DE68927423D1 - Optisches Verkleinerungssystem - Google Patents

Optisches Verkleinerungssystem

Info

Publication number
DE68927423D1
DE68927423D1 DE68927423T DE68927423T DE68927423D1 DE 68927423 D1 DE68927423 D1 DE 68927423D1 DE 68927423 T DE68927423 T DE 68927423T DE 68927423 T DE68927423 T DE 68927423T DE 68927423 D1 DE68927423 D1 DE 68927423D1
Authority
DE
Germany
Prior art keywords
reduction system
optical reduction
optical
reduction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE68927423T
Other languages
English (en)
Other versions
DE68927423T2 (de
Inventor
David M Williamson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SVG Lithography Systems Inc
Original Assignee
SVG Lithography Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SVG Lithography Systems Inc filed Critical SVG Lithography Systems Inc
Publication of DE68927423D1 publication Critical patent/DE68927423D1/de
Application granted granted Critical
Publication of DE68927423T2 publication Critical patent/DE68927423T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE68927423T 1988-07-15 1989-07-14 Optisches Verkleinerungssystem Expired - Lifetime DE68927423T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/223,968 US4953960A (en) 1988-07-15 1988-07-15 Optical reduction system

Publications (2)

Publication Number Publication Date
DE68927423D1 true DE68927423D1 (de) 1996-12-12
DE68927423T2 DE68927423T2 (de) 1997-03-06

Family

ID=22838740

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68927423T Expired - Lifetime DE68927423T2 (de) 1988-07-15 1989-07-14 Optisches Verkleinerungssystem

Country Status (5)

Country Link
US (1) US4953960A (de)
EP (1) EP0350955B1 (de)
JP (1) JPH07117648B2 (de)
CA (1) CA1320375C (de)
DE (1) DE68927423T2 (de)

Families Citing this family (65)

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USRE36740E (en) * 1990-03-30 2000-06-20 Nikon Corporation Cata-dioptric reduction projection optical system
US5220454A (en) * 1990-03-30 1993-06-15 Nikon Corporation Cata-dioptric reduction projection optical system
US5072104A (en) * 1990-06-04 1991-12-10 Litton Systems, Inc. Achromatic null lens
US5089913A (en) * 1990-07-11 1992-02-18 International Business Machines Corporation High resolution reduction catadioptric relay lens
NL194844C (nl) * 1991-02-08 2003-04-03 Zeiss Carl Fa Catadioptrisch reductie-objectief.
US5402267A (en) * 1991-02-08 1995-03-28 Carl-Zeiss-Stiftung Catadioptric reduction objective
DE4203464B4 (de) * 1991-02-08 2007-02-01 Carl Zeiss Smt Ag Katadioptrisches Reduktionsobjektiv
JP2830492B2 (ja) 1991-03-06 1998-12-02 株式会社ニコン 投影露光装置及び投影露光方法
US5668673A (en) * 1991-08-05 1997-09-16 Nikon Corporation Catadioptric reduction projection optical system
JP3235077B2 (ja) * 1991-09-28 2001-12-04 株式会社ニコン 露光装置、該装置を用いた露光方法、及び該装置を用いた半導体素子製造方法
JP3085481B2 (ja) * 1991-09-28 2000-09-11 株式会社ニコン 反射屈折縮小投影光学系、及び該光学系を備えた露光装置
US5251070A (en) * 1991-09-28 1993-10-05 Nikon Corporation Catadioptric reduction projection optical system
US5212593A (en) * 1992-02-06 1993-05-18 Svg Lithography Systems, Inc. Broad band optical reduction system using matched multiple refractive element materials
JP2750062B2 (ja) * 1992-12-14 1998-05-13 キヤノン株式会社 反射屈折型光学系及び該光学系を備える投影露光装置
DE69315314T2 (de) * 1992-12-24 1998-03-19 Nikon Corp Verkleinerndes katadioptrisches Projektionssystem
US5537260A (en) * 1993-01-26 1996-07-16 Svg Lithography Systems, Inc. Catadioptric optical reduction system with high numerical aperture
US5323263A (en) * 1993-02-01 1994-06-21 Nikon Precision Inc. Off-axis catadioptric projection system
JP3635684B2 (ja) * 1994-08-23 2005-04-06 株式会社ニコン 反射屈折縮小投影光学系、反射屈折光学系、並びに投影露光方法及び装置
US5636066A (en) * 1993-03-12 1997-06-03 Nikon Corporation Optical apparatus
JPH09311278A (ja) 1996-05-20 1997-12-02 Nikon Corp 反射屈折光学系
JPH06310400A (ja) * 1993-04-12 1994-11-04 Svg Lithography Syst Inc 軸上マスクとウェーハ直線配列システム
US5854671A (en) 1993-05-28 1998-12-29 Nikon Corporation Scanning exposure method and apparatus therefor and a projection exposure apparatus and method which selectively chooses between static exposure and scanning exposure
US6157497A (en) * 1993-06-30 2000-12-05 Nikon Corporation Exposure apparatus
US5602619A (en) * 1993-09-22 1997-02-11 Nikon Precision, Inc. Scanner for step and scan lithography system
US5515207A (en) * 1993-11-03 1996-05-07 Nikon Precision Inc. Multiple mirror catadioptric optical system
US5638218A (en) * 1993-12-07 1997-06-10 Nikon Corporation Catadioptric projection apparatus
JP3395801B2 (ja) * 1994-04-28 2003-04-14 株式会社ニコン 反射屈折投影光学系、走査型投影露光装置、及び走査投影露光方法
DE4417489A1 (de) * 1994-05-19 1995-11-23 Zeiss Carl Fa Höchstaperturiges katadioptrisches Reduktionsobjektiv für die Miktrolithographie
USRE38438E1 (en) 1994-08-23 2004-02-24 Nikon Corporation Catadioptric reduction projection optical system and exposure apparatus having the same
US5488229A (en) * 1994-10-04 1996-01-30 Excimer Laser Systems, Inc. Deep ultraviolet microlithography system
US5559338A (en) * 1994-10-04 1996-09-24 Excimer Laser Systems, Inc. Deep ultraviolet optical imaging system for microlithography and/or microfabrication
JPH08179204A (ja) 1994-11-10 1996-07-12 Nikon Corp 投影光学系及び投影露光装置
JPH08171054A (ja) * 1994-12-16 1996-07-02 Nikon Corp 反射屈折光学系
JPH08179216A (ja) * 1994-12-27 1996-07-12 Nikon Corp 反射屈折光学系
JP3454390B2 (ja) 1995-01-06 2003-10-06 株式会社ニコン 投影光学系、投影露光装置及び投影露光方法
JPH08203812A (ja) * 1995-01-30 1996-08-09 Nikon Corp 反射屈折縮小投影光学系及び露光装置
US5585972A (en) * 1995-02-15 1996-12-17 Ultratech Stepper, Inc. Arbitrarily wide lens array with an image field to span the width of a substrate
US5650877A (en) * 1995-08-14 1997-07-22 Tropel Corporation Imaging system for deep ultraviolet lithography
DE19616922A1 (de) * 1996-04-27 1997-10-30 Zeiss Carl Fa Hochauflösendes lichtstarkes Objektiv
US5757493A (en) * 1996-10-16 1998-05-26 Tropel Corporation Interferometer with catadioptric imaging system having expanded range of numerical aperture
JPH1184248A (ja) * 1997-09-12 1999-03-26 Nikon Corp 反射屈折縮小光学系
US5929978A (en) * 1997-12-11 1999-07-27 Nikon Corporation Projection exposure apparatus
WO2000039623A1 (fr) 1998-12-25 2000-07-06 Nikon Corporation Systeme optique de formation d'image par reflexion refraction et appareil d'exposition par projection comprenant le systeme optique
EP1102100A3 (de) 1999-11-12 2003-12-10 Carl Zeiss Katadioptrisches Objektiv mit physikalischem Strahlteiler
EP1115019A3 (de) * 1999-12-29 2004-07-28 Carl Zeiss Projektionsobjektiv mit asphärischen Elementen
US6995930B2 (en) * 1999-12-29 2006-02-07 Carl Zeiss Smt Ag Catadioptric projection objective with geometric beam splitting
JP2001228401A (ja) * 2000-02-16 2001-08-24 Canon Inc 投影光学系、および該投影光学系による投影露光装置、デバイス製造方法
US6480330B1 (en) 2000-02-24 2002-11-12 Silicon Valley Group, Inc. Ultraviolet polarization beam splitter for microlithography
US7414785B2 (en) * 2000-02-24 2008-08-19 Asml Holding N.V. Ultraviolet polarization beam splitter with minimum apodization
WO2001082000A1 (en) 2000-04-25 2001-11-01 Silicon Valley Group, Inc. Optical reduction system with elimination of reticle diffraction induced bias
KR100894303B1 (ko) * 2000-04-25 2009-04-24 에이에스엠엘 유에스, 인크. 조사 편광 제어부를 구비한 광학 축소 시스템
US6486940B1 (en) 2000-07-21 2002-11-26 Svg Lithography Systems, Inc. High numerical aperture catadioptric lens
DE10104177A1 (de) 2001-01-24 2002-08-01 Zeiss Carl Katadioptrisches Reduktionsobjektiv
DE10117481A1 (de) 2001-04-07 2002-10-10 Zeiss Carl Katadioptrisches Projektionsobjektiv
TW575904B (en) * 2001-08-21 2004-02-11 Asml Us Inc Optical projection for microlithography
US7136220B2 (en) * 2001-08-21 2006-11-14 Carl Zeiss Smt Ag Catadioptric reduction lens
EP1480065A3 (de) * 2003-05-23 2006-05-10 Canon Kabushiki Kaisha Optisches Projektionssystem, Belichtungsapparat, und Verfahren zur Herstellung einer Vorrichtung
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US20080151365A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
US8107162B2 (en) 2004-05-17 2012-01-31 Carl Zeiss Smt Gmbh Catadioptric projection objective with intermediate images
US7511798B2 (en) * 2004-07-30 2009-03-31 Asml Holding N.V. Off-axis catadioptric projection optical system for lithography
JP2006119490A (ja) * 2004-10-25 2006-05-11 Canon Inc 反射屈折型投影光学系及び当該反射屈折型投影光学系を有する露光装置、デバイス製造方法
US7324185B2 (en) 2005-03-04 2008-01-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8248577B2 (en) 2005-05-03 2012-08-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP6819773B2 (ja) 2016-09-06 2021-01-27 株式会社ニコン 反射屈折等倍アフォーカル瞳孔リレー及びこれを採用した光学撮影系

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US2801570A (en) * 1952-05-29 1957-08-06 Centre Nat Rech Scient Mirror type optical objectives for microscopes
US3256766A (en) * 1960-11-28 1966-06-21 Aga Ab Coaxial telescope for use in a rangefinder
NL6701520A (de) * 1967-02-01 1968-08-02
NL6917195A (de) * 1968-11-15 1970-05-20
FR2134272B1 (de) * 1971-04-29 1975-02-21 Cerco
US4108539A (en) * 1976-11-18 1978-08-22 Hewlett-Packard Company Reflecting lens system
US4302079A (en) * 1980-04-10 1981-11-24 Bell Telephone Laboratories, Incorporated Photolithographic projection apparatus using light in the far ultraviolet
GB8612609D0 (en) * 1986-05-23 1986-07-02 Wynne C G Optical imaging systems

Also Published As

Publication number Publication date
JPH07117648B2 (ja) 1995-12-18
JPH0266510A (ja) 1990-03-06
EP0350955B1 (de) 1996-11-06
EP0350955A2 (de) 1990-01-17
US4953960A (en) 1990-09-04
DE68927423T2 (de) 1997-03-06
CA1320375C (en) 1993-07-20
EP0350955A3 (de) 1991-07-24

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