DE69004908D1 - Vorrichtung zur Synthese von Diamanten. - Google Patents

Vorrichtung zur Synthese von Diamanten.

Info

Publication number
DE69004908D1
DE69004908D1 DE90117965T DE69004908T DE69004908D1 DE 69004908 D1 DE69004908 D1 DE 69004908D1 DE 90117965 T DE90117965 T DE 90117965T DE 69004908 T DE69004908 T DE 69004908T DE 69004908 D1 DE69004908 D1 DE 69004908D1
Authority
DE
Germany
Prior art keywords
diamonds
synthesis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE90117965T
Other languages
English (en)
Other versions
DE69004908T2 (de
Inventor
Nobuhiro Ota
Naoji Fujimori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP23165090A external-priority patent/JPH03174398A/ja
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Application granted granted Critical
Publication of DE69004908D1 publication Critical patent/DE69004908D1/de
Publication of DE69004908T2 publication Critical patent/DE69004908T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
DE90117965T 1989-09-20 1990-09-18 Vorrichtung zur Synthese von Diamanten. Expired - Fee Related DE69004908T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP24574889 1989-09-20
JP23165090A JPH03174398A (ja) 1989-09-20 1990-08-31 ダイヤモンド合成装置

Publications (2)

Publication Number Publication Date
DE69004908D1 true DE69004908D1 (de) 1994-01-13
DE69004908T2 DE69004908T2 (de) 1994-03-24

Family

ID=26530002

Family Applications (1)

Application Number Title Priority Date Filing Date
DE90117965T Expired - Fee Related DE69004908T2 (de) 1989-09-20 1990-09-18 Vorrichtung zur Synthese von Diamanten.

Country Status (3)

Country Link
US (1) US5074245A (de)
EP (1) EP0418837B1 (de)
DE (1) DE69004908T2 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5381755A (en) * 1991-08-20 1995-01-17 The United States Of America As Represented By The Secretary Of The Navy Method of synthesizing high quality, doped diamond and diamonds and devices obtained therefrom
FR2691035B1 (fr) * 1992-05-07 1994-06-17 France Telecom Dispositif et machine a plasma de traitement chimique et procede utilisant ce dispositif.
DE4217328C1 (en) * 1992-05-26 1993-09-02 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 80636 Muenchen, De Diamond layer CVD appts. - has closed gas circuit contg. carbon reactor for process gas regeneration
US5437243A (en) * 1992-07-01 1995-08-01 Pike-Biegunski; Maciej J. Process for fabricating diamond by supercritical electrical current
US6117401A (en) * 1998-08-04 2000-09-12 Juvan; Christian Physico-chemical conversion reactor system with a fluid-flow-field constrictor
FR2792854B1 (fr) * 1999-04-29 2001-08-03 Sidel Sa Dispositif pour le depot par plasma micro-ondes d'un revetement sur un recipient en materiau thermoplastique
US8968473B2 (en) * 2009-09-21 2015-03-03 Silevo, Inc. Stackable multi-port gas nozzles
US9240513B2 (en) 2010-05-14 2016-01-19 Solarcity Corporation Dynamic support system for quartz process chamber
US9441295B2 (en) 2010-05-14 2016-09-13 Solarcity Corporation Multi-channel gas-delivery system
US9763287B2 (en) * 2011-11-30 2017-09-12 Michael R. Knox Single mode microwave device for producing exfoliated graphite
MX359183B (es) 2015-02-17 2018-09-17 Solarcity Corp Metodo y sistema para mejorar rendimiento de fabricacion de celda solar.
US9972740B2 (en) 2015-06-07 2018-05-15 Tesla, Inc. Chemical vapor deposition tool and process for fabrication of photovoltaic structures
US9748434B1 (en) 2016-05-24 2017-08-29 Tesla, Inc. Systems, method and apparatus for curing conductive paste
US9954136B2 (en) 2016-08-03 2018-04-24 Tesla, Inc. Cassette optimized for an inline annealing system
US10115856B2 (en) 2016-10-31 2018-10-30 Tesla, Inc. System and method for curing conductive paste using induction heating
CN108914088B (zh) * 2018-09-29 2023-07-28 北京科技大学 一种制备高质量金刚石的气体循环系统及其使用方法
GB201912659D0 (en) 2019-09-03 2019-10-16 Univ Bristol Chemical vapor deposition process for producing diamond

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3030188A (en) * 1958-07-23 1962-04-17 Union Carbide Corp Synthesis of diamond
US3030187A (en) * 1958-07-23 1962-04-17 Union Carbide Corp Synthesis of diamond
US4468283A (en) * 1982-12-17 1984-08-28 Irfan Ahmed Method for etching and controlled chemical vapor deposition
JPS6461396A (en) * 1987-09-01 1989-03-08 Idemitsu Petrochemical Co Synthesis of diamond and installation therefor
JPH02141494A (ja) * 1988-07-30 1990-05-30 Kobe Steel Ltd ダイヤモンド気相合成装置

Also Published As

Publication number Publication date
DE69004908T2 (de) 1994-03-24
EP0418837A1 (de) 1991-03-27
US5074245A (en) 1991-12-24
EP0418837B1 (de) 1993-12-01

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8320 Willingness to grant licences declared (paragraph 23)
8328 Change in the person/name/address of the agent

Representative=s name: GROSSE, BOCKHORNI, SCHUMACHER, 81476 MUENCHEN

8339 Ceased/non-payment of the annual fee