DE69014180D1 - Auswertungsapparat für Objektive. - Google Patents

Auswertungsapparat für Objektive.

Info

Publication number
DE69014180D1
DE69014180D1 DE69014180T DE69014180T DE69014180D1 DE 69014180 D1 DE69014180 D1 DE 69014180D1 DE 69014180 T DE69014180 T DE 69014180T DE 69014180 T DE69014180 T DE 69014180T DE 69014180 D1 DE69014180 D1 DE 69014180D1
Authority
DE
Germany
Prior art keywords
lenses
evaluation apparatus
evaluation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69014180T
Other languages
English (en)
Other versions
DE69014180T2 (de
Inventor
Takeo Sato
Masaki Yamamoto
Shinichiro Aoki
Yoshiyuki Sugiyama
Yoshito Nakanishi
Hiroyuki Takeuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP1237797A external-priority patent/JP2543200B2/ja
Priority claimed from JP27284489A external-priority patent/JPH03134538A/ja
Priority claimed from JP27284189A external-priority patent/JPH03134537A/ja
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Publication of DE69014180D1 publication Critical patent/DE69014180D1/de
Application granted granted Critical
Publication of DE69014180T2 publication Critical patent/DE69014180T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0271—Testing optical properties by measuring geometrical properties or aberrations by using interferometric methods
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0257—Testing optical properties by measuring geometrical properties or aberrations by analyzing the image formed by the object to be tested
    • G01M11/0264—Testing optical properties by measuring geometrical properties or aberrations by analyzing the image formed by the object to be tested by using targets or reference patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Geometry (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE69014180T 1989-09-13 1990-09-12 Auswertungsapparat für Objektive. Expired - Fee Related DE69014180T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP1237797A JP2543200B2 (ja) 1989-09-13 1989-09-13 レンズ評価装置
JP27284489A JPH03134538A (ja) 1989-10-19 1989-10-19 レンズ評価装置
JP27284189A JPH03134537A (ja) 1989-10-19 1989-10-19 レンズ評価装置

Publications (2)

Publication Number Publication Date
DE69014180D1 true DE69014180D1 (de) 1994-12-22
DE69014180T2 DE69014180T2 (de) 1995-04-06

Family

ID=27332510

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69014180T Expired - Fee Related DE69014180T2 (de) 1989-09-13 1990-09-12 Auswertungsapparat für Objektive.

Country Status (3)

Country Link
US (1) US5062705A (de)
EP (1) EP0418054B1 (de)
DE (1) DE69014180T2 (de)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3200894B2 (ja) * 1991-03-05 2001-08-20 株式会社日立製作所 露光方法及びその装置
JPH05224158A (ja) * 1992-02-14 1993-09-03 Matsushita Electric Ind Co Ltd 光フィルター及びその光フィルターを用いた光増幅装置
DE4242479A1 (de) * 1992-12-16 1994-06-23 Thomson Brandt Gmbh Verfahren zum Bestimmen der numerischen Apertur, der Blendenzahl und/oder der Brennweite
US5406375A (en) * 1993-07-23 1995-04-11 Grumman Aerospace Corporation Angular distortion measurements by moire fringe patterns
US5767959A (en) * 1997-03-28 1998-06-16 Nikon Corporation Lens distortion measurement using moire fringes
US6084712A (en) * 1998-11-03 2000-07-04 Dynamic Measurement And Inspection,Llc Three dimensional imaging using a refractive optic design
US6816247B1 (en) * 2001-08-14 2004-11-09 Carl Zeiss Smt Ag Moiré method and a system for measuring the distortion of an optical imaging system
DE10154125A1 (de) * 2001-10-25 2003-05-22 Zeiss Carl Semiconductor Mfg Messverfahren und Messsystem zur Vermessung der Abbildungsqualität eines optischen Abbildunsgssystems
SG99416A1 (en) * 2002-03-05 2003-10-27 Asml Netherlands Bv Apparatus and system for improving phase shift mask imaging performance and associated methods
AU2003212309A1 (en) * 2002-03-08 2003-09-22 Carl Zeiss Smt Ag Moire method and measuring system for measuring the distortion of an optical imaging system
WO2004057423A1 (de) * 2002-12-19 2004-07-08 Carl Zeiss Smt Ag Messverfahren und messsystem zur vermessung der abbildungsqualität eines optischen abbildungssystems
US7268891B2 (en) * 2003-01-15 2007-09-11 Asml Holding N.V. Transmission shear grating in checkerboard configuration for EUV wavefront sensor
US6867846B2 (en) * 2003-01-15 2005-03-15 Asml Holding Nv Tailored reflecting diffractor for EUV lithographic system aberration measurement
US7113255B2 (en) 2003-12-19 2006-09-26 Asml Holding N.V. Grating patch arrangement, lithographic apparatus, method of testing, device manufacturing method, and device manufactured thereby
US20050259269A1 (en) * 2004-05-19 2005-11-24 Asml Holding N.V. Shearing interferometer with dynamic pupil fill
WO2005119368A2 (en) * 2004-06-04 2005-12-15 Carl Zeiss Smt Ag System for measuring the image quality of an optical imaging system
JP4539650B2 (ja) * 2006-12-26 2010-09-08 セイコーエプソン株式会社 光学系の光学特性評価方法、プロジェクタの光学特性評価方法、光学特性評価装置、およびスクリーン
DE102011006468B4 (de) * 2011-03-31 2014-08-28 Carl Zeiss Smt Gmbh Vermessung eines abbildenden optischen Systems durch Überlagerung von Mustern
DE102014226269A1 (de) * 2014-12-17 2016-06-23 Carl Zeiss Smt Gmbh Wellenfrontmesseinrichtung, Projektionsobjektiv mit einer solchen Messeinrichtung und mit einer solchen Messeinrichtung zusammenwirkender optischer Wellenfrontmanipulator
DE102015226571B4 (de) 2015-12-22 2019-10-24 Carl Zeiss Smt Gmbh Vorrichtung und Verfahren zur Wellenfrontanalyse
DE102016202198A1 (de) * 2016-02-12 2017-08-17 Carl Zeiss Smt Gmbh Vorrichtung zur Moiré-Vermessung eines optischen Prüflings
ES2600503B2 (es) * 2016-07-21 2017-10-10 Universidad Complutense De Madrid Dispositivo optoelectrónico y métodos para determinar parámetros ópticos de una lente o un sistema de lentes
NL2021357A (en) * 2018-01-31 2018-08-16 Asml Netherlands Bv Two-dimensional diffraction grating

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE417231C (de) * 1925-08-10 Leon Lenouvel Verfahren und Vorrichtung zur Pruefung optischer Systeme, welche bei unendlicher Gegenstandsweite reelle Bilder hervorbringen
US2818775A (en) * 1953-05-12 1958-01-07 Schneider Co Optische Werke Method of and apparatus for objectively testing optical systems
GB844933A (en) * 1956-04-05 1960-08-17 Rochelle Prescott Optical gratings and grids, and the testing of optical elements by means of them
GB1527595A (en) * 1975-12-22 1978-10-04 Sira Institute Apparatus for measuring modulation transfer function of an optical component
JPS55119036A (en) * 1979-03-07 1980-09-12 Minolta Camera Co Ltd Method of measuring lens array
DE3305140A1 (de) * 1983-02-15 1984-08-16 Hinsch, Klaus, Prof. Dr., 2902 Rastede Vorrichtung zur pruefung und vermessung von brillenglaesern jeglicher art oder anderen glaserzeugnissen
GB2153543B (en) * 1983-12-28 1988-09-01 Canon Kk A projection exposure apparatus
FR2584832B1 (fr) * 1985-07-10 1987-11-20 Matra Procede et dispositif de determination de la qualite d'un instrument optique et notamment de sa fonction de transfert
NL8601278A (nl) * 1986-05-21 1987-12-16 Philips Nv Inrichting voor het detekteren van een vergrotingsfout in een optisch afbeeldingssysteem.

Also Published As

Publication number Publication date
EP0418054B1 (de) 1994-11-17
US5062705A (en) 1991-11-05
EP0418054A3 (en) 1992-11-04
DE69014180T2 (de) 1995-04-06
EP0418054A2 (de) 1991-03-20

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee