DE69018299T2 - Verfahren zum Herstellen einer Platte für die Kontrolle der Streuung des Lichtes in verschiedene Richtungen. - Google Patents

Verfahren zum Herstellen einer Platte für die Kontrolle der Streuung des Lichtes in verschiedene Richtungen.

Info

Publication number
DE69018299T2
DE69018299T2 DE69018299T DE69018299T DE69018299T2 DE 69018299 T2 DE69018299 T2 DE 69018299T2 DE 69018299 T DE69018299 T DE 69018299T DE 69018299 T DE69018299 T DE 69018299T DE 69018299 T2 DE69018299 T2 DE 69018299T2
Authority
DE
Germany
Prior art keywords
scattering
controlling
making
light
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69018299T
Other languages
English (en)
Other versions
DE69018299D1 (de
Inventor
Toshifumi Tsujino
Kiochi Maeda
Satoshi Ishizuka
Hiroaki Yamamoto
Shinichiro Kitayama
Shigeo Hozumi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Sheet Glass Co Ltd
Sumitomo Chemical Co Ltd
Original Assignee
Nippon Sheet Glass Co Ltd
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Sheet Glass Co Ltd, Sumitomo Chemical Co Ltd filed Critical Nippon Sheet Glass Co Ltd
Application granted granted Critical
Publication of DE69018299D1 publication Critical patent/DE69018299D1/de
Publication of DE69018299T2 publication Critical patent/DE69018299T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/02Diffusing elements; Afocal elements
    • G02B5/0205Diffusing elements; Afocal elements characterised by the diffusing properties
    • G02B5/0236Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place within the volume of the element
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/02Diffusing elements; Afocal elements
    • G02B5/0205Diffusing elements; Afocal elements characterised by the diffusing properties
    • G02B5/0257Diffusing elements; Afocal elements characterised by the diffusing properties creating an anisotropic diffusion characteristic, i.e. distributing output differently in two perpendicular axes
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/02Diffusing elements; Afocal elements
    • G02B5/0268Diffusing elements; Afocal elements characterized by the fabrication or manufacturing method
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/02Diffusing elements; Afocal elements
    • G02B5/0273Diffusing elements; Afocal elements characterized by the use
    • G02B5/0278Diffusing elements; Afocal elements characterized by the use used in transmission
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Optical Elements Other Than Lenses (AREA)
DE69018299T 1989-04-12 1990-04-12 Verfahren zum Herstellen einer Platte für die Kontrolle der Streuung des Lichtes in verschiedene Richtungen. Expired - Fee Related DE69018299T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9215189 1989-04-12

Publications (2)

Publication Number Publication Date
DE69018299D1 DE69018299D1 (de) 1995-05-11
DE69018299T2 true DE69018299T2 (de) 1995-09-21

Family

ID=14046424

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69018299T Expired - Fee Related DE69018299T2 (de) 1989-04-12 1990-04-12 Verfahren zum Herstellen einer Platte für die Kontrolle der Streuung des Lichtes in verschiedene Richtungen.

Country Status (3)

Country Link
US (1) US5112722A (de)
EP (1) EP0392868B1 (de)
DE (1) DE69018299T2 (de)

Families Citing this family (53)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5040870A (en) * 1989-10-13 1991-08-20 Sumitomo Chemical Company, Limited Screen for projection
SG75086A1 (en) * 1993-08-25 2000-09-19 Sumitomo Chemical Co Filter for liquid crystal display element
GB2287553A (en) * 1994-03-10 1995-09-20 Sharp Kk A method of manufacturing a diffuser
WO1996007954A1 (en) * 1994-09-09 1996-03-14 Board Of Supervisors Of Louisiana State University And Agricultural And Mechanical College Microstructures and methods for manufacturing microstructures
US5767935A (en) * 1995-08-31 1998-06-16 Sumitomo Chemical Company, Limited Light control sheet and liquid crystal display device comprising the same
US6010747A (en) * 1996-12-02 2000-01-04 Alliedsignal Inc. Process for making optical structures for diffusing light
JP3760603B2 (ja) * 1997-10-31 2006-03-29 住友化学株式会社 光制御板の製造方法
US5920380A (en) * 1997-12-19 1999-07-06 Sandia Corporation Apparatus and method for generating partially coherent illumination for photolithography
US7446827B2 (en) * 2004-10-15 2008-11-04 3M Innovative Properties Company Direct-lit liquid crystal displays with laminated diffuser plates
US7436469B2 (en) * 2004-10-15 2008-10-14 3M Innovative Properties Company Composite diffuser plates and direct-lit liquid crystal displays using same
US7710511B2 (en) * 2004-10-15 2010-05-04 3M Innovative Properties Company Liquid crystal displays with laminated diffuser plates
KR20060111386A (ko) * 2005-04-22 2006-10-27 스미또모 가가꾸 가부시끼가이샤 광제어 필름 제조방법
JP4802707B2 (ja) * 2005-05-17 2011-10-26 住友化学株式会社 光制御膜
US20060291055A1 (en) * 2005-06-15 2006-12-28 3M Innovative Properties Company Diffuse Multilayer Optical Article
US7924368B2 (en) * 2005-12-08 2011-04-12 3M Innovative Properties Company Diffuse multilayer optical assembly
US20070203267A1 (en) * 2006-02-28 2007-08-30 3M Innovative Properties Company Optical display with fluted optical plate
US7766531B2 (en) * 2006-03-29 2010-08-03 3M Innovative Properties Company Edge-lit optical display with fluted optical plate
US20070236413A1 (en) * 2006-03-29 2007-10-11 3M Innovative Properties Company Fluted optical plate with internal light sources and systems using same
WO2014079478A1 (en) 2012-11-20 2014-05-30 Light In Light Srl High speed laser processing of transparent materials
EP2754524B1 (de) 2013-01-15 2015-11-25 Corning Laser Technologies GmbH Verfahren und Vorrichtung zum laserbasierten Bearbeiten von flächigen Substraten, d.h. Wafer oder Glaselement, unter Verwendung einer Laserstrahlbrennlinie
EP2781296B1 (de) 2013-03-21 2020-10-21 Corning Laser Technologies GmbH Vorrichtung und verfahren zum ausschneiden von konturen aus flächigen substraten mittels laser
US9701563B2 (en) 2013-12-17 2017-07-11 Corning Incorporated Laser cut composite glass article and method of cutting
US9517963B2 (en) 2013-12-17 2016-12-13 Corning Incorporated Method for rapid laser drilling of holes in glass and products made therefrom
US11556039B2 (en) 2013-12-17 2023-01-17 Corning Incorporated Electrochromic coated glass articles and methods for laser processing the same
US9815730B2 (en) 2013-12-17 2017-11-14 Corning Incorporated Processing 3D shaped transparent brittle substrate
US10442719B2 (en) 2013-12-17 2019-10-15 Corning Incorporated Edge chamfering methods
US20150165560A1 (en) 2013-12-17 2015-06-18 Corning Incorporated Laser processing of slots and holes
US9850160B2 (en) 2013-12-17 2017-12-26 Corning Incorporated Laser cutting of display glass compositions
US9676167B2 (en) 2013-12-17 2017-06-13 Corning Incorporated Laser processing of sapphire substrate and related applications
US9815144B2 (en) 2014-07-08 2017-11-14 Corning Incorporated Methods and apparatuses for laser processing materials
US10611667B2 (en) 2014-07-14 2020-04-07 Corning Incorporated Method and system for forming perforations
EP3536440A1 (de) 2014-07-14 2019-09-11 Corning Incorporated Glasartikel mit einem defektweg
CN107073641B (zh) 2014-07-14 2020-11-10 康宁股份有限公司 接口块;用于使用这种接口块切割在波长范围内透明的衬底的系统和方法
CN107073642B (zh) * 2014-07-14 2020-07-28 康宁股份有限公司 使用长度和直径可调的激光束焦线来加工透明材料的系统和方法
US10047001B2 (en) 2014-12-04 2018-08-14 Corning Incorporated Glass cutting systems and methods using non-diffracting laser beams
EP3245166B1 (de) 2015-01-12 2020-05-27 Corning Incorporated Laserschneiden von thermisch vorgespannten substraten mit einem multi-photonenabsorptionsverfahren
WO2016138054A1 (en) 2015-02-27 2016-09-01 Corning Incorporated Optical assembly having microlouvers
HUE055461T2 (hu) 2015-03-24 2021-11-29 Corning Inc Kijelzõ üveg kompozíciók lézeres vágása és feldolgozása
CN107666983B (zh) 2015-03-27 2020-10-02 康宁股份有限公司 可透气窗及其制造方法
WO2017011296A1 (en) 2015-07-10 2017-01-19 Corning Incorporated Methods of continuous fabrication of holes in flexible substrate sheets and products relating to the same
SG11201809797PA (en) 2016-05-06 2018-12-28 Corning Inc Laser cutting and removal of contoured shapes from transparent substrates
US10410883B2 (en) 2016-06-01 2019-09-10 Corning Incorporated Articles and methods of forming vias in substrates
US10794679B2 (en) 2016-06-29 2020-10-06 Corning Incorporated Method and system for measuring geometric parameters of through holes
WO2018022476A1 (en) 2016-07-29 2018-02-01 Corning Incorporated Apparatuses and methods for laser processing
US10522963B2 (en) 2016-08-30 2019-12-31 Corning Incorporated Laser cutting of materials with intensity mapping optical system
KR102078294B1 (ko) 2016-09-30 2020-02-17 코닝 인코포레이티드 비-축대칭 빔 스폿을 이용하여 투명 워크피스를 레이저 가공하기 위한 기기 및 방법
KR102428350B1 (ko) 2016-10-24 2022-08-02 코닝 인코포레이티드 시트형 유리 기판의 레이저 기반 기계 가공을 위한 기판 프로세싱 스테이션
US10752534B2 (en) 2016-11-01 2020-08-25 Corning Incorporated Apparatuses and methods for laser processing laminate workpiece stacks
US10688599B2 (en) 2017-02-09 2020-06-23 Corning Incorporated Apparatus and methods for laser processing transparent workpieces using phase shifted focal lines
US10580725B2 (en) 2017-05-25 2020-03-03 Corning Incorporated Articles having vias with geometry attributes and methods for fabricating the same
US11078112B2 (en) 2017-05-25 2021-08-03 Corning Incorporated Silica-containing substrates with vias having an axially variable sidewall taper and methods for forming the same
US10626040B2 (en) 2017-06-15 2020-04-21 Corning Incorporated Articles capable of individual singulation
US11554984B2 (en) 2018-02-22 2023-01-17 Corning Incorporated Alkali-free borosilicate glasses with low post-HF etch roughness

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2458087A1 (fr) * 1979-05-28 1980-12-26 Nicolaidis Christian Procede et moyens de fabrication de reseaux de diffraction de la lumiere, et les reseaux ainsi obtenus
JPS57189439A (en) * 1981-05-18 1982-11-20 Asahi Chem Ind Co Ltd Outer light antireflection screen and its manufacturing method
JPS57189489A (en) * 1981-05-18 1982-11-20 Sanyo Electric Co Induction heating cooling device
US4971895A (en) * 1981-10-20 1990-11-20 Sullivan Donald F Double exposure method of photoprinting with liquid photopolymers
JPS60230601A (ja) * 1984-05-01 1985-11-16 Masayasu Negishi 膜処理方法
DE3585753D1 (de) * 1984-07-23 1992-05-07 Asahi Chemical Ind Kunststoffdruckplatte und verfahren zur herstellung.
DE3689606T2 (de) * 1985-10-22 1994-05-19 Kuraray Co Herstellungsverfahren für Phasengitter vom zusammengesetzten Muster-Refraktionstyp.
EP0272582B1 (de) * 1986-12-18 1994-05-18 Sumitomo Chemical Company, Limited Platten für Lichtkontrolle
JP2601832B2 (ja) * 1987-08-07 1997-04-16 日本板硝子株式会社 模様入り板の製造法

Also Published As

Publication number Publication date
EP0392868B1 (de) 1995-04-05
EP0392868A3 (de) 1991-12-11
EP0392868A2 (de) 1990-10-17
US5112722A (en) 1992-05-12
DE69018299D1 (de) 1995-05-11

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee