DE60331987D1 - Detektionsgerät, Detektionsverfahren und Gerät zur Bestrahlung mittels Elektronen - Google Patents

Detektionsgerät, Detektionsverfahren und Gerät zur Bestrahlung mittels Elektronen

Info

Publication number
DE60331987D1
DE60331987D1 DE60331987T DE60331987T DE60331987D1 DE 60331987 D1 DE60331987 D1 DE 60331987D1 DE 60331987 T DE60331987 T DE 60331987T DE 60331987 T DE60331987 T DE 60331987T DE 60331987 D1 DE60331987 D1 DE 60331987D1
Authority
DE
Germany
Prior art keywords
detection
electrons
irradiation
detection method
detection device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60331987T
Other languages
English (en)
Inventor
Yoshihisa Miura
Yuichi Aki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Application granted granted Critical
Publication of DE60331987D1 publication Critical patent/DE60331987D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/261—Preparing a master, e.g. exposing photoresist, electroforming
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/301—Arrangements enabling beams to pass between regions of different pressure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching for microworking, e. g. etching of gratings or trimming of electrical components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H01J2237/188—Differential pressure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2446—Position sensitive detectors
    • H01J2237/24465—Sectored detectors, e.g. quadrants

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Optical Recording Or Reproduction (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Welding Or Cutting Using Electron Beams (AREA)
DE60331987T 2002-04-24 2003-04-16 Detektionsgerät, Detektionsverfahren und Gerät zur Bestrahlung mittels Elektronen Expired - Lifetime DE60331987D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002122966A JP4062956B2 (ja) 2002-04-24 2002-04-24 検出装置、検出方法および電子ビーム照射装置

Publications (1)

Publication Number Publication Date
DE60331987D1 true DE60331987D1 (de) 2010-05-20

Family

ID=29208092

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60331987T Expired - Lifetime DE60331987D1 (de) 2002-04-24 2003-04-16 Detektionsgerät, Detektionsverfahren und Gerät zur Bestrahlung mittels Elektronen

Country Status (4)

Country Link
US (1) US7095699B2 (de)
EP (1) EP1359602B1 (de)
JP (1) JP4062956B2 (de)
DE (1) DE60331987D1 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4350429B2 (ja) * 2003-06-05 2009-10-21 キヤノン株式会社 露光装置、およびデバイスの製造方法
KR100796229B1 (ko) 2004-02-03 2008-01-21 가부시키가이샤 리코 토너, 및 현상제, 토너 충전 용기, 프로세스 카트리지,화상 형성 장치 및 화상 형성 방법
CN1981243A (zh) * 2004-06-21 2007-06-13 日本先锋公司 电子束绘制装置
US20060018240A1 (en) * 2004-07-21 2006-01-26 Charles Marshall Digital media created using electron beam technology
US20060072428A1 (en) * 2004-09-03 2006-04-06 Charles Marshall Fabrication of digital media using ion beam technology
JP4731500B2 (ja) 2007-01-18 2011-07-27 大日本スクリーン製造株式会社 基板支持装置、表面電位測定装置、膜厚測定装置および基板検査装置
JP5275396B2 (ja) * 2011-03-17 2013-08-28 株式会社東芝 電子ビーム照射装置
WO2018032004A1 (en) * 2016-08-12 2018-02-15 Cosm Advanced Manufacturing Systems Llc Additive metal manufacturing system for in-situ metrology and process control
CN106680305B (zh) 2016-11-23 2023-08-04 聚束科技（北京）有限公司 一种真空气氛处理装置、样品观测系统及方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1330502A (en) * 1970-09-21 1973-09-19 Texas Instruments Ltd Manufacture of masks
JPH0364089A (ja) 1989-08-01 1991-03-19 Matsushita Electric Ind Co Ltd 電子部品用セラミック基板
JP3814358B2 (ja) 1997-02-07 2006-08-30 三菱レイヨン株式会社 粉体の紫外線殺菌装置
JPH10219232A (ja) 1997-02-10 1998-08-18 Esupo Kk 防臭性かつ防汚性組成物及びこれを含ませた材料
US6300630B1 (en) * 1999-12-09 2001-10-09 Etec Systems, Inc. Annular differential seal for electron beam apparatus using isolation valve and additional differential pumping
JP2001242300A (ja) * 2000-03-02 2001-09-07 Sony Corp 電子ビーム照射装置
JP2002050146A (ja) 2000-08-02 2002-02-15 Fuji Photo Film Co Ltd 磁気ディスクカートリッジ
US6775223B2 (en) * 2002-01-17 2004-08-10 Hewlett-Packard Development Company, L.P. Systems for controlling storage device emitters

Also Published As

Publication number Publication date
US20030202449A1 (en) 2003-10-30
US7095699B2 (en) 2006-08-22
EP1359602A3 (de) 2005-09-07
EP1359602A2 (de) 2003-11-05
JP4062956B2 (ja) 2008-03-19
JP2003316017A (ja) 2003-11-06
EP1359602B1 (de) 2010-04-07

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition