DE68923890T2 - Strahlenoptische Elemente mit Graphit-Schichten. - Google Patents

Strahlenoptische Elemente mit Graphit-Schichten.

Info

Publication number
DE68923890T2
DE68923890T2 DE68923890T DE68923890T DE68923890T2 DE 68923890 T2 DE68923890 T2 DE 68923890T2 DE 68923890 T DE68923890 T DE 68923890T DE 68923890 T DE68923890 T DE 68923890T DE 68923890 T2 DE68923890 T2 DE 68923890T2
Authority
DE
Germany
Prior art keywords
optical elements
graphite layers
radiation optical
radiation
graphite
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE68923890T
Other languages
English (en)
Other versions
DE68923890D1 (de
Inventor
Kazuhiro Watanabe
Mutsuaki Murakami
Susumu Yoshimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Japan Science and Technology Agency
Panasonic Corp
Original Assignee
Research Development Corp of Japan
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP63042677A external-priority patent/JPH01215707A/ja
Priority claimed from JP63109354A external-priority patent/JP2517063B2/ja
Application filed by Research Development Corp of Japan, Matsushita Electric Industrial Co Ltd filed Critical Research Development Corp of Japan
Application granted granted Critical
Publication of DE68923890D1 publication Critical patent/DE68923890D1/de
Publication of DE68923890T2 publication Critical patent/DE68923890T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/061—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements characterised by a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/068—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements specially adapted for particle beams
DE68923890T 1988-02-25 1989-02-24 Strahlenoptische Elemente mit Graphit-Schichten. Expired - Lifetime DE68923890T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP63042677A JPH01215707A (ja) 1988-02-25 1988-02-25 放射線光学素子
JP63109354A JP2517063B2 (ja) 1988-05-02 1988-05-02 放射線光学素子

Publications (2)

Publication Number Publication Date
DE68923890D1 DE68923890D1 (de) 1995-09-28
DE68923890T2 true DE68923890T2 (de) 1996-02-22

Family

ID=26382400

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68923890T Expired - Lifetime DE68923890T2 (de) 1988-02-25 1989-02-24 Strahlenoptische Elemente mit Graphit-Schichten.

Country Status (3)

Country Link
US (1) US5042059A (de)
EP (1) EP0331375B1 (de)
DE (1) DE68923890T2 (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2653234A1 (fr) * 1989-10-13 1991-04-19 Philips Electronique Lab Dispositif du type miroir dans le domaine des rayons x-uv.
JPH0720293A (ja) * 1993-06-30 1995-01-24 Canon Inc Ｘ線ミラー及びこれを用いたｘ線露光装置とデバイス製造方法
DE9317031U1 (de) * 1993-11-08 1994-03-31 Installation Europ De Rayonnem Doppelkristall-Monochromator
JP2526409B2 (ja) * 1994-02-18 1996-08-21 工業技術院長 Ｘ線レンズ
US5604292A (en) * 1994-05-31 1997-02-18 The Untied States Of America As Represented By The Secretary Of The Navy Polymers with electrical and non-linear optical properties
JP3434928B2 (ja) * 1995-04-03 2003-08-11 科学技術振興事業団 グラファイト層間化合物およびその製造方法
JPH09166797A (ja) * 1995-12-15 1997-06-24 Fuji Xerox Co Ltd 非線形光学材料およびその製造方法
JPH11100206A (ja) 1997-09-29 1999-04-13 Honda Motor Co Ltd 炭素材料
DE10107914A1 (de) * 2001-02-14 2002-09-05 Fraunhofer Ges Forschung Anordnung für röntgenanalytische Anwendungen
US20030012336A1 (en) * 2001-06-20 2003-01-16 Cash Webster C. X-ray concentrator for therapy
DE10162093A1 (de) * 2001-12-18 2003-07-10 Bruker Axs Gmbh Röntgen-optisches System mit Blende im Fokus einer Röntgen-Spiegels
US7634052B2 (en) * 2006-10-24 2009-12-15 Thermo Niton Analyzers Llc Two-stage x-ray concentrator
JP5343419B2 (ja) * 2008-06-27 2013-11-13 住友電気工業株式会社 成膜方法
EP2438431A4 (de) * 2009-06-03 2013-10-23 Thermo Scient Portable Analytical Instr Inc Röntgensystem und -verfahren mit einem detektor im inneren eines fokussierungselements
US20130027778A1 (en) * 2011-07-27 2013-01-31 The Government Of The United States Of America, As Represented By The Secretary Of The Navy Broadband Absorptive Neutral Density Optical Filter
US9240254B2 (en) * 2011-09-27 2016-01-19 Revera, Incorporated System and method for characterizing a film by X-ray photoelectron and low-energy X-ray fluorescence spectroscopy
JP2015130486A (ja) * 2013-12-05 2015-07-16 キヤノン株式会社 金属ハライド層を備える構造体、放射線検出素子、放射線検出器及び該構造体の製造方法
JP6748110B2 (ja) * 2015-11-30 2020-08-26 株式会社カネカ エネルギーデグレーダ、及びそれを備えた荷電粒子線照射システム
EP3779525B1 (de) * 2019-08-13 2024-01-03 Istituto Nazionale di Astrofisica Verfahren zum aufbringen eines kohlenstoffbasierten überzugs auf eine optische einheit mit streifendem einfall
RU2756103C1 (ru) * 2020-12-31 2021-09-28 Федеральное государственное бюджетное образовательное учреждение высшего образования «Московский государственный университет имени М.В.Ломоносова» (МГУ) Способ изготовления пиролизованных линз для рентгеновского излучения

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0205970B1 (de) * 1985-05-30 1990-10-24 Research Development Corporation of Japan Verfahren zum Herstellen von Graphitfolien
DE3680824D1 (de) * 1985-05-30 1991-09-19 Matsushita Electric Ind Co Ltd Verfahren zum erzeugen von graphit.
JPS6287407A (ja) * 1985-10-12 1987-04-21 Res Dev Corp Of Japan フイルム状グラフアイト層間化合物及びその製造方法
JPS6287899A (ja) * 1985-10-15 1987-04-22 新技術事業団 放射線光学素子
JPH0772760B2 (ja) * 1986-09-09 1995-08-02 住友化学工業株式会社 Ｘ線及び中性子線用グラファイトモノクロメ−タ及びその製造法

Also Published As

Publication number Publication date
EP0331375B1 (de) 1995-08-23
US5042059A (en) 1991-08-20
EP0331375A2 (de) 1989-09-06
EP0331375A3 (de) 1991-04-03
DE68923890D1 (de) 1995-09-28

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: PANASONIC CORP., KADOMA, OSAKA, JP

Owner name: RESEARCH DEVELOPMENT CORP. OF JAPAN, TOKIO/TOK, JP