DE60312443D1 - Stereolithographische Harze mit Hochtemperaturbeständig und mit höher Schlagzähigkeit - Google Patents

Stereolithographische Harze mit Hochtemperaturbeständig und mit höher Schlagzähigkeit

Info

Publication number
DE60312443D1
DE60312443D1 DE60312443T DE60312443T DE60312443D1 DE 60312443 D1 DE60312443 D1 DE 60312443D1 DE 60312443 T DE60312443 T DE 60312443T DE 60312443 T DE60312443 T DE 60312443T DE 60312443 D1 DE60312443 D1 DE 60312443D1
Authority
DE
Germany
Prior art keywords
impact strength
temperature resistance
high temperature
stereolithographic resins
high impact
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60312443T
Other languages
English (en)
Other versions
DE60312443T3 (de
DE60312443T2 (de
Inventor
Bettina Steinmann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3D Systems Inc
Original Assignee
3D Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=30002707&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE60312443(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by 3D Systems Inc filed Critical 3D Systems Inc
Application granted granted Critical
Publication of DE60312443D1 publication Critical patent/DE60312443D1/de
Publication of DE60312443T2 publication Critical patent/DE60312443T2/de
Publication of DE60312443T3 publication Critical patent/DE60312443T3/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y10/00—Processes of additive manufacturing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • B33Y70/10—Composites of different types of material, e.g. mixtures of ceramics and polymers or mixtures of metals and biomaterials

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Epoxy Resins (AREA)
DE60312443T 2002-07-18 2003-07-16 Stereolithographische Harze mit Hochtemperaturbeständig und mit höher Schlagzähigkeit Expired - Lifetime DE60312443T3 (de)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US19922602A 2002-07-18 2002-07-18
US199226 2002-07-18
US10/338,074 US6989225B2 (en) 2002-07-18 2003-01-07 Stereolithographic resins with high temperature and high impact resistance
US338074 2003-01-07
EP03254460.3A EP1385055B9 (de) 2002-07-18 2003-07-16 Stereolithographische Harze mit Hochtemperaturbeständig und mit höher Schlagzähigkeit

Publications (3)

Publication Number Publication Date
DE60312443D1 true DE60312443D1 (de) 2007-04-26
DE60312443T2 DE60312443T2 (de) 2007-12-13
DE60312443T3 DE60312443T3 (de) 2013-07-18

Family

ID=30002707

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60312443T Expired - Lifetime DE60312443T3 (de) 2002-07-18 2003-07-16 Stereolithographische Harze mit Hochtemperaturbeständig und mit höher Schlagzähigkeit

Country Status (4)

Country Link
US (1) US6989225B2 (de)
EP (1) EP1385055B9 (de)
JP (1) JP4050667B2 (de)
DE (1) DE60312443T3 (de)

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EP1689800A1 (de) * 2003-12-02 2006-08-16 DSM IP Assets B.V. Flammwidrige strahlenhärtbare zusammensetzungen
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DE102004022961B4 (de) * 2004-05-10 2008-11-20 Envisiontec Gmbh Verfahren zur Herstellung eines dreidimensionalen Objekts mit Auflösungsverbesserung mittels Pixel-Shift
WO2005110722A1 (de) 2004-05-10 2005-11-24 Envisiontec Gmbh Verfahren zur herstellung eines dreidimensionalen objekts mit auflösungsverbesserung mittels pixel-shift
JP4834987B2 (ja) * 2004-12-13 2011-12-14 三菱化学株式会社 硬化塗膜形成用エポキシ樹脂組成物及び硬化塗膜
US20060172230A1 (en) * 2005-02-02 2006-08-03 Dsm Ip Assets B.V. Method and composition for reducing waste in photo-imaging applications
WO2007008828A2 (en) * 2005-07-08 2007-01-18 Sky+, Ltd. Method for casting reactive metals and casting containers associated therewith
DE102006019963B4 (de) 2006-04-28 2023-12-07 Envisiontec Gmbh Vorrichtung und Verfahren zur Herstellung eines dreidimensionalen Objekts durch schichtweises Verfestigen eines unter Einwirkung von elektromagnetischer Strahlung verfestigbaren Materials mittels Maskenbelichtung
DE102006019964C5 (de) * 2006-04-28 2021-08-26 Envisiontec Gmbh Vorrichtung und Verfahren zur Herstellung eines dreidimensionalen Objekts mittels Maskenbelichtung
US7636610B2 (en) * 2006-07-19 2009-12-22 Envisiontec Gmbh Method and device for producing a three-dimensional object, and computer and data carrier useful therefor
US7892474B2 (en) 2006-11-15 2011-02-22 Envisiontec Gmbh Continuous generative process for producing a three-dimensional object
US8003039B2 (en) 2007-01-17 2011-08-23 3D Systems, Inc. Method for tilting solid image build platform for reducing air entrainment and for build release
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US20100190881A1 (en) * 2009-01-28 2010-07-29 3D Systems, Incorporated Radiation Curable Compositions Useful in Solid Freeform Fabrication Systems
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JP5425005B2 (ja) * 2009-08-19 2014-02-26 日本電波工業株式会社 圧電部品及びその製造方法
US8372330B2 (en) 2009-10-19 2013-02-12 Global Filtration Systems Resin solidification substrate and assembly
JP5310690B2 (ja) * 2010-10-01 2013-10-09 三菱化学株式会社 エポキシ樹脂組成物及びエポキシ樹脂硬化体
US9527244B2 (en) 2014-02-10 2016-12-27 Global Filtration Systems Apparatus and method for forming three-dimensional objects from solidifiable paste
EP3235630B1 (de) * 2014-12-16 2020-08-19 FUJIFILM Corporation Durch aktinische strahlen härtbare tintenstrahltintenzusammensetzung zum 3d-drucken, verfahren zur dreidimensionalen modellierung und durch aktinische strahlen härtbarer tintenstrahltintensatz zum 3d-drucken
WO2016148890A1 (en) * 2015-03-19 2016-09-22 Dow Global Technologies Llc Method of additive manufacturing using photoregulated radical polymerization
CN105131201A (zh) * 2015-09-21 2015-12-09 东莞市盟大塑化科技有限公司 一种uv固化光敏材料及其在光固化3d打印机的应用
US20170176856A1 (en) 2015-12-21 2017-06-22 Az Electronic Materials (Luxembourg) S.A.R.L. Negative-working photoresist compositions for laser ablation and use thereof
JP6883271B2 (ja) * 2016-03-17 2021-06-09 日本電気硝子株式会社 無機充填材粒子
US10737479B2 (en) 2017-01-12 2020-08-11 Global Filtration Systems Method of making three-dimensional objects using both continuous and discontinuous solidification
ES2685280B2 (es) * 2017-03-31 2019-06-21 Centro Tecnologico De Nanomateriales Avanzados S L Composición de resina curable por radiación y procedimiento para su obtención
TWI692502B (zh) 2017-12-29 2020-05-01 法商阿科瑪法國公司 可固化組成物
CN112638968A (zh) 2018-09-24 2021-04-09 巴斯夫欧洲公司 用于3d打印的可光固化组合物
DE102018220611B4 (de) * 2018-11-29 2022-02-10 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Thermisch vernetzbare Zusammensetzung zur Verwendung als Bindemittel im Binder-Jetting-Verfahren
JP2023549334A (ja) * 2020-11-16 2023-11-24 スリーディー システムズ インコーポレーテッド ３ｄ物品をプリントするための造形材料

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Also Published As

Publication number Publication date
EP1385055B2 (de) 2013-03-06
DE60312443T3 (de) 2013-07-18
JP4050667B2 (ja) 2008-02-20
EP1385055B9 (de) 2013-07-31
EP1385055B1 (de) 2007-03-14
DE60312443T2 (de) 2007-12-13
JP2004131706A (ja) 2004-04-30
EP1385055A1 (de) 2004-01-28
US20040013977A1 (en) 2004-01-22
US6989225B2 (en) 2006-01-24

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Owner name: 3D SYSTEMS, INC., ROCK HILL, S.C., US