DE69008892D1 - Verfahren zur Herstellung von Kieselsäure mit einem niedrigen Silanolgehalt. - Google Patents

Verfahren zur Herstellung von Kieselsäure mit einem niedrigen Silanolgehalt.

Info

Publication number
DE69008892D1
DE69008892D1 DE69008892T DE69008892T DE69008892D1 DE 69008892 D1 DE69008892 D1 DE 69008892D1 DE 69008892 T DE69008892 T DE 69008892T DE 69008892 T DE69008892 T DE 69008892T DE 69008892 D1 DE69008892 D1 DE 69008892D1
Authority
DE
Germany
Prior art keywords
silica
production
silanol content
low silanol
low
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69008892T
Other languages
English (en)
Other versions
DE69008892T2 (de
Inventor
Naotake Watanabe
Koichi Orii
Junsuke Yagi
Iwao Ohshima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Rayon Co Ltd
Original Assignee
Nitto Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Chemical Industry Co Ltd filed Critical Nitto Chemical Industry Co Ltd
Application granted granted Critical
Publication of DE69008892D1 publication Critical patent/DE69008892D1/de
Publication of DE69008892T2 publication Critical patent/DE69008892T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C12/00—Powdered glass; Bead compositions
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/126—Preparation of silica of undetermined type
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/16—Preparation of silica xerogels
DE69008892T 1989-02-20 1990-02-14 Verfahren zur Herstellung von Kieselsäure mit einem niedrigen Silanolgehalt. Expired - Fee Related DE69008892T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3816889 1989-02-20

Publications (2)

Publication Number Publication Date
DE69008892D1 true DE69008892D1 (de) 1994-06-23
DE69008892T2 DE69008892T2 (de) 1994-09-29

Family

ID=12517870

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69008892T Expired - Fee Related DE69008892T2 (de) 1989-02-20 1990-02-14 Verfahren zur Herstellung von Kieselsäure mit einem niedrigen Silanolgehalt.

Country Status (3)

Country Link
US (1) US5202104A (de)
EP (1) EP0384284B1 (de)
DE (1) DE69008892T2 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0826742A (ja) * 1994-07-11 1996-01-30 Mitsubishi Chem Corp 合成石英ガラス粉
EP0801026B1 (de) * 1994-12-26 2000-08-30 Mitsubishi Chemical Corporation Verfahren zur herstellung eines synthetischen quarzpulvers
EP1170253A1 (de) * 1996-11-20 2002-01-09 Mitsubishi Chemical Corporation Synthetisches Quartzpulver und Kieselsäuregelpulver
US5897849A (en) * 1996-12-30 1999-04-27 Uop Llc Unimodal, large-pore silicas by hydrothermal treatment of silicia powders
US5976479A (en) * 1996-12-30 1999-11-02 Uop Llc Hydrothermal process for preparing a unimodal large pore silica
FR2759087B1 (fr) * 1997-02-06 1999-07-30 Electricite De France Produit composite poreux de haute surface specifique, procede de preparation et electrode pour ensemble electrochimique formee d'un film composite poreux
US6106724A (en) * 1997-07-08 2000-08-22 Uop Llc Process for separating chiral compounds using a unimodal large pore silica as the support
US5888927A (en) * 1997-07-08 1999-03-30 Uop Llc Chiral separation using a unimodal, large-pore silica as the support
US7953990B2 (en) * 2002-12-31 2011-05-31 Stewart Thomas E Adaptive power control based on post package characterization of integrated circuits
JP4809926B2 (ja) * 2009-10-22 2011-11-09 株式会社大阪チタニウムテクノロジーズ リチウムイオン二次電池用負極活物質
US8197782B2 (en) * 2010-02-08 2012-06-12 Momentive Performance Materials Method for making high purity metal oxide particles and materials made thereof
US9249028B2 (en) 2010-02-08 2016-02-02 Momentive Performance Materials Inc. Method for making high purity metal oxide particles and materials made thereof
JP2022117128A (ja) 2021-01-29 2022-08-10 信越化学工業株式会社 ミリ波用高速通信低誘電基板
JP2022131074A (ja) 2021-02-26 2022-09-07 信越化学工業株式会社 周波数依存性の少ない誘電特性を有する樹脂基板

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3859420A (en) * 1969-12-18 1975-01-07 Degussa Process of making super-dry silicon dioxide
DE2225452C3 (de) * 1972-05-25 1978-06-08 Moskovskij Gosudarstvennyj Universitet Imeni M.V. Lomonosova, Moskau Verfahren zur Herstellung von weitporigem Adsorptionsmittel für Chromatographiezwecke
JPS5628852A (en) * 1979-08-17 1981-03-23 Toppan Printing Co Ltd Coloring multilayer molding
DD160961A3 (de) * 1980-03-20 1984-07-11 Akad Wissenschaften Ddr Verfahren zur aufbereitung dispers-amorpher hydrolysekieselsaeure
CA1271307A (en) * 1985-06-27 1990-07-10 Iwao Ohshima Process for manufacturing high purity silica
JPH0761852B2 (ja) * 1987-03-23 1995-07-05 日東化学工業株式会社 非焼結クリストバライト化シリカの製造方法
US5030433A (en) * 1988-07-18 1991-07-09 International Minerals & Chemical Corp. Process for producing pure and dense amorphous synthetic silica particles

Also Published As

Publication number Publication date
US5202104A (en) 1993-04-13
DE69008892T2 (de) 1994-09-29
EP0384284A3 (de) 1991-04-17
EP0384284A2 (de) 1990-08-29
EP0384284B1 (de) 1994-05-18

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: MITSUBISHI RAYON CO., LTD., TOKIO/TOKYO, JP

8339 Ceased/non-payment of the annual fee