative Properties Company | Process for forming electrodes |
US6066830A (en) * | 1998-06-04 | 2000-05-23 | Astronics Corporation | Laser etching of electroluminescent lamp electrode structures, and electroluminescent lamps produced thereby |
JP4523789B2 (ja) * | 2003-10-31 | 2010-08-11 | パナソニック株式会社 | 金属皮膜剥離装置および金属皮膜剥離方法 |
JP4660354B2 (ja) * | 2005-01-18 | 2011-03-30 | 新光電気工業株式会社 | 導電性薄膜の加工方法及び装置 |
KR102481798B1 (ko) * | 2006-06-09 | 2022-12-26 | 애플 인크. | 터치 스크린 액정 디스플레이 |
US20140352144A1 (en) | 2013-06-03 | 2014-12-04 | Carestream Health, Inc. | Methods for improving electrical isolation of patterned transparent conductive films |
CN108181745B (zh) * | 2018-02-08 | 2020-08-25 | 京东方科技集团股份有限公司 | 一种液晶移相器、移相方法及其制作方法 |
CN110936001A (zh) * | 2019-12-16 | 2020-03-31 | 浙江正泰太阳能科技有限公司 | 一种太阳能电池串焊机及太阳能电池串的焊接方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2680184A (en) * | 1951-02-07 | 1954-06-01 | Duncan B Cox | Method for severing or slitting metal foil |
US3119919A (en) * | 1961-01-30 | 1964-01-28 | Daystrom Inc | Apparatus for the removal of portions of deposited metal films |
US3305666A (en) * | 1963-08-28 | 1967-02-21 | Zaromb Solomon | Methods and apparatus for treating conductive surfaces |
US3649801A (en) * | 1970-04-29 | 1972-03-14 | Gen Electric | Film resistor trimmer |
SU475094A1 (ru) * | 1972-12-12 | 1979-10-15 | Ордена Ленина Физико-Технический Институт Им. А.Ф.Иоффе Ан Ссср | Способ легировани халькогенидного стекла |
JPS56163843A (en) * | 1980-05-16 | 1981-12-16 | Mitsubishi Electric Corp | Electric discharge machining apparatus |
FR2559960B1 (fr) * | 1984-02-20 | 1987-03-06 | Solems Sa | Procede de formation de circuits electriques en couche mince et produits obtenus |
US4931613A (en) * | 1987-05-08 | 1990-06-05 | Allegheny Ludlum Corporation | Electrical discharge scribing for improving core loss of grain-oriented silicon steel |
US5183725A (en) * | 1989-10-03 | 1993-02-02 | Sharp Kabushiki Kaisha | Electrode pattern forming method |
US5090121A (en) * | 1990-10-30 | 1992-02-25 | Texas Instruments Incorporated | Apparatus and method for fabricating cirucit pattern on conductive surface of circuit board |
-
1990
- 1990-09-03 JP JP2230648A patent/JP2874986B2/ja not_active Expired - Lifetime
-
1991
- 1991-08-09 TW TW080106299A patent/TW209329B/zh active
- 1991-08-27 DE DE69102380T patent/DE69102380T2/de not_active Expired - Fee Related
- 1991-08-27 EP EP91307816A patent/EP0476856B1/de not_active Expired - Lifetime
- 1991-08-30 US US07/753,053 patent/US5223687A/en not_active Expired - Fee Related
- 1991-09-03 KR KR1019910015352A patent/KR940008181B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
DE69102380T2 (de) | 1995-01-12 |
KR920007510A (ko) | 1992-04-28 |
EP0476856B1 (de) | 1994-06-08 |
EP0476856A1 (de) | 1992-03-25 |
US5223687A (en) | 1993-06-29 |
TW209329B (de) | 1993-07-11 |
KR940008181B1 (ko) | 1994-09-07 |
JPH04113321A (ja) | 1992-04-14 |
JP2874986B2 (ja) | 1999-03-24 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |