DE69102021T2 - Amin-Katalysatoren für die Umwandlung von Kieselsäure-Vorprodukten zu Kieselsäure bei niedriger Temperatur. - Google Patents

Amin-Katalysatoren für die Umwandlung von Kieselsäure-Vorprodukten zu Kieselsäure bei niedriger Temperatur.

Info

Publication number
DE69102021T2
DE69102021T2 DE69102021T DE69102021T DE69102021T2 DE 69102021 T2 DE69102021 T2 DE 69102021T2 DE 69102021 T DE69102021 T DE 69102021T DE 69102021 T DE69102021 T DE 69102021T DE 69102021 T2 DE69102021 T2 DE 69102021T2
Authority
DE
Germany
Prior art keywords
silica
conversion
low temperature
amine catalysts
precursors
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69102021T
Other languages
English (en)
Other versions
DE69102021D1 (de
Inventor
Ronald Howard Baney
Carl Joseph Bilgrien
Dennis William Broderick
Leslie Earl Carpenter
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dow Silicones Corp
Original Assignee
Dow Corning Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dow Corning Corp filed Critical Dow Corning Corp
Application granted granted Critical
Publication of DE69102021D1 publication Critical patent/DE69102021D1/de
Publication of DE69102021T2 publication Critical patent/DE69102021T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D143/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing boron, silicon, phosphorus, selenium, tellurium, or a metal; Coating compositions based on derivatives of such polymers
    • C09D143/04—Homopolymers or copolymers of monomers containing silicon
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/50—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
    • C04B41/5025—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials with ceramic materials
    • C04B41/5035—Silica
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2111/00—Mortars, concrete or artificial stone or mixtures to prepare them, characterised by specific function, property or use
    • C04B2111/00474—Uses not provided for elsewhere in C04B2111/00
    • C04B2111/00844—Uses not provided for elsewhere in C04B2111/00 for electronic applications

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Structural Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Paints Or Removers (AREA)
  • Formation Of Insulating Films (AREA)
  • Silicon Compounds (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Catalysts (AREA)
DE69102021T 1990-06-04 1991-05-30 Amin-Katalysatoren für die Umwandlung von Kieselsäure-Vorprodukten zu Kieselsäure bei niedriger Temperatur. Expired - Fee Related DE69102021T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/532,705 US5116637A (en) 1990-06-04 1990-06-04 Amine catalysts for the low temperature conversion of silica precursors to silica

Publications (2)

Publication Number Publication Date
DE69102021D1 DE69102021D1 (de) 1994-06-23
DE69102021T2 true DE69102021T2 (de) 1994-12-08

Family

ID=24122823

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69102021T Expired - Fee Related DE69102021T2 (de) 1990-06-04 1991-05-30 Amin-Katalysatoren für die Umwandlung von Kieselsäure-Vorprodukten zu Kieselsäure bei niedriger Temperatur.

Country Status (7)

Country Link
US (1) US5116637A (de)
EP (1) EP0460868B1 (de)
JP (1) JP3097870B2 (de)
KR (1) KR0176259B1 (de)
CA (1) CA2042689A1 (de)
DE (1) DE69102021T2 (de)
ES (1) ES2056581T3 (de)

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US5445894A (en) * 1991-04-22 1995-08-29 Dow Corning Corporation Ceramic coatings
US5436029A (en) * 1992-07-13 1995-07-25 Dow Corning Corporation Curing silicon hydride containing materials by exposure to nitrous oxide
CA2104340A1 (en) * 1992-08-31 1994-03-01 Grish Chandra Hermetic protection for integrated circuits
US5820923A (en) * 1992-11-02 1998-10-13 Dow Corning Corporation Curing silica precursors by exposure to nitrous oxide
JP2739902B2 (ja) * 1993-09-30 1998-04-15 東京応化工業株式会社 酸化ケイ素系被膜形成用塗布液
KR0126792B1 (ko) * 1994-04-11 1998-04-01 김광호 폴리이미드(Polyimide) 표면 처리방법
US5456952A (en) * 1994-05-17 1995-10-10 Lsi Logic Corporation Process of curing hydrogen silsesquioxane coating to form silicon oxide layer
US5783716A (en) * 1996-06-28 1998-07-21 Advanced Technology Materials, Inc. Platinum source compositions for chemical vapor deposition of platinum
US5609925A (en) * 1995-12-04 1997-03-11 Dow Corning Corporation Curing hydrogen silsesquioxane resin with an electron beam
US6015457A (en) * 1997-04-21 2000-01-18 Alliedsignal Inc. Stable inorganic polymers
US6143855A (en) * 1997-04-21 2000-11-07 Alliedsignal Inc. Organohydridosiloxane resins with high organic content
US6218497B1 (en) 1997-04-21 2001-04-17 Alliedsignal Inc. Organohydridosiloxane resins with low organic content
US6743856B1 (en) 1997-04-21 2004-06-01 Honeywell International Inc. Synthesis of siloxane resins
US6218020B1 (en) 1999-01-07 2001-04-17 Alliedsignal Inc. Dielectric films from organohydridosiloxane resins with high organic content
US6177199B1 (en) 1999-01-07 2001-01-23 Alliedsignal Inc. Dielectric films from organohydridosiloxane resins with low organic content
JP2000119595A (ja) * 1998-10-14 2000-04-25 Shin Etsu Chem Co Ltd 焼成皮膜形成用オルガノポリシロキサン組成物
US6231989B1 (en) 1998-11-20 2001-05-15 Dow Corning Corporation Method of forming coatings
US6440550B1 (en) 1999-10-18 2002-08-27 Honeywell International Inc. Deposition of fluorosilsesquioxane films
US6472076B1 (en) 1999-10-18 2002-10-29 Honeywell International Inc. Deposition of organosilsesquioxane films
KR100791564B1 (ko) * 1999-12-21 2008-01-03 삼성에스디아이 주식회사 희토류 산화물이 코팅된 형광체 및 그의 제조방법
US6558755B2 (en) 2000-03-20 2003-05-06 Dow Corning Corporation Plasma curing process for porous silica thin film
US7011868B2 (en) * 2000-03-20 2006-03-14 Axcelis Technologies, Inc. Fluorine-free plasma curing process for porous low-k materials
US6576300B1 (en) 2000-03-20 2003-06-10 Dow Corning Corporation High modulus, low dielectric constant coatings
US6913796B2 (en) * 2000-03-20 2005-07-05 Axcelis Technologies, Inc. Plasma curing process for porous low-k materials
US6759098B2 (en) 2000-03-20 2004-07-06 Axcelis Technologies, Inc. Plasma curing of MSQ-based porous low-k film materials
JP3526439B2 (ja) * 2000-09-29 2004-05-17 Ｈｏｙａ株式会社 眼鏡レンズ用コーティング組成物の製造方法
WO2002031596A1 (en) 2000-10-12 2002-04-18 University Of North Carolina At Chapel Hill Co2-processes photoresists, polymers, and photoactive compounds for microlithography
GB0108274D0 (en) * 2001-04-03 2001-05-23 Dow Corning preparation of silicone resins
US6756085B2 (en) * 2001-09-14 2004-06-29 Axcelis Technologies, Inc. Ultraviolet curing processes for advanced low-k materials
GB0224044D0 (en) * 2002-10-16 2002-11-27 Dow Corning Silicone resins
KR100645682B1 (ko) * 2003-04-17 2006-11-13 주식회사 엘지화학 유기실록산 수지 및 이를 이용한 절연막
EP1732707B1 (de) 2004-03-19 2015-04-22 Commonwealth Scientific and Industrial Research Organisation Aktivierungsverfahren
US20050215713A1 (en) * 2004-03-26 2005-09-29 Hessell Edward T Method of producing a crosslinked coating in the manufacture of integrated circuits
US8901268B2 (en) * 2004-08-03 2014-12-02 Ahila Krishnamoorthy Compositions, layers and films for optoelectronic devices, methods of production and uses thereof
BRPI0606574A2 (pt) * 2005-01-21 2017-06-27 Commw Scient Ind Res Org métodos de ativação de um revestimento orgânico e de preparação de um tratamento de ativação, substrato revestido e tratamento de ativação para um revestimento orgânico
EP1941539A1 (de) * 2005-06-03 2008-07-09 Axcelis Technologies, Inc. Ultraviolett-aushärtprozess für dielektrische filme mit niedrigem k
US7955782B2 (en) * 2008-09-22 2011-06-07 Honeywell International Inc. Bottom antireflective coatings exhibiting enhanced wet strip rates, bottom antireflective coating compositions for forming bottom antireflective coatings, and methods for fabricating the same
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
JP2013509414A (ja) 2009-10-28 2013-03-14 ダウ コーニング コーポレーション ポリシラン−ポリシラザン共重合体、並びに、それらの調製及び使用方法
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
US20140154441A1 (en) * 2011-07-29 2014-06-05 SiOx ApS Reactive Silicon Oxide Precursor Facilitated Anti-Corrosion Treatment
JP6803842B2 (ja) 2015-04-13 2020-12-23 ハネウェル・インターナショナル・インコーポレーテッドＨｏｎｅｙｗｅｌｌ Ｉｎｔｅｒｎａｔｉｏｎａｌ Ｉｎｃ． オプトエレクトロニクス用途のためのポリシロキサン製剤及びコーティング
WO2019039909A1 (ko) 2017-08-24 2019-02-28 주식회사 엘지화학 실리카막의 제조 방법
CN111647270A (zh) * 2020-05-29 2020-09-11 浙江中科玖源新材料有限公司 一种绝缘聚酰亚胺薄膜及其制备方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3923705A (en) * 1974-10-30 1975-12-02 Dow Corning Method of preparing fire retardant siloxane foams and foams prepared therefrom
US4384013A (en) * 1979-12-10 1983-05-17 Desoto, Inc. Volatile amine-cured trialkoxysilyl-containing aqueous latex coatings
JPS57118592A (en) * 1981-01-16 1982-07-23 Kanegafuchi Chem Ind Co Ltd Stable trialkoxysilane composition
US4636440A (en) * 1985-10-28 1987-01-13 Manville Corporation Novel process for coating substrates with glass-like films and coated substrates
JPH0755835B2 (ja) * 1986-05-14 1995-06-14 日立化成工業株式会社 シリカガラスの製造方法
US4822697A (en) * 1986-12-03 1989-04-18 Dow Corning Corporation Platinum and rhodium catalysis of low temperature formation multilayer ceramics
US4756977A (en) * 1986-12-03 1988-07-12 Dow Corning Corporation Multilayer ceramics from hydrogen silsesquioxane
US4749631B1 (en) * 1986-12-04 1993-03-23 Multilayer ceramics from silicate esters
US4911992A (en) * 1986-12-04 1990-03-27 Dow Corning Corporation Platinum or rhodium catalyzed multilayer ceramic coatings from hydrogen silsesquioxane resin and metal oxides
JP2624254B2 (ja) * 1987-05-22 1997-06-25 東京応化工業株式会社 シリカ系被膜の膜質改善方法
US4849296A (en) * 1987-12-28 1989-07-18 Dow Corning Corporation Multilayer ceramic coatings from metal oxides and hydrogen silsesquioxane resin ceramified in ammonia
US4847162A (en) * 1987-12-28 1989-07-11 Dow Corning Corporation Multilayer ceramics coatings from the ceramification of hydrogen silsequioxane resin in the presence of ammonia
US4842888A (en) * 1988-04-07 1989-06-27 Dow Corning Corporation Ceramic coatings from the pyrolysis in ammonia of mixtures of silicate esters and other metal oxide precursors
US5059448A (en) * 1990-06-18 1991-10-22 Dow Corning Corporation Rapid thermal process for obtaining silica coatings
US5063267A (en) * 1990-11-28 1991-11-05 Dow Corning Corporation Hydrogen silsesquioxane resin fractions and their use as coating materials

Also Published As

Publication number Publication date
KR0176259B1 (ko) 1999-04-01
CA2042689A1 (en) 1991-12-05
EP0460868B1 (de) 1994-05-18
ES2056581T3 (es) 1994-10-01
KR920000890A (ko) 1992-01-29
US5116637A (en) 1992-05-26
EP0460868A1 (de) 1991-12-11
DE69102021D1 (de) 1994-06-23
JPH04228415A (ja) 1992-08-18
JP3097870B2 (ja) 2000-10-10

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee