FR2458087A1 - Procede et moyens de fabrication de reseaux de diffraction de la lumiere, et les reseaux ainsi obtenus - Google Patents

Procede et moyens de fabrication de reseaux de diffraction de la lumiere, et les reseaux ainsi obtenus

Info

Publication number
FR2458087A1
FR2458087A1 FR7913943A FR7913943A FR2458087A1 FR 2458087 A1 FR2458087 A1 FR 2458087A1 FR 7913943 A FR7913943 A FR 7913943A FR 7913943 A FR7913943 A FR 7913943A FR 2458087 A1 FR2458087 A1 FR 2458087A1
Authority
FR
France
Prior art keywords
strip
drying
diffraction grating
machine
photosensitive layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
FR7913943A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NICOLAIDIS CHRISTIAN
Original Assignee
NICOLAIDIS CHRISTIAN
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NICOLAIDIS CHRISTIAN filed Critical NICOLAIDIS CHRISTIAN
Priority to FR7913943A priority Critical patent/FR2458087A1/fr
Publication of FR2458087A1 publication Critical patent/FR2458087A1/fr
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Optics & Photonics (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)

Abstract

L'INVENTION SE RATTACHE NOTAMMENT AUX SECTEURS TECHNIQUES DES APPAREILS ET INSTRUMENTS SCIENTIFIQUES, DES APPAREILS ET DISPOSITIFS POUR L'EXAMEN SPECTRAL ET L'ANALYSE DE LA LUMIERE, DES APPAREILS ET INSTRUMENTS PEDAGOGIQUES, DE LA DECORATION DANS LES APPLICATIONS LES PLUS DIVERSES, DE LA BIJOUTERIE ET DE LA PARURE... LE PROCEDE EST CARACTERISE EN CE QUE L'ON DEPLACE UNE FEUILLE D'ACETATE EN CONTINU LE LONG D'UNE INSTALLATION CONNUE ET AGENCEE A CET EFFET, ON DEPOSE SUR UNE FACE DE CETTE FEUILLE UNE COUCHE DE RESINE PHOTOSENSIBLE QUI PRESENTE UNE EPAISSEUR CONSTANTE, PRECISE ET CONTROLEE, ON SECHE LE FILM, ON REALISE UNE MATRICE OU "MASTER" POUR FORMER PAR PLACAGE ET PAR INSOLATION, LES TRAITS DU RESEAU, ON EFFECTUE ENSUITE UN DEVELOPPEMENT SUIVI D'UN RINCAGE ET D'UN SECHAGE.
FR7913943A 1979-05-28 1979-05-28 Procede et moyens de fabrication de reseaux de diffraction de la lumiere, et les reseaux ainsi obtenus Pending FR2458087A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR7913943A FR2458087A1 (fr) 1979-05-28 1979-05-28 Procede et moyens de fabrication de reseaux de diffraction de la lumiere, et les reseaux ainsi obtenus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7913943A FR2458087A1 (fr) 1979-05-28 1979-05-28 Procede et moyens de fabrication de reseaux de diffraction de la lumiere, et les reseaux ainsi obtenus

Publications (1)

Publication Number Publication Date
FR2458087A1 true FR2458087A1 (fr) 1980-12-26

Family

ID=9226078

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7913943A Pending FR2458087A1 (fr) 1979-05-28 1979-05-28 Procede et moyens de fabrication de reseaux de diffraction de la lumiere, et les reseaux ainsi obtenus

Country Status (1)

Country Link
FR (1) FR2458087A1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0392868A2 (fr) * 1989-04-12 1990-10-17 Nippon Sheet Glass Co. Ltd. Méthode de fabrication d'une plaque pour contrôler la lumière à des angles différents
US10429553B2 (en) 2015-02-27 2019-10-01 Corning Incorporated Optical assembly having microlouvers

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0392868A2 (fr) * 1989-04-12 1990-10-17 Nippon Sheet Glass Co. Ltd. Méthode de fabrication d'une plaque pour contrôler la lumière à des angles différents
EP0392868A3 (fr) * 1989-04-12 1991-12-11 Nippon Sheet Glass Co. Ltd. Méthode de fabrication d'une plaque pour contrôler la lumière à des angles différents
US5112722A (en) * 1989-04-12 1992-05-12 Nippon Sheet Glass Co., Ltd. Method of producing light control plate which induces scattering of light at different angles
US10429553B2 (en) 2015-02-27 2019-10-01 Corning Incorporated Optical assembly having microlouvers

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