ATE358291T1 - Gitter basierter spektraler filter zur unterdrückung von strahlung ausserhalb des nutzbandes in einem extrem-ultraviolett lithographiesystem - Google Patents

Gitter basierter spektraler filter zur unterdrückung von strahlung ausserhalb des nutzbandes in einem extrem-ultraviolett lithographiesystem

Info

Publication number
ATE358291T1
ATE358291T1 AT03790838T AT03790838T ATE358291T1 AT E358291 T1 ATE358291 T1 AT E358291T1 AT 03790838 T AT03790838 T AT 03790838T AT 03790838 T AT03790838 T AT 03790838T AT E358291 T1 ATE358291 T1 AT E358291T1
Authority
AT
Austria
Prior art keywords
extreme
lithography system
spectral filter
grid based
ultraviolet lithography
Prior art date
Application number
AT03790838T
Other languages
English (en)
Inventor
Wolfgang Singer
Original Assignee
Zeiss Carl Smt Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Ag filed Critical Zeiss Carl Smt Ag
Application granted granted Critical
Publication of ATE358291T1 publication Critical patent/ATE358291T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/12—Generating the spectrum; Monochromators
    • G01J3/18—Generating the spectrum; Monochromators using diffraction elements, e.g. grating
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
    • G02B19/0019—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having reflective surfaces only (e.g. louvre systems, systems with multiple planar reflectors)
    • G02B19/0023—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having reflective surfaces only (e.g. louvre systems, systems with multiple planar reflectors) at least one surface having optical power
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0095—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/4233—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application
    • G02B27/4244—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application in wavelength selecting devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70158—Diffractive optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Optical Filters (AREA)
  • Jet Pumps And Other Pumps (AREA)
  • Display Devices Of Pinball Game Machines (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
AT03790838T 2002-08-26 2003-07-30 Gitter basierter spektraler filter zur unterdrückung von strahlung ausserhalb des nutzbandes in einem extrem-ultraviolett lithographiesystem ATE358291T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE10239732 2002-08-26

Publications (1)

Publication Number Publication Date
ATE358291T1 true ATE358291T1 (de) 2007-04-15

Family

ID=31969003

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03790838T ATE358291T1 (de) 2002-08-26 2003-07-30 Gitter basierter spektraler filter zur unterdrückung von strahlung ausserhalb des nutzbandes in einem extrem-ultraviolett lithographiesystem

Country Status (8)

Country Link
US (1) US7319509B2 (de)
EP (1) EP1540423B1 (de)
JP (1) JP2005536900A (de)
AT (1) ATE358291T1 (de)
AU (1) AU2003251669A1 (de)
DE (1) DE60312871T2 (de)
TW (1) TWI318776B (de)
WO (1) WO2004021086A1 (de)

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US8094288B2 (en) 2004-05-11 2012-01-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4518078B2 (ja) * 2004-09-22 2010-08-04 株式会社ニコン 照明装置、露光装置及びマイクロデバイスの製造方法
JP4844398B2 (ja) * 2004-11-17 2011-12-28 株式会社ニコン 照明装置、露光装置及びマイクロデバイスの製造方法
JP4710406B2 (ja) * 2005-04-28 2011-06-29 ウシオ電機株式会社 極端紫外光露光装置および極端紫外光光源装置
US7695646B2 (en) 2005-11-23 2010-04-13 Hewlett-Packard Development Company, L.P. Composite material with electromagnetically reactive cells and quantum dots
US20080259298A1 (en) * 2007-04-19 2008-10-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
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US20080257883A1 (en) 2007-04-19 2008-10-23 Inbev S.A. Integrally blow-moulded bag-in-container having an inner layer and the outer layer made of the same material and preform for making it
JP5077724B2 (ja) 2007-06-07 2012-11-21 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィツール用の反射照明システム
KR20090002581A (ko) * 2007-07-02 2009-01-09 삼성전기주식회사 잡광 제거 장치
NL1036162A1 (nl) * 2007-11-28 2009-06-02 Asml Netherlands Bv Lithographic apparatus and method.
DE102008000788A1 (de) * 2008-03-20 2009-09-24 Carl Zeiss Smt Ag Beleuchtungssystem für eine Mikrolithographie-Projektionsbelichtungsanlage
DE102008017645A1 (de) 2008-04-04 2009-10-08 Carl Zeiss Smt Ag Vorrichtung zur mikrolithographischen Projektionsbelichtung sowie Vorrichtung zur Inspektion einer Oberfläche eines Substrats
JP5475756B2 (ja) * 2008-05-30 2014-04-16 エーエスエムエル ネザーランズ ビー．ブイ． スペクトル純度フィルタを形成する方法
DE102009044462A1 (de) 2009-11-06 2011-01-05 Carl Zeiss Smt Ag Optisches Element, Beleuchtungssystem und Projektionsbelichtungsanlage
DE102010002822A1 (de) 2010-03-12 2011-09-15 Carl Zeiss Smt Gmbh Beleuchtungssystem für eine Mikrolithographie-Projektionsbelichtungsanlage
DE102011015141A1 (de) * 2011-03-16 2012-09-20 Carl Zeiss Laser Optics Gmbh Verfahren zum Herstellen eines reflektiven optischen Bauelements für eine EUV-Projektionsbelichtungsanlage und derartiges Bauelement
US9372413B2 (en) * 2011-04-15 2016-06-21 Asml Netherlands B.V. Optical apparatus for conditioning a radiation beam for use by an object, lithography apparatus and method of manufacturing devices
JP5953656B2 (ja) * 2011-05-09 2016-07-20 株式会社ニコン 照明光学装置、露光装置、及びデバイス製造方法
TWI596384B (zh) * 2012-01-18 2017-08-21 Ａｓｍｌ荷蘭公司 光源收集器元件、微影裝置及元件製造方法
JP2015510688A (ja) * 2012-01-19 2015-04-09 スプリヤ ジャイスワル リソグラフィ及び他の用途における極端紫外線放射で使用する材料、成分及び方法
US10838123B2 (en) 2012-01-19 2020-11-17 Supriya Jaiswal Materials, components, and methods for use with extreme ultraviolet radiation in lithography and other applications
DE102012201497A1 (de) 2012-02-02 2013-01-17 Carl Zeiss Smt Gmbh Kollektor mit einem Beugungsgitter
DE102012010093A1 (de) 2012-05-23 2013-11-28 Carl Zeiss Smt Gmbh Facettenspiegel
DE102012220465A1 (de) * 2012-11-09 2014-05-15 Carl Zeiss Smt Gmbh EUV-Kollektor
US9151881B2 (en) 2012-11-12 2015-10-06 Kla-Tencor Corporation Phase grating for mask inspection system
KR102278351B1 (ko) 2013-01-28 2021-07-19 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치를 위한 방사선 소스, 거울 및 투영 시스템
DE102013202948A1 (de) * 2013-02-22 2014-09-11 Carl Zeiss Smt Gmbh Beleuchtungssystem für eine EUV-Lithographievorrichtung und Facettenspiegel dafür
US10209526B2 (en) 2014-01-20 2019-02-19 Yakov Soskind Electromagnetic radiation enhancement methods and systems
KR102295496B1 (ko) 2014-09-29 2021-09-01 매직 립, 인코포레이티드 상이한 파장의 광을 도파관 밖으로 출력하기 위한 아키텍쳐 및 방법
WO2017032569A1 (en) * 2015-08-25 2017-03-02 Asml Netherlands B.V. Suppression filter, radiation collector and radiation source for a lithographic apparatus; method of determining a separation distance between at least two reflective surface levels of a suppression filter
NL2017275A (en) * 2015-09-03 2017-03-08 Asml Netherlands Bv Beam splitting apparatus
US9904058B2 (en) 2016-05-12 2018-02-27 Magic Leap, Inc. Distributed light manipulation over imaging waveguide
DE102017204312A1 (de) 2016-05-30 2017-11-30 Carl Zeiss Smt Gmbh Optische Wellenlängen-Filterkomponente für ein Lichtbündel
DE102018212224A1 (de) 2018-07-23 2020-01-23 Carl Zeiss Smt Gmbh Vorrichtung zur Rückkopplung von emittierter Strahlung in eine Laserquelle
DE102019210450A1 (de) * 2019-07-16 2021-01-21 Carl Zeiss Smt Gmbh Optische Beugungskomponente zur Unterdrückung mindestens einer Ziel-Wellenlänge durch destruktive Interferenz
TWI831898B (zh) 2019-01-15 2024-02-11 德商卡爾蔡司Ｓｍｔ有限公司 藉由破壞性干涉抑制至少一目標波長的光學繞射元件
DE102019200376A1 (de) 2019-01-15 2020-07-16 Carl Zeiss Smt Gmbh Optische Beugungskomponente zur Unterdrückung mindestens einer Ziel-Wellenlänge durch destruktive Interferenz
DE102019213063A1 (de) 2019-08-30 2021-03-04 Carl Zeiss Smt Gmbh Optische Beugungskomponente
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DE102021210671A1 (de) 2021-09-24 2022-12-01 Carl Zeiss Smt Gmbh Intensitätsanpassungsfilter für eine optische anordnung und optische anordnung mit einem entsprechenden intensitätsanpassungsfilter sowie verfahren zu dessen herstellung
DE102022214434A1 (de) 2022-01-17 2023-07-20 Carl Zeiss Smt Gmbh Verfahren zur Herstellung einer optischen Gitterstruktur zur gezielten Beugung von Licht mindestens einer Ziel-Wellenlänge

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Also Published As

Publication number Publication date
JP2005536900A (ja) 2005-12-02
US20050275818A1 (en) 2005-12-15
DE60312871T2 (de) 2007-12-20
US7319509B2 (en) 2008-01-15
DE60312871D1 (de) 2007-05-10
TWI318776B (en) 2009-12-21
WO2004021086A1 (en) 2004-03-11
EP1540423B1 (de) 2007-03-28
EP1540423A1 (de) 2005-06-15
TW200406822A (en) 2004-05-01
AU2003251669A1 (en) 2004-03-19

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