DE60312871D1 - Gitter basierter spektraler filter zur unterdrückung von strahlung ausserhalb des nutzbandes in einem extrem-ultraviolett lithographiesystem - Google Patents
Gitter basierter spektraler filter zur unterdrückung von strahlung ausserhalb des nutzbandes in einem extrem-ultraviolett lithographiesystemInfo
- Publication number
- DE60312871D1 DE60312871D1 DE60312871T DE60312871T DE60312871D1 DE 60312871 D1 DE60312871 D1 DE 60312871D1 DE 60312871 T DE60312871 T DE 60312871T DE 60312871 T DE60312871 T DE 60312871T DE 60312871 D1 DE60312871 D1 DE 60312871D1
- Authority
- DE
- Germany
- Prior art keywords
- lithography system
- spectral filter
- grid based
- ultraviolet lithography
- radiation outside
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000005855 radiation Effects 0.000 title 1
- 230000003595 spectral effect Effects 0.000 title 1
- 238000000233 ultraviolet lithography Methods 0.000 title 1
- 230000005670 electromagnetic radiation Effects 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/12—Generating the spectrum; Monochromators
- G01J3/18—Generating the spectrum; Monochromators using diffraction elements, e.g. grating
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
- G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
- G02B19/0019—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having reflective surfaces only (e.g. louvre systems, systems with multiple planar reflectors)
- G02B19/0023—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having reflective surfaces only (e.g. louvre systems, systems with multiple planar reflectors) at least one surface having optical power
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
- G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
- G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
- G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
- G02B19/0095—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with ultraviolet radiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
- G02B27/4233—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application
- G02B27/4244—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application in wavelength selecting devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
- G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
- G03F7/70158—Diffractive optical elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10239732 | 2002-08-26 | ||
DE10239732 | 2002-08-26 | ||
PCT/EP2003/008413 WO2004021086A1 (en) | 2002-08-26 | 2003-07-30 | Grating based spectral filter for eliminating out of band radiation in an extreme ultra-violet lithography system |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60312871D1 true DE60312871D1 (de) | 2007-05-10 |
DE60312871T2 DE60312871T2 (de) | 2007-12-20 |
Family
ID=31969003
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60312871T Expired - Lifetime DE60312871T2 (de) | 2002-08-26 | 2003-07-30 | Gitter basierter spektraler filter zur unterdrückung von strahlung ausserhalb des nutzbandes in einem extrem-ultraviolett lithographiesystem |
Country Status (8)
Country | Link |
---|---|
US (1) | US7319509B2 (de) |
EP (1) | EP1540423B1 (de) |
JP (1) | JP2005536900A (de) |
AT (1) | ATE358291T1 (de) |
AU (1) | AU2003251669A1 (de) |
DE (1) | DE60312871T2 (de) |
TW (1) | TWI318776B (de) |
WO (1) | WO2004021086A1 (de) |
Families Citing this family (43)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1517183A1 (de) * | 2003-08-29 | 2005-03-23 | ASML Netherlands B.V. | Lithographischer Apparat, Verfahren zur Herstellung eines Artikels und damit erzeugter Artikel |
US8094288B2 (en) | 2004-05-11 | 2012-01-10 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
KR101273740B1 (ko) * | 2004-09-22 | 2013-06-12 | 가부시키가이샤 니콘 | 조명 장치, 노광 장치 및 마이크로 디바이스의 제조 방법 |
CN101006557A (zh) * | 2004-11-17 | 2007-07-25 | 株式会社尼康 | 照明装置、曝光装置以及微元件的制造方法 |
JP4710406B2 (ja) * | 2005-04-28 | 2011-06-29 | ウシオ電機株式会社 | 極端紫外光露光装置および極端紫外光光源装置 |
US7695646B2 (en) | 2005-11-23 | 2010-04-13 | Hewlett-Packard Development Company, L.P. | Composite material with electromagnetically reactive cells and quantum dots |
US9475611B2 (en) | 2007-04-19 | 2016-10-25 | Anheuser-Busch Inbev S.A. | Integrally blow-moulded bag-in-container having interface vents opening to the atmosphere at location adjacent to bag's mouth, preform for making it; and processes for producing the preform and bag-in-container |
US20080259298A1 (en) * | 2007-04-19 | 2008-10-23 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US20080257883A1 (en) | 2007-04-19 | 2008-10-23 | Inbev S.A. | Integrally blow-moulded bag-in-container having an inner layer and the outer layer made of the same material and preform for making it |
KR101422882B1 (ko) | 2007-06-07 | 2014-07-23 | 칼 짜이스 에스엠티 게엠베하 | 마이크로리소그래피 도구를 위한 반사 일루미네이션 시스템 |
KR20090002581A (ko) * | 2007-07-02 | 2009-01-09 | 삼성전기주식회사 | 잡광 제거 장치 |
NL1036162A1 (nl) * | 2007-11-28 | 2009-06-02 | Asml Netherlands Bv | Lithographic apparatus and method. |
DE102008000788A1 (de) * | 2008-03-20 | 2009-09-24 | Carl Zeiss Smt Ag | Beleuchtungssystem für eine Mikrolithographie-Projektionsbelichtungsanlage |
DE102008017645A1 (de) | 2008-04-04 | 2009-10-08 | Carl Zeiss Smt Ag | Vorrichtung zur mikrolithographischen Projektionsbelichtung sowie Vorrichtung zur Inspektion einer Oberfläche eines Substrats |
NL2002838A1 (nl) * | 2008-05-30 | 2009-12-01 | Asml Netherlands Bv | Radiation system, radiation collector, radiation beam conditioning system, spectral purity filter for a radiation system and method of forming a spectral purity filter. |
DE102009044462A1 (de) | 2009-11-06 | 2011-01-05 | Carl Zeiss Smt Ag | Optisches Element, Beleuchtungssystem und Projektionsbelichtungsanlage |
DE102010002822A1 (de) | 2010-03-12 | 2011-09-15 | Carl Zeiss Smt Gmbh | Beleuchtungssystem für eine Mikrolithographie-Projektionsbelichtungsanlage |
DE102011015141A1 (de) * | 2011-03-16 | 2012-09-20 | Carl Zeiss Laser Optics Gmbh | Verfahren zum Herstellen eines reflektiven optischen Bauelements für eine EUV-Projektionsbelichtungsanlage und derartiges Bauelement |
US9372413B2 (en) * | 2011-04-15 | 2016-06-21 | Asml Netherlands B.V. | Optical apparatus for conditioning a radiation beam for use by an object, lithography apparatus and method of manufacturing devices |
JP5953656B2 (ja) * | 2011-05-09 | 2016-07-20 | 株式会社ニコン | 照明光学装置、露光装置、及びデバイス製造方法 |
TWI596384B (zh) * | 2012-01-18 | 2017-08-21 | Asml荷蘭公司 | 光源收集器元件、微影裝置及元件製造方法 |
KR101930926B1 (ko) * | 2012-01-19 | 2019-03-11 | 수프리야 자이스왈 | 리소그래피 및 다른 적용분야에서 극자외 방사선을 이용하는 재료, 성분 및 사용을 위한 방법 |
US10838123B2 (en) | 2012-01-19 | 2020-11-17 | Supriya Jaiswal | Materials, components, and methods for use with extreme ultraviolet radiation in lithography and other applications |
DE102012201497A1 (de) | 2012-02-02 | 2013-01-17 | Carl Zeiss Smt Gmbh | Kollektor mit einem Beugungsgitter |
DE102012010093A1 (de) * | 2012-05-23 | 2013-11-28 | Carl Zeiss Smt Gmbh | Facettenspiegel |
DE102012220465A1 (de) * | 2012-11-09 | 2014-05-15 | Carl Zeiss Smt Gmbh | EUV-Kollektor |
US9151881B2 (en) | 2012-11-12 | 2015-10-06 | Kla-Tencor Corporation | Phase grating for mask inspection system |
JP6438412B2 (ja) | 2013-01-28 | 2018-12-12 | エーエスエムエル ネザーランズ ビー.ブイ. | リソグラフィ装置のための投影システム、ミラーおよび放射源 |
DE102013202948A1 (de) * | 2013-02-22 | 2014-09-11 | Carl Zeiss Smt Gmbh | Beleuchtungssystem für eine EUV-Lithographievorrichtung und Facettenspiegel dafür |
US10209526B2 (en) | 2014-01-20 | 2019-02-19 | Yakov Soskind | Electromagnetic radiation enhancement methods and systems |
US10261318B2 (en) | 2014-09-29 | 2019-04-16 | Magic Leap, Inc. | Architectures and methods for outputting different wavelength light out of waveguides |
NL2017272A (en) * | 2015-08-25 | 2017-03-01 | Asml Netherlands Bv | Suppression filter, radiation collector and radiation source for a lithographic apparatus; method of determining a separation distance between at least two reflective surface levels of a suppression filter |
US11112618B2 (en) * | 2015-09-03 | 2021-09-07 | Asml Netherlands B.V. | Beam splitting apparatus |
CA3023539A1 (en) | 2016-05-12 | 2017-11-16 | Magic Leap, Inc. | Distributed light manipulation over imaging waveguide |
DE102017204312A1 (de) | 2016-05-30 | 2017-11-30 | Carl Zeiss Smt Gmbh | Optische Wellenlängen-Filterkomponente für ein Lichtbündel |
DE102018212224A1 (de) | 2018-07-23 | 2020-01-23 | Carl Zeiss Smt Gmbh | Vorrichtung zur Rückkopplung von emittierter Strahlung in eine Laserquelle |
DE102019210450A1 (de) * | 2019-07-16 | 2021-01-21 | Carl Zeiss Smt Gmbh | Optische Beugungskomponente zur Unterdrückung mindestens einer Ziel-Wellenlänge durch destruktive Interferenz |
TWI831898B (zh) | 2019-01-15 | 2024-02-11 | 德商卡爾蔡司Smt有限公司 | 藉由破壞性干涉抑制至少一目標波長的光學繞射元件 |
DE102019200376A1 (de) | 2019-01-15 | 2020-07-16 | Carl Zeiss Smt Gmbh | Optische Beugungskomponente zur Unterdrückung mindestens einer Ziel-Wellenlänge durch destruktive Interferenz |
DE102019213063A1 (de) | 2019-08-30 | 2021-03-04 | Carl Zeiss Smt Gmbh | Optische Beugungskomponente |
DE102020207807A1 (de) * | 2020-06-24 | 2021-12-30 | Carl Zeiss Smt Gmbh | Optisches Element für eine EUV-Projektionsbelichtungsanlage |
DE102021210671A1 (de) | 2021-09-24 | 2022-12-01 | Carl Zeiss Smt Gmbh | Intensitätsanpassungsfilter für eine optische anordnung und optische anordnung mit einem entsprechenden intensitätsanpassungsfilter sowie verfahren zu dessen herstellung |
DE102022214434A1 (de) | 2022-01-17 | 2023-07-20 | Carl Zeiss Smt Gmbh | Verfahren zur Herstellung einer optischen Gitterstruktur zur gezielten Beugung von Licht mindestens einer Ziel-Wellenlänge |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07301696A (ja) | 1994-05-09 | 1995-11-14 | Hitachi Ltd | X線投影露光方法及び装置 |
DE10138313A1 (de) * | 2001-01-23 | 2002-07-25 | Zeiss Carl | Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm |
US6438199B1 (en) * | 1998-05-05 | 2002-08-20 | Carl-Zeiss-Stiftung | Illumination system particularly for microlithography |
US6118577A (en) * | 1998-08-06 | 2000-09-12 | Euv, L.L.C | Diffractive element in extreme-UV lithography condenser |
US6469827B1 (en) * | 1998-08-06 | 2002-10-22 | Euv Llc | Diffraction spectral filter for use in extreme-UV lithography condenser |
US6100978A (en) * | 1998-10-21 | 2000-08-08 | Naulleau; Patrick P. | Dual-domain point diffraction interferometer |
EP1772775B1 (de) * | 1999-02-15 | 2008-11-05 | Carl Zeiss SMT AG | Mikrolithographie-Reduktionsobjektiveinrichtung sowie Projektionsbelichtungsanlage |
US6867913B2 (en) * | 2000-02-14 | 2005-03-15 | Carl Zeiss Smt Ag | 6-mirror microlithography projection objective |
CA2402615C (en) * | 2000-03-22 | 2007-03-20 | California Institute Of Technology | Non-spherical whispering-gallery-mode microactivity |
KR100931335B1 (ko) | 2000-09-29 | 2009-12-11 | 칼 짜이스 에스엠티 아게 | 격자 엘리먼트를 구비한 조명 시스템 |
US6522465B1 (en) * | 2001-09-27 | 2003-02-18 | Intel Corporation | Transmitting spectral filtering of high power extreme ultra-violet radiation |
-
2003
- 2003-07-30 WO PCT/EP2003/008413 patent/WO2004021086A1/en active IP Right Grant
- 2003-07-30 DE DE60312871T patent/DE60312871T2/de not_active Expired - Lifetime
- 2003-07-30 AT AT03790838T patent/ATE358291T1/de not_active IP Right Cessation
- 2003-07-30 JP JP2004531839A patent/JP2005536900A/ja active Pending
- 2003-07-30 AU AU2003251669A patent/AU2003251669A1/en not_active Abandoned
- 2003-07-30 EP EP03790838A patent/EP1540423B1/de not_active Expired - Lifetime
- 2003-07-31 TW TW092121069A patent/TWI318776B/zh not_active IP Right Cessation
-
2005
- 2005-02-24 US US11/064,594 patent/US7319509B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
AU2003251669A1 (en) | 2004-03-19 |
US20050275818A1 (en) | 2005-12-15 |
EP1540423A1 (de) | 2005-06-15 |
WO2004021086A1 (en) | 2004-03-11 |
JP2005536900A (ja) | 2005-12-02 |
US7319509B2 (en) | 2008-01-15 |
DE60312871T2 (de) | 2007-12-20 |
TWI318776B (en) | 2009-12-21 |
EP1540423B1 (de) | 2007-03-28 |
TW200406822A (en) | 2004-05-01 |
ATE358291T1 (de) | 2007-04-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: CARL ZEISS SMT GMBH, 73447 OBERKOCHEN, DE |