DE69033640D1 - Hochrein-Titanwerkstoff, Verfahren zu seiner Herstellung sowie Verwendung als Zerstäubungstarget - Google Patents
Hochrein-Titanwerkstoff, Verfahren zu seiner Herstellung sowie Verwendung als ZerstäubungstargetInfo
- Publication number
- DE69033640D1 DE69033640D1 DE69033640T DE69033640T DE69033640D1 DE 69033640 D1 DE69033640 D1 DE 69033640D1 DE 69033640 T DE69033640 T DE 69033640T DE 69033640 T DE69033640 T DE 69033640T DE 69033640 D1 DE69033640 D1 DE 69033640D1
- Authority
- DE
- Germany
- Prior art keywords
- production
- titanium material
- purity titanium
- atomizing target
- atomizing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B34/00—Obtaining refractory metals
- C22B34/10—Obtaining titanium, zirconium or hafnium
- C22B34/12—Obtaining titanium or titanium compounds from ores or scrap by metallurgical processing; preparation of titanium compounds from other titanium compounds see C01G23/00 - C01G23/08
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B34/00—Obtaining refractory metals
- C22B34/10—Obtaining titanium, zirconium or hafnium
- C22B34/12—Obtaining titanium or titanium compounds from ores or scrap by metallurgical processing; preparation of titanium compounds from other titanium compounds see C01G23/00 - C01G23/08
- C22B34/1295—Refining, melting, remelting, working up of titanium
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B9/00—General processes of refining or remelting of metals; Apparatus for electroslag or arc remelting of metals
- C22B9/16—Remelting metals
- C22B9/22—Remelting metals with heating by wave energy or particle radiation
- C22B9/228—Remelting metals with heating by wave energy or particle radiation by particle radiation, e.g. electron beams
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C14/00—Alloys based on titanium
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01019—Potassium [K]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01024—Chromium [Cr]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01028—Nickel [Ni]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01074—Tungsten [W]
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Environmental & Geological Engineering (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Plasma & Fusion (AREA)
- Physical Vapour Deposition (AREA)
- Manufacture And Refinement Of Metals (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18187789 | 1989-07-14 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69033640D1 true DE69033640D1 (de) | 2000-11-09 |
DE69033640T2 DE69033640T2 (de) | 2001-05-03 |
Family
ID=16108426
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69033640T Expired - Lifetime DE69033640T2 (de) | 1989-07-14 | 1990-07-13 | Hochrein-Titanwerkstoff, Verfahren zu seiner Herstellung sowie Verwendung als Zerstäubungstarget |
Country Status (4)
Country | Link |
---|---|
EP (3) | EP0952239A1 (de) |
JP (1) | JPH07103432B2 (de) |
KR (1) | KR940000821B1 (de) |
DE (1) | DE69033640T2 (de) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR940008936B1 (ko) * | 1990-02-15 | 1994-09-28 | 가부시끼가이샤 도시바 | 고순도 금속재와 그 성질을 이용한 반도체 장치 및 그 제조방법 |
JP3413782B2 (ja) * | 1995-03-31 | 2003-06-09 | 日立金属株式会社 | スパッタリング用チタンタ−ゲットおよびその製造方法 |
US6309595B1 (en) | 1997-04-30 | 2001-10-30 | The Altalgroup, Inc | Titanium crystal and titanium |
US6063254A (en) * | 1997-04-30 | 2000-05-16 | The Alta Group, Inc. | Method for producing titanium crystal and titanium |
US6024847A (en) * | 1997-04-30 | 2000-02-15 | The Alta Group, Inc. | Apparatus for producing titanium crystal and titanium |
US6755948B1 (en) | 1999-11-22 | 2004-06-29 | Nikko Materials Company, Limited | Titanium target for sputtering |
NL1037424C2 (nl) | 2009-10-29 | 2011-05-02 | Atte Nicolaas Bakker | Chronograaf. |
SG11201802505WA (en) * | 2016-03-25 | 2018-04-27 | Jx Nippon Mining & Metals Corp | Ti-Ta ALLOY SPUTTERING TARGET AND PRODUCTION METHOD THEREFOR |
US20170345766A1 (en) * | 2016-05-31 | 2017-11-30 | Globalfoundries Inc. | Devices and methods of forming low resistivity noble metal interconnect with improved adhesion |
CN112111658B (zh) * | 2020-08-27 | 2022-07-05 | 宁波创润新材料有限公司 | 一种颗粒物料的熔炼方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6066425A (ja) * | 1983-09-22 | 1985-04-16 | Nippon Telegr & Teleph Corp <Ntt> | Lsi電極用の高純度モリブデンタ−ゲツトならびに高純度モリブデンシリサイドタ−ゲツトおよびその製造方法 |
JPS62280335A (ja) * | 1986-05-30 | 1987-12-05 | Toshiba Corp | 薄膜形成用高純度チタン材、それを用いて形成されてなるターゲットおよび薄膜、および薄膜形成用高純度チタン材の製造方法 |
JPS62294177A (ja) * | 1986-06-13 | 1987-12-21 | Toshiba Corp | 高純度金属体の製造方法 |
US4678506A (en) * | 1986-08-11 | 1987-07-07 | Titanium Metals Corporation Of America (Timet) | Production of titanium articles that are free from low density inclusions |
JP2670836B2 (ja) * | 1989-02-15 | 1997-10-29 | 株式会社 ジャパンエナジー | 高純度チタンターゲット材 |
-
1990
- 1990-07-12 JP JP2185734A patent/JPH07103432B2/ja not_active Expired - Lifetime
- 1990-07-13 EP EP99113625A patent/EP0952239A1/de not_active Withdrawn
- 1990-07-13 EP EP97114988A patent/EP0814506A3/de not_active Ceased
- 1990-07-13 DE DE69033640T patent/DE69033640T2/de not_active Expired - Lifetime
- 1990-07-13 EP EP90307683A patent/EP0408383B1/de not_active Expired - Lifetime
- 1990-07-14 KR KR1019900010827A patent/KR940000821B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JPH03130339A (ja) | 1991-06-04 |
EP0814506A2 (de) | 1997-12-29 |
JPH07103432B2 (ja) | 1995-11-08 |
EP0952239A1 (de) | 1999-10-27 |
EP0814506A3 (de) | 1998-04-15 |
DE69033640T2 (de) | 2001-05-03 |
KR940000821B1 (ko) | 1994-02-02 |
EP0408383B1 (de) | 2000-10-04 |
EP0408383A1 (de) | 1991-01-16 |
KR910003133A (ko) | 1991-02-27 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: KABUSHIKI KAISHA TOSHIBA, TOKYO, JP Owner name: TOSHIBA MATERIALS CO., LTD., YOKOHAMA, KANAGAW, JP |
|
8320 | Willingness to grant licences declared (paragraph 23) |