DE69026056D1 - Scanner-Vorrichtung - Google Patents

Scanner-Vorrichtung

Info

Publication number
DE69026056D1
DE69026056D1 DE69026056T DE69026056T DE69026056D1 DE 69026056 D1 DE69026056 D1 DE 69026056D1 DE 69026056 T DE69026056 T DE 69026056T DE 69026056 T DE69026056 T DE 69026056T DE 69026056 D1 DE69026056 D1 DE 69026056D1
Authority
DE
Germany
Prior art keywords
scanner device
scanner
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69026056T
Other languages
English (en)
Other versions
DE69026056T2 (de
Inventor
Takashi Iizuka
Yutaka Watanabe
Yasuaki Fukuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Application granted granted Critical
Publication of DE69026056D1 publication Critical patent/DE69026056D1/de
Publication of DE69026056T2 publication Critical patent/DE69026056T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/061—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements characterised by a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Filters (AREA)
DE1990626056 1989-12-28 1990-12-24 Scanner-Vorrichtung Expired - Fee Related DE69026056T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1344842A JP2742122B2 (ja) 1989-12-28 1989-12-28 照明系及びｘ線露光装置

Publications (2)

Publication Number Publication Date
DE69026056D1 true DE69026056D1 (de) 1996-04-25
DE69026056T2 DE69026056T2 (de) 1997-01-23

Family

ID=18372402

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1990626056 Expired - Fee Related DE69026056T2 (de) 1989-12-28 1990-12-24 Scanner-Vorrichtung

Country Status (3)

Country Link
EP (1) EP0435644B1 (de)
JP (1) JP2742122B2 (de)
DE (1) DE69026056T2 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1280008B2 (de) * 2001-07-27 2011-09-14 Canon Kabushiki Kaisha Belichtungssystem, Projektionsbelichtungsapparat und Verfahren zur Herstellung eines Artikels
KR101140200B1 (ko) * 2008-01-30 2012-05-02 리플렉티브 엑스-레이 옵틱스 엘엘씨 Ｘ선 촬영법에 의한 ｘ선 촬상 시스템을 위한 미러의 장착, 위치 맞춤, 주사 기구 및 주사 방법, 그들을 구비한 ｘ선 촬상 장치

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0083394B1 (de) * 1981-12-31 1986-04-09 International Business Machines Corporation Verfahren und Vorrichtung für die gleichmässige Beleuchtung einer Fläche
JPS59220707A (ja) * 1983-05-31 1984-12-12 Toshiba Corp 光学装置
JPS60181704A (ja) * 1984-02-29 1985-09-17 Canon Inc 真空紫外用反射ミラー
JPS60226122A (ja) * 1984-04-25 1985-11-11 Hitachi Ltd 光反射鏡および露光装置
JPS61154034A (ja) * 1984-12-26 1986-07-12 Fujitsu Ltd Ｘ線露光装置
JPS62222634A (ja) * 1986-03-18 1987-09-30 Fujitsu Ltd Ｘ線露光方法
JPS6361200A (ja) * 1986-09-01 1988-03-17 日本電信電話株式会社 Ｘ線集光多層膜分光素子
JPH0196600A (ja) * 1987-10-09 1989-04-14 Hitachi Ltd Ｘ線露光装置

Also Published As

Publication number Publication date
EP0435644B1 (de) 1996-03-20
EP0435644A3 (en) 1992-01-02
JP2742122B2 (ja) 1998-04-22
JPH03202802A (ja) 1991-09-04
DE69026056T2 (de) 1997-01-23
EP0435644A2 (de) 1991-07-03

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Legal Events

Date Code Title Description
8332 No legal effect for de
8370 Indication of lapse of patent is to be deleted
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee