DE69029480T2 - Plasma-Reaktionsgerät und Substrat-Behandlungsverfahren - Google Patents

Plasma-Reaktionsgerät und Substrat-Behandlungsverfahren

Info

Publication number
DE69029480T2
DE69029480T2 DE69029480T DE69029480T DE69029480T2 DE 69029480 T2 DE69029480 T2 DE 69029480T2 DE 69029480 T DE69029480 T DE 69029480T DE 69029480 T DE69029480 T DE 69029480T DE 69029480 T2 DE69029480 T2 DE 69029480T2
Authority
DE
Germany
Prior art keywords
treatment process
reaction device
plasma reaction
substrate treatment
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69029480T
Other languages
English (en)
Other versions
DE69029480D1 (de
Inventor
Jes Asmussen
Donnie K Reinhard
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Michigan State University MSU
Original Assignee
Michigan State University MSU
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Michigan State University MSU filed Critical Michigan State University MSU
Application granted granted Critical
Publication of DE69029480D1 publication Critical patent/DE69029480D1/de
Publication of DE69029480T2 publication Critical patent/DE69029480T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32357—Generation remote from the workpiece, e.g. down-stream
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/452—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by activating reactive gas streams before their introduction into the reaction chamber, e.g. by ionisation or addition of reactive species
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • ing And Chemical Polishing (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
DE69029480T 1989-03-23 1990-03-15 Plasma-Reaktionsgerät und Substrat-Behandlungsverfahren Expired - Fee Related DE69029480T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/328,017 US4943345A (en) 1989-03-23 1989-03-23 Plasma reactor apparatus and method for treating a substrate

Publications (2)

Publication Number Publication Date
DE69029480D1 DE69029480D1 (de) 1997-02-06
DE69029480T2 true DE69029480T2 (de) 1997-04-10

Family

ID=23279149

Family Applications (2)

Application Number Title Priority Date Filing Date
DE199090104938T Pending DE388800T1 (de) 1989-03-23 1990-03-15 Plasma-reaktionsgeraet und substrat-behandlungsverfahren.
DE69029480T Expired - Fee Related DE69029480T2 (de) 1989-03-23 1990-03-15 Plasma-Reaktionsgerät und Substrat-Behandlungsverfahren

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE199090104938T Pending DE388800T1 (de) 1989-03-23 1990-03-15 Plasma-reaktionsgeraet und substrat-behandlungsverfahren.

Country Status (9)

Country Link
US (1) US4943345A (de)
EP (1) EP0388800B1 (de)
JP (1) JP2553947B2 (de)
AT (1) ATE146899T1 (de)
CA (1) CA2008926C (de)
DE (2) DE388800T1 (de)
DK (1) DK0388800T3 (de)
ES (1) ES2018129T3 (de)
GR (1) GR900300199T1 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10140465A1 (de) * 2001-08-17 2003-03-06 Mtu Aero Engines Gmbh Verfahren und Vorrichtung zur Beschichtung von Siliziumcarbidfasern

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10140465A1 (de) * 2001-08-17 2003-03-06 Mtu Aero Engines Gmbh Verfahren und Vorrichtung zur Beschichtung von Siliziumcarbidfasern
DE10140465B4 (de) * 2001-08-17 2005-06-30 Mtu Aero Engines Gmbh Verfahren zur Beschichtung einer Siliziumcarbidfaser

Also Published As

Publication number Publication date
EP0388800B1 (de) 1996-12-27
DE388800T1 (de) 1991-02-07
GR900300199T1 (en) 1991-10-10
DK0388800T3 (da) 1997-06-09
CA2008926A1 (en) 1990-09-23
DE69029480D1 (de) 1997-02-06
CA2008926C (en) 1994-03-29
US4943345A (en) 1990-07-24
JPH02282482A (ja) 1990-11-20
ATE146899T1 (de) 1997-01-15
EP0388800A3 (de) 1991-07-03
ES2018129A4 (es) 1991-04-01
EP0388800A2 (de) 1990-09-26
JP2553947B2 (ja) 1996-11-13
ES2018129T3 (es) 1997-05-01

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