DE69028644D1 - Integrierte Schaltung und Herstellungsverfahren - Google Patents
Integrierte Schaltung und HerstellungsverfahrenInfo
- Publication number
- DE69028644D1 DE69028644D1 DE69028644T DE69028644T DE69028644D1 DE 69028644 D1 DE69028644 D1 DE 69028644D1 DE 69028644 T DE69028644 T DE 69028644T DE 69028644 T DE69028644 T DE 69028644T DE 69028644 D1 DE69028644 D1 DE 69028644D1
- Authority
- DE
- Germany
- Prior art keywords
- integrated circuit
- manufacturing process
- manufacturing
- integrated
- circuit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/06—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
- H01L27/0611—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region
- H01L27/0617—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region comprising components of the field-effect type
- H01L27/0623—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region comprising components of the field-effect type in combination with bipolar transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/06—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
- H01L27/0605—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits made of compound material, e.g. AIIIBV
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Bipolar Transistors (AREA)
- Junction Field-Effect Transistors (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US31210089A | 1989-02-16 | 1989-02-16 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69028644D1 true DE69028644D1 (de) | 1996-10-31 |
DE69028644T2 DE69028644T2 (de) | 1997-02-13 |
Family
ID=23209888
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE1990628644 Expired - Fee Related DE69028644T2 (de) | 1989-02-16 | 1990-01-17 | Integrierte Schaltung und Herstellungsverfahren |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP0383034B1 (de) |
JP (1) | JPH02298070A (de) |
DE (1) | DE69028644T2 (de) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5166083A (en) * | 1991-03-28 | 1992-11-24 | Texas Instruments Incorporated | Method of integrating heterojunction bipolar transistors with heterojunction FETs and PIN diodes |
JPH0945692A (ja) * | 1995-07-27 | 1997-02-14 | Sharp Corp | 縦型構造トランジスタ及びその製造方法、並びに半導体装置 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4611388A (en) * | 1983-04-14 | 1986-09-16 | Allied Corporation | Method of forming an indium phosphide-boron phosphide heterojunction bipolar transistor |
US4712122A (en) * | 1984-07-26 | 1987-12-08 | Research Development Corp. | Heterojunction gate ballistic JFET with channel thinner than Debye length |
KR910006751B1 (ko) * | 1987-01-27 | 1991-09-02 | 후지쓰 가부시끼가이샤 | 반도체 집적회로장치 및 그의 제조방법 |
-
1990
- 1990-01-17 DE DE1990628644 patent/DE69028644T2/de not_active Expired - Fee Related
- 1990-01-17 EP EP90100912A patent/EP0383034B1/de not_active Expired - Lifetime
- 1990-02-16 JP JP2036019A patent/JPH02298070A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
DE69028644T2 (de) | 1997-02-13 |
EP0383034A1 (de) | 1990-08-22 |
JPH02298070A (ja) | 1990-12-10 |
EP0383034B1 (de) | 1996-09-25 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE69615437D1 (de) | Integrierte Schaltungsanordnung und Herstellungsverfahren | |
DE69026164D1 (de) | Halbleitende integrierte Schaltung | |
KR910008793A (ko) | 반도체장치 및 그 제조방법 | |
KR900012345A (ko) | 집적 회로 칩 | |
DE69117656D1 (de) | Therapiehandschuh und Herstellungsverfahren | |
DE69031551D1 (de) | Integrierte Halbleiterschaltung und Testmethode dafür | |
DE69032919D1 (de) | Zusammengestellte Schaltungsplatte und Herstellungsverfahren dafür | |
DE69429906D1 (de) | Halbleiterstruktur und Herstellungsverfahren | |
DE69730775D1 (de) | Logische Schaltung und zugehöriges Herstellungsverfahren | |
KR900012359A (ko) | 집적회로 칩 | |
DE69030327D1 (de) | Stickstoffherstellungsverfahren | |
KR890013782A (ko) | 광전자집적회로 및 그 제조방법 | |
KR890015418A (ko) | 반도체 집적회로와 그 제조방법 | |
DE69023469D1 (de) | Integrierte Schaltung und Herstellungsverfahren dafür. | |
DE69031671D1 (de) | Integrierte Halbleiterschaltung | |
DE69029468D1 (de) | Integrierte Schaltungsanordnung | |
KR900015301A (ko) | 반도체장치 및 그 제조방법 | |
DE69031846D1 (de) | Integrierte BICMOS-Schaltung | |
KR900007287A (ko) | 인쇄회로 및 그 제조공정 | |
KR900012360A (ko) | 반도체 집적회로와 그 제조방법 | |
DE69027831D1 (de) | Integrierte MOS-Schaltung | |
KR900015198A (ko) | 캐패시터 및 그의 제조방법 | |
DE69026226D1 (de) | Integrierte Halbleiterschaltung | |
KR900015277A (ko) | 반도체장치 및 그 제조방법 | |
KR900007103A (ko) | 반도체 집적회로와 그 제조방법 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |