DE69024158D1 - Verfahren zur Erzeugung eines Elektrodenmusters - Google Patents

Verfahren zur Erzeugung eines Elektrodenmusters

Info

Publication number
DE69024158D1
DE69024158D1 DE69024158T DE69024158T DE69024158D1 DE 69024158 D1 DE69024158 D1 DE 69024158D1 DE 69024158 T DE69024158 T DE 69024158T DE 69024158 T DE69024158 T DE 69024158T DE 69024158 D1 DE69024158 D1 DE 69024158D1
Authority
DE
Germany
Prior art keywords
creating
electrode pattern
electrode
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69024158T
Other languages
English (en)
Other versions
DE69024158T2 (de
Inventor
Hiromi Nishino
Keiji Tarui
Hideyuki Toyoshi
Tatsuo Morita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Publication of DE69024158D1 publication Critical patent/DE69024158D1/de
Application granted granted Critical
Publication of DE69024158T2 publication Critical patent/DE69024158T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1884—Manufacture of transparent electrodes, e.g. TCO, ITO
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G02F1/13439—Electrodes characterised by their electrical, optical, physical properties; materials therefor; method of making
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Mathematical Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
DE69024158T 1989-10-03 1990-10-04 Verfahren zur Erzeugung eines Elektrodenmusters Expired - Fee Related DE69024158T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP25985789 1989-10-03
JP30377289 1989-11-22

Publications (2)

Publication Number Publication Date
DE69024158D1 true DE69024158D1 (de) 1996-01-25
DE69024158T2 DE69024158T2 (de) 1996-06-05

Family

ID=26544320

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69024158T Expired - Fee Related DE69024158T2 (de) 1989-10-03 1990-10-04 Verfahren zur Erzeugung eines Elektrodenmusters

Country Status (3)

Country Link
US (1) US5183725A (de)
EP (1) EP0421429B1 (de)
DE (1) DE69024158T2 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2874986B2 (ja) * 1990-09-03 1999-03-24 出光興産株式会社 電極のパターン形成方法
JP2734839B2 (ja) * 1991-10-09 1998-04-02 シャープ株式会社 アルミニウム用エッチング液およびエッチング方法並びにアルミニウムエッチング製品
US5342477A (en) * 1993-07-14 1994-08-30 Micron Display Technology, Inc. Low resistance electrodes useful in flat panel displays
KR0175012B1 (ko) * 1995-09-13 1999-02-18 김광호 초경강판재의 패턴 형성 방법
US5902475A (en) * 1997-04-08 1999-05-11 Interventional Technologies, Inc. Method for manufacturing a stent
JPH1131590A (ja) * 1997-07-09 1999-02-02 Tdk Corp 有機ｅｌ素子
US6652981B2 (en) 2000-05-12 2003-11-25 3M Innovative Properties Company Etching process for making electrodes

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6019608B2 (ja) * 1978-10-03 1985-05-17 シャープ株式会社 電極パタ−ン形成方法
DE3134054A1 (de) * 1981-08-28 1983-05-05 Hoechst Ag, 6230 Frankfurt Elektrochemisches entwicklungsverfahren fuer reproduktionsschichten
DE3416867A1 (de) * 1984-05-08 1985-11-14 Hoechst Ag, 6230 Frankfurt Einstufiges elektrochemisches bilderzeugungsverfahren fuer reproduktionsschichten
US4859036A (en) * 1987-05-15 1989-08-22 Canon Kabushiki Kaisha Device plate having conductive films selected to prevent pin-holes
JPS63289533A (ja) * 1987-05-22 1988-11-28 Oki Electric Ind Co Ltd 液晶ディスプレイ装置
JPH01255829A (ja) * 1988-04-05 1989-10-12 Nec Corp アルミニウムとｉｔｏとの多層配線

Also Published As

Publication number Publication date
EP0421429B1 (de) 1995-12-13
EP0421429A3 (en) 1992-05-13
DE69024158T2 (de) 1996-06-05
EP0421429A2 (de) 1991-04-10
US5183725A (en) 1993-02-02

Similar Documents

Publication Publication Date Title
DE69031699T2 (de) Verfahren zur Haltung eines Substrats
DE69034140D1 (de) Verfahren und Einrichtung zur Erzeugung von Mustern
DE69332265T2 (de) Verfahren zur maskenerzeugung
DE59010728D1 (de) Verfahren zur Erzeugung ätzresistenter Strukturen
DE69413362T2 (de) Verfahren zur erzeugung eines unsichtbaren markierungszeichens
DE69028445T2 (de) Vorrichtung und Verfahren zur Erzeugung von Dünnschichten
DE69223868T2 (de) Verfahren zur Herstellung von Elektroden eines Halbleiterbauelements
DE69102380D1 (de) Verfahren zur Herstellung eines Elektrodenmusters.
DE3856441T2 (de) Methode zur Erzeugung eines feinen Musters
DE69024158D1 (de) Verfahren zur Erzeugung eines Elektrodenmusters
DE69032249D1 (de) Verfahren zur herstellung winziger metallischer kugeln gleichmässiger grösse
DE69025120T2 (de) Verfahren und Vorrichtung zur Belichtung
DE69029974D1 (de) Gerät und Verfahren zur Erzeugung von Signalen
DE69025885T2 (de) Vorrichtung und Verfahren zur Erzeugung der Ablauffolge eines industriellen Verfahrens
ATA240890A (de) Verfahren zur herstellung eines zwischenproduktes von diltiazem
DE69024171D1 (de) Verfahren und Vorrichtung zur Erzeugung von Tonkurven
DE69032575D1 (de) Verfahren zur herstellung von ferrocenoylderivaten
DE69033758D1 (de) Verfahren zur herstellung von norcamphandikarbonitrilen
AT382236B (de) Verfahren zur herstellung eines splitterkoerpers und danach hergestellter splitterkoerper
ATA5889A (de) Verfahren zur herstellung eines mittels zur bodenmelioration aus mgo und mbco3
DE3888702D1 (de) Verfahren zur kurzschlussüberwachung eines spannungszwischenkreisumrichters.
DE3891362T1 (de) Verfahren zur erzeugung von massenstahl
ATA140388A (de) Verfahren zur kontinuierlichen rueckgewinnung von loesungsmitteln
DE3855103D1 (de) Verfahren zur verbesserung eines bildelementes
ATA93190A (de) Verfahren zur herstellung von chinazolinderivaten

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Free format text: PATENTANWAELTE MUELLER & HOFFMANN, 81667 MUENCHEN

8339 Ceased/non-payment of the annual fee