DE60322097D1 - Mikromaschine und herstellungsverfahren dafür - Google Patents

Mikromaschine und herstellungsverfahren dafür

Info

Publication number
DE60322097D1
DE60322097D1 DE60322097T DE60322097T DE60322097D1 DE 60322097 D1 DE60322097 D1 DE 60322097D1 DE 60322097 T DE60322097 T DE 60322097T DE 60322097 T DE60322097 T DE 60322097T DE 60322097 D1 DE60322097 D1 DE 60322097D1
Authority
DE
Germany
Prior art keywords
micromatic
manufacturing
machine
method therefor
therefor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60322097T
Other languages
English (en)
Inventor
Masahiro Tada
Takashi Kinoshita
Shun Mitarai
Yasuyuki Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Application granted granted Critical
Publication of DE60322097D1 publication Critical patent/DE60322097D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/0072—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks of microelectro-mechanical resonators or networks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/24—Constructional features of resonators of material which is not piezoelectric, electrostrictive, or magnetostrictive
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/24—Constructional features of resonators of material which is not piezoelectric, electrostrictive, or magnetostrictive
    • H03H9/2405—Constructional features of resonators of material which is not piezoelectric, electrostrictive, or magnetostrictive of microelectro-mechanical resonators
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/02244—Details of microelectro-mechanical resonators
    • H03H2009/02488—Vibration modes
    • H03H2009/02511—Vertical, i.e. perpendicular to the substrate plane

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Micromachines (AREA)
  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
DE60322097T 2002-12-03 2003-11-25 Mikromaschine und herstellungsverfahren dafür Expired - Fee Related DE60322097D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002350639A JP4007172B2 (ja) 2002-12-03 2002-12-03 マイクロマシンおよびその製造方法
PCT/JP2003/014976 WO2004050545A1 (ja) 2002-12-03 2003-11-25 マイクロマシンおよびその製造方法

Publications (1)

Publication Number Publication Date
DE60322097D1 true DE60322097D1 (de) 2008-08-21

Family

ID=32463111

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60322097T Expired - Fee Related DE60322097D1 (de) 2002-12-03 2003-11-25 Mikromaschine und herstellungsverfahren dafür

Country Status (8)

Country Link
US (1) US7212081B2 (de)
EP (1) EP1568655B1 (de)
JP (1) JP4007172B2 (de)
KR (1) KR20050084058A (de)
CN (1) CN100402411C (de)
DE (1) DE60322097D1 (de)
TW (1) TWI233422B (de)
WO (1) WO2004050545A1 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1585219A1 (de) * 2004-04-06 2005-10-12 Seiko Epson Corporation Nano-/Mikromechanische Vorrichtung des Mikroklappentyps und Verfahren zur Herstellung derselben
FR2875947B1 (fr) * 2004-09-30 2007-09-07 Tracit Technologies Nouvelle structure pour microelectronique et microsysteme et procede de realisation
FR2890490A1 (fr) * 2005-09-05 2007-03-09 St Microelectronics Sa Support de resonateur acoustique et circuit integre correspondant
EP1777816A1 (de) * 2005-10-18 2007-04-25 Seiko Epson Corporation MEMS-Resonator und Verfahren zur Erhöhung des Ausgangsstroms eines MEMS-Resonators
EP1976015B1 (de) * 2007-03-26 2014-09-10 Semiconductor Energy Laboratory Co., Ltd. Schaltelement, Herstellungsverfahren dafür und Anzeigevorrichtung mit Schaltelement
CN101212076B (zh) * 2007-12-21 2011-04-06 北京信息工程学院 微机械可调微波带通滤波器
KR101893236B1 (ko) * 2011-04-01 2018-08-29 르네사스 일렉트로닉스 가부시키가이샤 반도체 장치 및 그 제조 방법과 휴대 전화기
JP5908422B2 (ja) * 2013-03-19 2016-04-26 株式会社東芝 Ｍｅｍｓ装置及びその製造方法
JP6842682B2 (ja) * 2017-09-13 2021-03-17 株式会社村田製作所 水晶振動素子およびその製造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3185982B2 (ja) 1989-03-03 2001-07-11 東洋通信機株式会社 圧電振動子の電極構造
JP3343901B2 (ja) 1996-10-09 2002-11-11 横河電機株式会社 振動式トランスデューサとその製造方法
JPH10154820A (ja) 1996-11-25 1998-06-09 Murata Mfg Co Ltd 振動素子の製造方法
JPH11340777A (ja) 1998-05-25 1999-12-10 Matsushita Electric Ind Co Ltd 圧電振動素子
JP2000111347A (ja) 1998-09-30 2000-04-18 Aisin Seiki Co Ltd 共振型マイクロマシン
US6441539B1 (en) * 1999-11-11 2002-08-27 Murata Manufacturing Co., Ltd. Piezoelectric resonator
FI20000339A (fi) 2000-02-16 2001-08-16 Nokia Mobile Phones Ltd Mikromekaaninen säädettävä kondensaattori ja integroitu säädettävä resonaattori
US6635506B2 (en) 2001-11-07 2003-10-21 International Business Machines Corporation Method of fabricating micro-electromechanical switches on CMOS compatible substrates
US20030141946A1 (en) * 2002-01-31 2003-07-31 Ruby Richard C. Film bulk acoustic resonator (FBAR) and the method of making the same
JP4075503B2 (ja) * 2002-07-30 2008-04-16 ソニー株式会社 マイクロマシンおよびその製造方法
JP4007115B2 (ja) * 2002-08-09 2007-11-14 ソニー株式会社 マイクロマシンおよびその製造方法

Also Published As

Publication number Publication date
TWI233422B (en) 2005-06-01
EP1568655A1 (de) 2005-08-31
US20060049895A1 (en) 2006-03-09
JP2004181567A (ja) 2004-07-02
KR20050084058A (ko) 2005-08-26
TW200505786A (en) 2005-02-16
US7212081B2 (en) 2007-05-01
JP4007172B2 (ja) 2007-11-14
CN1720193A (zh) 2006-01-11
EP1568655B1 (de) 2008-07-09
WO2004050545A1 (ja) 2004-06-17
CN100402411C (zh) 2008-07-16
EP1568655A4 (de) 2006-12-06

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee