DE69002812T2 - Infrarot-Fenster. - Google Patents

Infrarot-Fenster.

Info

Publication number
DE69002812T2
DE69002812T2 DE90311534T DE69002812T DE69002812T2 DE 69002812 T2 DE69002812 T2 DE 69002812T2 DE 90311534 T DE90311534 T DE 90311534T DE 69002812 T DE69002812 T DE 69002812T DE 69002812 T2 DE69002812 T2 DE 69002812T2
Authority
DE
Germany
Prior art keywords
infrared window
infrared
window
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE90311534T
Other languages
English (en)
Other versions
DE69002812D1 (de
Inventor
Vladimir Paserin
Juraj Babjak
Victor Alexander Ettel
Richard Stuart Adams
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Vale Canada Ltd
Original Assignee
Vale Canada Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Vale Canada Ltd filed Critical Vale Canada Ltd
Publication of DE69002812D1 publication Critical patent/DE69002812D1/de
Application granted granted Critical
Publication of DE69002812T2 publication Critical patent/DE69002812T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/16—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metal carbonyl compounds
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation by radiant heating of the substrate

Landscapes

  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Chemically Coating (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
DE90311534T 1989-10-19 1990-10-19 Infrarot-Fenster. Expired - Fee Related DE69002812T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CA002001009A CA2001009C (en) 1989-10-19 1989-10-19 Infrared window

Publications (2)

Publication Number Publication Date
DE69002812D1 DE69002812D1 (de) 1993-09-23
DE69002812T2 true DE69002812T2 (de) 1993-12-09

Family

ID=4143356

Family Applications (1)

Application Number Title Priority Date Filing Date
DE90311534T Expired - Fee Related DE69002812T2 (de) 1989-10-19 1990-10-19 Infrarot-Fenster.

Country Status (7)

Country Link
US (1) US5145716A (de)
EP (1) EP0424183B1 (de)
JP (1) JPH0765175B2 (de)
CA (1) CA2001009C (de)
DE (1) DE69002812T2 (de)
FI (1) FI93554C (de)
NO (1) NO303231B1 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102010003431B4 (de) 2010-03-30 2019-05-16 Seg Automotive Germany Gmbh Startvorrichtung mit Hohlrad- und Zwischenlagerdämpfung

Families Citing this family (28)

* Cited by examiner, † Cited by third party
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FR2686967B1 (fr) * 1992-02-04 1999-04-09 France Telecom Dispositif de refroidissement d'un four de traitement d'un element et four equipe d'un tel dispositif.
CA2098073C (en) * 1993-06-09 1996-10-08 Paul Anthony Hynek Apparatus and method for measuring the density of metal bearing foam
EP0628706A2 (de) * 1993-06-10 1994-12-14 Inco Limited Katalytische Umsetzung von Abgasen einer Brennkraftmaschine
JPH0978239A (ja) * 1994-08-26 1997-03-25 Kyokuto Giken:Kk プラスチック成形型の製造方法
US5960158A (en) 1997-07-11 1999-09-28 Ag Associates Apparatus and method for filtering light in a thermal processing chamber
US6284051B1 (en) * 1999-05-27 2001-09-04 Ag Associates (Israel) Ltd. Cooled window
US6559424B2 (en) * 2001-01-02 2003-05-06 Mattson Technology, Inc. Windows used in thermal processing chambers
AU2003210732B2 (en) * 2003-01-28 2007-03-29 Fluor Technologies Corporation Configuration and process for carbonyl removal
US7794521B2 (en) * 2005-08-10 2010-09-14 Directa Plus Srl Production of chain agglomerations of nano-scale metal particles
US20070036912A1 (en) * 2005-08-10 2007-02-15 Mercuri Robert A Continuous process and apparatus for the production of engineered catalyst materials
US20070037701A1 (en) * 2005-08-10 2007-02-15 Mercuri Robert A Process and apparatus for the production of catalyst-coated support materials
US7972761B2 (en) * 2006-08-04 2011-07-05 Taiwan Semiconductor Manufacturing Company, Ltd. Photoresist materials and photolithography process
US20070036689A1 (en) * 2005-08-10 2007-02-15 Mercuri Robert A Production of nano-scale metal particles
WO2007142662A2 (en) * 2005-08-10 2007-12-13 Directa Plus Patent & Technology Limited Production of nano-scale metal particles
US20070034050A1 (en) * 2005-08-10 2007-02-15 Mercuri Robert A Process for the use of metal carbonyls for the production of nano-scale metal particles formed of non-noble metals
US20070286778A1 (en) * 2005-08-10 2007-12-13 Mercuri Robert A Apparatus for the continuous production of nano-scale metal particles
US20070283782A1 (en) * 2005-08-10 2007-12-13 Mercuri Robert A Continuous process for the production of nano-scale metal particles
US20070034051A1 (en) * 2005-08-10 2007-02-15 Mercuri Robert A Process for the use of metal carbonyls for the production of nano-scale metal particles
US20070037700A1 (en) * 2005-08-10 2007-02-15 Mercuri Robert A Continuous process and apparatus for the production of catalyst-coated support materials
US20070034049A1 (en) * 2005-08-10 2007-02-15 Mercuri Robert A Continuous process for the use of metal carbonyls for the production of nano-scale metal particles
US20070036911A1 (en) * 2005-08-10 2007-02-15 Mercuri Robert A Process and apparatus for the production of catalyst-coated support materials formed of non-noble metals
US20070036913A1 (en) * 2005-08-10 2007-02-15 Mercuri Robert A Process and apparatus for the production of engineered catalyst materials formed of non-noble metals
WO2010056324A1 (en) * 2008-11-12 2010-05-20 Neos International, Llc Device and method for cooling chips and leds
US20110171399A1 (en) * 2010-01-08 2011-07-14 General Electric Company Process and apparatus for continuous coating of fibrous materials
EP2425916B1 (de) 2010-09-01 2014-11-12 Directa Plus S.p.A. Reaktor mit mehreren Einspeisevorrichtungen zur Herstellung von Nanopartikeln aus Metall
US10410890B2 (en) * 2013-06-21 2019-09-10 Applied Materials, Inc. Light pipe window structure for thermal chamber applications and processes
US10591221B1 (en) 2017-04-04 2020-03-17 Mainstream Engineering Corporation Advanced cooling system using throttled internal cooling passage flow for a window assembly, and methods of fabrication and use thereof
US11143459B1 (en) 2017-04-04 2021-10-12 Mainstream Engineering Corporation Advanced cooling system using throttled internal cooling passage flow for a window assembly, and methods of fabrication and use thereof

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2649754A (en) * 1949-07-14 1953-08-25 Ohio Commw Eng Co Apparatus for plating metal objects
US2867552A (en) * 1954-06-01 1959-01-06 Ohio Commw Eng Co Metallized filamentary materials
US3213827A (en) * 1962-03-13 1965-10-26 Union Carbide Corp Apparatus for gas plating bulk material to metallize the same
US3900646A (en) * 1973-02-21 1975-08-19 Robert A Clyde Method of plating metal uniformly on and throughout porous structures
US4312794A (en) * 1980-04-02 1982-01-26 Electric Power Research Institute, Inc. Ultra pure tetrachloroethylene dielectric fluid
DE3037205C2 (de) * 1980-10-02 1982-12-16 Messerschmitt-Bölkow-Blohm GmbH, 8000 München Schutzeinrichtung für optische bzw. IR-Fenster
GB2124253B (en) * 1982-07-02 1985-02-13 Electricity Council Dielectric fluids
JPS6021381A (ja) * 1983-07-12 1985-02-02 Kokusai Electric Co Ltd 光ｃｖｄ装置の薄膜生成反応炉
US4550684A (en) * 1983-08-11 1985-11-05 Genus, Inc. Cooled optical window for semiconductor wafer heating
JPS60209246A (ja) * 1984-04-02 1985-10-21 Ushio Inc 光化学反応装置
JPS60212225A (ja) * 1984-04-06 1985-10-24 Ushio Inc 光化学反応装置
JPS60212220A (ja) * 1984-04-06 1985-10-24 Ushio Inc 光化学反応装置
JPS60212221A (ja) * 1984-04-06 1985-10-24 Ushio Inc 光化学反応装置
JPS61170573A (ja) * 1985-01-23 1986-08-01 Canon Inc 光ｃｖｄ装置
JPS62188781A (ja) * 1986-02-15 1987-08-18 Canon Inc 光化学気相成長装置
US4749950A (en) * 1986-03-14 1988-06-07 Farkas Zoltan D Binary power multiplier for electromagnetic energy
US4759950A (en) * 1986-09-26 1988-07-26 Advance Technology Materials, Inc. Method for metallizing filaments
JPS63172421A (ja) * 1987-01-12 1988-07-16 Mitsubishi Electric Corp 薄膜形成装置
US4766665A (en) * 1987-09-11 1988-08-30 Gte Products Corporation Method for machining parts made of tungsten and of tungsten with thoria

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102010003431B4 (de) 2010-03-30 2019-05-16 Seg Automotive Germany Gmbh Startvorrichtung mit Hohlrad- und Zwischenlagerdämpfung

Also Published As

Publication number Publication date
NO904512D0 (no) 1990-10-18
DE69002812D1 (de) 1993-09-23
JPH0765175B2 (ja) 1995-07-12
NO904512L (no) 1991-04-22
CA2001009A1 (en) 1991-04-19
CA2001009C (en) 2000-11-28
EP0424183B1 (de) 1993-08-18
NO303231B1 (no) 1998-06-15
JPH03134171A (ja) 1991-06-07
EP0424183A1 (de) 1991-04-24
US5145716A (en) 1992-09-08
FI905152A0 (fi) 1990-10-18
FI93554C (fi) 1995-04-25
FI93554B (fi) 1995-01-13

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee