DE69032861D1 - Reflektoreinrichtung und diese Einrichtung verwendendes Musterübertragungsgerät - Google Patents

Reflektoreinrichtung und diese Einrichtung verwendendes Musterübertragungsgerät

Info

Publication number
DE69032861D1
DE69032861D1 DE69032861T DE69032861T DE69032861D1 DE 69032861 D1 DE69032861 D1 DE 69032861D1 DE 69032861 T DE69032861 T DE 69032861T DE 69032861 T DE69032861 T DE 69032861T DE 69032861 D1 DE69032861 D1 DE 69032861D1
Authority
DE
Germany
Prior art keywords
reflector
pattern transmission
transmission device
pattern
reflector device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69032861T
Other languages
English (en)
Other versions
DE69032861T2 (de
Inventor
Noritaka Mochizuki
Ryuichi Ebinuma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2037214A external-priority patent/JP2891737B2/ja
Priority claimed from JP2051174A external-priority patent/JP2749937B2/ja
Application filed by Canon Inc filed Critical Canon Inc
Application granted granted Critical
Publication of DE69032861D1 publication Critical patent/DE69032861D1/de
Publication of DE69032861T2 publication Critical patent/DE69032861T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Aerials With Secondary Devices (AREA)
DE69032861T 1989-03-09 1990-03-07 Reflektoreinrichtung und diese Einrichtung verwendendes Musterübertragungsgerät Expired - Fee Related DE69032861T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP5518289 1989-03-09
JP2037214A JP2891737B2 (ja) 1989-03-09 1990-02-20 反射装置及び転写装置
JP2051174A JP2749937B2 (ja) 1990-03-02 1990-03-02 露光装置

Publications (2)

Publication Number Publication Date
DE69032861D1 true DE69032861D1 (de) 1999-02-11
DE69032861T2 DE69032861T2 (de) 1999-06-10

Family

ID=27289373

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69032861T Expired - Fee Related DE69032861T2 (de) 1989-03-09 1990-03-07 Reflektoreinrichtung und diese Einrichtung verwendendes Musterübertragungsgerät

Country Status (3)

Country Link
US (1) US5150151A (de)
EP (1) EP0387038B1 (de)
DE (1) DE69032861T2 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5394451A (en) * 1991-10-08 1995-02-28 Canon Kabushiki Kaisha Optical arrangement for exposure apparatus
JPH0772318A (ja) * 1993-04-28 1995-03-17 Canon Inc 反射装置とこれを用いた照明装置や露光装置、並びにデバイス製造方法
JP3167074B2 (ja) * 1993-06-30 2001-05-14 キヤノン株式会社 Ｓｏｒ露光システム及びこれを用いて製造されたマスク
US6289076B1 (en) 1997-05-06 2001-09-11 Sumitomo Heavy Industries, Ltd. Transmission system for synchrotron radiation light
JP3631045B2 (ja) 1999-06-16 2005-03-23 キヤノン株式会社 駆動装置、光学素子駆動装置、露光装置およびデバイス製造方法
KR20060014359A (ko) 2003-03-24 2006-02-15 가부시키가이샤 니콘 광학 소자, 광학계, 레이저 장치, 노광 장치, 마스크 검사장치 및 고분자 결정 가공 장치

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2056600A (en) * 1932-12-21 1936-10-06 Frank B Crosier Process and apparatus for producing stereopticon motion pictures
US3194142A (en) * 1963-09-26 1965-07-13 Mosaic Fabrications Inc Optical image transfer device
US3254933A (en) * 1963-10-24 1966-06-07 E D L Dimension Inc Movie camera
US3280696A (en) * 1964-02-28 1966-10-25 Kourken K Ketchian Vibrating glass screen
JPS5815769B2 (ja) * 1974-09-11 1983-03-28 キヤノン株式会社 ソウサコウガクケイ
US4187475A (en) * 1978-01-05 1980-02-05 Analytical Radiation Corp. Continuously variable laser output coupler
JPS59124324A (ja) * 1982-12-30 1984-07-18 Yuki Tsukamoto 光学機器の水滴排除装置
JPS60168147A (ja) * 1984-02-10 1985-08-31 Oak Seisakusho:Kk 露光装置
JPS60208828A (ja) * 1984-04-02 1985-10-21 Canon Inc Ｘ線露光装置
US4982222A (en) * 1986-07-28 1991-01-01 Xerox Corporation Imaging system utilizing an oscillating gradient index lens array

Also Published As

Publication number Publication date
DE69032861T2 (de) 1999-06-10
US5150151A (en) 1992-09-22
EP0387038B1 (de) 1998-12-30
EP0387038A2 (de) 1990-09-12
EP0387038A3 (de) 1991-08-21

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee