DE69029603D1 - Verfahren zur Kontrastoptimierung für Fotolacke - Google Patents

Verfahren zur Kontrastoptimierung für Fotolacke

Info

Publication number
DE69029603D1
DE69029603D1 DE69029603T DE69029603T DE69029603D1 DE 69029603 D1 DE69029603 D1 DE 69029603D1 DE 69029603 T DE69029603 T DE 69029603T DE 69029603 T DE69029603 T DE 69029603T DE 69029603 D1 DE69029603 D1 DE 69029603D1
Authority
DE
Germany
Prior art keywords
photoresists
optimization process
contrast optimization
contrast
optimization
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69029603T
Other languages
English (en)
Other versions
DE69029603T2 (de
Inventor
Whitson Gamaliel Waldo Iii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Motorola Solutions Inc
Original Assignee
Motorola Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Motorola Inc filed Critical Motorola Inc
Publication of DE69029603D1 publication Critical patent/DE69029603D1/de
Application granted granted Critical
Publication of DE69029603T2 publication Critical patent/DE69029603T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70583—Speckle reduction, e.g. coherence control or amplitude/wavefront splitting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
DE69029603T 1989-05-25 1990-05-25 Verfahren zur Kontrastoptimierung für Fotolacke Expired - Fee Related DE69029603T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/356,488 US4891094A (en) 1989-05-25 1989-05-25 Method of optimizing photoresist contrast

Publications (2)

Publication Number Publication Date
DE69029603D1 true DE69029603D1 (de) 1997-02-20
DE69029603T2 DE69029603T2 (de) 1997-07-03

Family

ID=23401641

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69029603T Expired - Fee Related DE69029603T2 (de) 1989-05-25 1990-05-25 Verfahren zur Kontrastoptimierung für Fotolacke

Country Status (5)

Country Link
US (1) US4891094A (de)
EP (1) EP0399837B1 (de)
JP (1) JP2910157B2 (de)
KR (1) KR900019170A (de)
DE (1) DE69029603T2 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06267813A (ja) * 1993-03-10 1994-09-22 Hitachi Ltd 露光パターン形成装置
US5937327A (en) * 1993-04-23 1999-08-10 Ricoh Company, Ltd. Method for improving wiring contact in semiconductor devices
JPH08130246A (ja) * 1994-10-28 1996-05-21 Ricoh Co Ltd 半導体装置とその製造方法
US5879866A (en) * 1994-12-19 1999-03-09 International Business Machines Corporation Image recording process with improved image tolerances using embedded AR coatings
KR980005334A (ko) * 1996-06-04 1998-03-30 고노 시게오 노광 방법 및 노광 장치
US6132940A (en) * 1998-12-16 2000-10-17 International Business Machines Corporation Method for producing constant profile sidewalls
GB9916730D0 (en) * 1999-07-16 1999-09-15 Mitel Semiconductor Ltd Integrated circuit manufacture
US7506299B2 (en) 2003-12-19 2009-03-17 Asml Holding N.V. Feature optimization using interference mapping lithography
SG125970A1 (en) * 2003-12-19 2006-10-30 Asml Masktools Bv Feature optimization using interference mapping lithography
US20100290157A1 (en) * 2009-05-14 2010-11-18 Western Digital (Fremont), Llc Damascene coil processes and structures
US9245545B1 (en) 2013-04-12 2016-01-26 Wester Digital (Fremont), Llc Short yoke length coils for magnetic heads in disk drives

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5851514A (ja) * 1981-09-22 1983-03-26 Toshiba Corp ウエハ露光方法及びその装置
US4462860A (en) * 1982-05-24 1984-07-31 At&T Bell Laboratories End point detection
JPS60149130A (ja) * 1984-01-17 1985-08-06 Hitachi Ltd パターン検出方法およびそれに用いる反射防止膜用材料
US4618233A (en) * 1985-05-20 1986-10-21 Shipley Company Inc. Scanning wedge method for determining characteristics of a photoresist

Also Published As

Publication number Publication date
JPH0387014A (ja) 1991-04-11
EP0399837B1 (de) 1997-01-08
DE69029603T2 (de) 1997-07-03
EP0399837A2 (de) 1990-11-28
US4891094A (en) 1990-01-02
JP2910157B2 (ja) 1999-06-23
EP0399837A3 (de) 1992-04-08
KR900019170A (ko) 1990-12-24

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8320 Willingness to grant licences declared (paragraph 23)
8339 Ceased/non-payment of the annual fee