DE69021821D1 - Verfahren und Anlage zum Herstellen von Hartstoff. - Google Patents

Verfahren und Anlage zum Herstellen von Hartstoff.

Info

Publication number
DE69021821D1
DE69021821D1 DE69021821T DE69021821T DE69021821D1 DE 69021821 D1 DE69021821 D1 DE 69021821D1 DE 69021821 T DE69021821 T DE 69021821T DE 69021821 T DE69021821 T DE 69021821T DE 69021821 D1 DE69021821 D1 DE 69021821D1
Authority
DE
Germany
Prior art keywords
plant
hard material
producing hard
producing
hard
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69021821T
Other languages
English (en)
Other versions
DE69021821T2 (de
Inventor
Hiromu Shiomi
Naoji Fujimori
Nobuhiro Ota
Takahiro Imai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2231649A external-priority patent/JPH03174397A/ja
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Publication of DE69021821D1 publication Critical patent/DE69021821D1/de
Application granted granted Critical
Publication of DE69021821T2 publication Critical patent/DE69021821T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C23C16/274—Diamond only using microwave discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C23C16/277—Diamond only using other elements in the gas phase besides carbon and hydrogen; using other elements besides carbon, hydrogen and oxygen in case of use of combustion torches; using other elements besides carbon, hydrogen and inert gas in case of use of plasma jets
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C23C16/342—Boron nitride
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Combustion & Propulsion (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
DE69021821T 1989-09-20 1990-09-18 Verfahren und Anlage zum Herstellen von Hartstoff. Expired - Fee Related DE69021821T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP24574989 1989-09-20
JP2231649A JPH03174397A (ja) 1989-09-20 1990-08-31 硬質物質の合成方法およびその合成装置

Publications (2)

Publication Number Publication Date
DE69021821D1 true DE69021821D1 (de) 1995-09-28
DE69021821T2 DE69021821T2 (de) 1996-05-30

Family

ID=26530000

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69021821T Expired - Fee Related DE69021821T2 (de) 1989-09-20 1990-09-18 Verfahren und Anlage zum Herstellen von Hartstoff.

Country Status (3)

Country Link
US (2) US5242663A (de)
EP (1) EP0423498B1 (de)
DE (1) DE69021821T2 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5470541A (en) * 1993-12-28 1995-11-28 E. I. Du Pont De Nemours And Company Apparatus and process for the preparation of hydrogen cyanide
US6132550A (en) * 1995-08-11 2000-10-17 Sumitomo Electric Industries, Ltd. Apparatuses for desposition or etching
US5976716A (en) * 1996-04-04 1999-11-02 Kennametal Inc. Substrate with a superhard coating containing boron and nitrogen and method of making the same
US5948541A (en) * 1996-04-04 1999-09-07 Kennametal Inc. Boron and nitrogen containing coating and method for making
US6015597A (en) * 1997-11-26 2000-01-18 3M Innovative Properties Company Method for coating diamond-like networks onto particles
GB0126419D0 (en) * 2001-11-03 2002-01-02 Accentus Plc Microwave plasma generator
RU2215061C1 (ru) * 2002-09-30 2003-10-27 Институт прикладной физики РАН Высокоскоростной способ осаждения алмазных пленок из газовой фазы в плазме свч-разряда и плазменный реактор для его реализации
US7776408B2 (en) * 2007-02-14 2010-08-17 Rajneesh Bhandari Method and apparatus for producing single crystalline diamonds
US9545609B2 (en) 2009-08-13 2017-01-17 Tekgar, Llv Pyrolysis oil made with a microwave-transparent reaction chamber for production of fuel from an organic-carbon-containing feedstock
US8361282B2 (en) * 2009-08-13 2013-01-29 Tekgar, Llc System and method using a microwave-transparent reaction chamber for production of fuel from a carbon-containing feedstock
US8633648B2 (en) 2011-06-28 2014-01-21 Recarbon, Inc. Gas conversion system
US9763287B2 (en) * 2011-11-30 2017-09-12 Michael R. Knox Single mode microwave device for producing exfoliated graphite
US9540580B2 (en) 2013-01-28 2017-01-10 Tekgar, Llv Char made with a microwave-transparent reaction chamber for production of fuel from an organic-carbon-containing feedstock
CN109825821B (zh) * 2019-03-19 2020-02-04 中南大学 一种金刚石/cbn复合涂层硬质合金刀具、制备方法及装置

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4233109A (en) * 1976-01-16 1980-11-11 Zaidan Hojin Handotai Kenkyu Shinkokai Dry etching method
JPS5933532B2 (ja) * 1981-04-03 1984-08-16 スタンレー電気株式会社 非晶質シリコンの形成方法
FR2512645B1 (fr) * 1981-09-17 1985-06-21 Caudry Produits Alimentaires Procede de fabrication de produits alimentaires surgeles comprenant une superposition de couches de pates et de sauces et produits derives
US4414085A (en) * 1981-10-08 1983-11-08 Wickersham Charles E Method of depositing a high-emissivity layer
JPS593098A (ja) * 1982-06-24 1984-01-09 Natl Inst For Res In Inorg Mater ダイヤモンドの合成法
JPS5927754B2 (ja) * 1981-12-17 1984-07-07 科学技術庁無機材質研究所長 ダイヤモンドの合成法
US4434188A (en) * 1981-12-17 1984-02-28 National Institute For Researches In Inorganic Materials Method for synthesizing diamond
JPS5963732A (ja) * 1982-10-04 1984-04-11 Hitachi Ltd 薄膜形成装置
US4663183A (en) * 1984-09-10 1987-05-05 Energy Conversion Devices, Inc. Glow discharge method of applying a carbon coating onto a substrate
JPS61174378A (ja) * 1985-01-28 1986-08-06 Toshiba Tungaloy Co Ltd 硬質窒化ホウ素被覆材料の製造方法
US4711767A (en) * 1985-02-05 1987-12-08 Psi Star Plasma reactor with voltage transformer
US4600563A (en) * 1985-02-05 1986-07-15 Psi Star Incorporated Plasma reactor with voltage transformer
US4725345A (en) * 1985-04-22 1988-02-16 Kabushiki Kaisha Kenwood Method for forming a hard carbon thin film on article and applications thereof
JPS6227533A (ja) * 1985-07-26 1987-02-05 Japan Synthetic Rubber Co Ltd 内部酸化型合金およびその成形物の製造方法
US4816286A (en) * 1985-11-25 1989-03-28 Showa Denko Kabushiki Kaisha Process for synthesis of diamond by CVD
US4673589A (en) * 1986-02-18 1987-06-16 Amoco Corporation Photoconducting amorphous carbon
JPS63107899A (ja) * 1986-10-24 1988-05-12 Semiconductor Energy Lab Co Ltd 薄膜形成方法
EP0273741B1 (de) * 1986-12-29 1991-10-23 Sumitomo Metal Industries, Ltd. Plasmagerät
DE3705666A1 (de) * 1987-02-21 1988-09-01 Leybold Ag Einrichtung zum herstellen eines plasmas und zur behandlung von substraten darin
KR900008505B1 (ko) * 1987-02-24 1990-11-24 세미콘덕터 에너지 라보라터리 캄파니 리미티드 탄소 석출을 위한 마이크로파 강화 cvd 방법
JPS6461396A (en) * 1987-09-01 1989-03-08 Idemitsu Petrochemical Co Synthesis of diamond and installation therefor
US4935303A (en) * 1987-10-15 1990-06-19 Canon Kabushiki Kaisha Novel diamond-like carbon film and process for the production thereof
US4902535A (en) * 1987-12-31 1990-02-20 Air Products And Chemicals, Inc. Method for depositing hard coatings on titanium or titanium alloys
US4971667A (en) * 1988-02-05 1990-11-20 Semiconductor Energy Laboratory Co., Ltd. Plasma processing method and apparatus
JPH0215174A (ja) * 1988-07-01 1990-01-18 Canon Inc マイクロ波プラズマｃｖｄ装置

Also Published As

Publication number Publication date
US5436036A (en) 1995-07-25
EP0423498B1 (de) 1995-08-23
EP0423498A2 (de) 1991-04-24
EP0423498A3 (en) 1991-05-08
US5242663A (en) 1993-09-07
DE69021821T2 (de) 1996-05-30

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Legal Events

Date Code Title Description
8332 No legal effect for de
8370 Indication related to discontinuation of the patent is to be deleted
8364 No opposition during term of opposition
8320 Willingness to grant licences declared (paragraph 23)
8328 Change in the person/name/address of the agent

Representative=s name: GROSSE, BOCKHORNI, SCHUMACHER, 81476 MUENCHEN

8339 Ceased/non-payment of the annual fee