DE60236324D1 - Reinigungsflächengebilde, trägerglied mit reinigungsfunktion und verfahren zur reinigung von diese umfassenden substratprozessoren - Google Patents

Reinigungsflächengebilde, trägerglied mit reinigungsfunktion und verfahren zur reinigung von diese umfassenden substratprozessoren

Info

Publication number
DE60236324D1
DE60236324D1 DE60236324T DE60236324T DE60236324D1 DE 60236324 D1 DE60236324 D1 DE 60236324D1 DE 60236324 T DE60236324 T DE 60236324T DE 60236324 T DE60236324 T DE 60236324T DE 60236324 D1 DE60236324 D1 DE 60236324D1
Authority
DE
Germany
Prior art keywords
cleaning
purifier
surface picture
function
substrate processors
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60236324T
Other languages
English (en)
Inventor
Makoto Namikawa
Yoshio Terada
Jirou Nukaga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nitto Denko Corp
Original Assignee
Nitto Denko Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Denko Corp filed Critical Nitto Denko Corp
Application granted granted Critical
Publication of DE60236324D1 publication Critical patent/DE60236324D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Cleaning In General (AREA)
DE60236324T 2002-06-19 2002-06-19 Reinigungsflächengebilde, trägerglied mit reinigungsfunktion und verfahren zur reinigung von diese umfassenden substratprozessoren Expired - Lifetime DE60236324D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2002/006118 WO2004000474A1 (ja) 2001-05-02 2002-06-19 クリーニングシート、クリーニング機能付き搬送部材、及びこれらを用いた基板処理装置のクリーニング方法

Publications (1)

Publication Number Publication Date
DE60236324D1 true DE60236324D1 (de) 2010-06-17

Family

ID=34131266

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60236324T Expired - Lifetime DE60236324D1 (de) 2002-06-19 2002-06-19 Reinigungsflächengebilde, trägerglied mit reinigungsfunktion und verfahren zur reinigung von diese umfassenden substratprozessoren

Country Status (4)

Country Link
EP (1) EP1514615B1 (de)
KR (1) KR100770501B1 (de)
DE (1) DE60236324D1 (de)
WO (1) WO2004000474A1 (de)

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5850435A (ja) 1981-09-22 1983-03-24 Kansai Electric Power Co Inc:The 振動監視装置
JPS5850435U (ja) * 1981-10-01 1983-04-05 株式会社リコー 乾式ジアゾ複写機現像装置用クリ−ナ−シ−ト
JPH01129078A (ja) 1987-11-13 1989-05-22 Toray Ind Inc 電着被覆用組成物
JP3272990B2 (ja) * 1996-09-04 2002-04-08 キヤノン株式会社 クリーニングシート、これを用いた記録装置のクリーニング方法及びこれを有する被記録材積畳体
JPH10154686A (ja) 1996-11-22 1998-06-09 Toshiba Corp 半導体基板処理装置のクリーニング方法
JPH1187458A (ja) 1997-09-16 1999-03-30 Hitachi Ltd 異物除去機能付き半導体製造装置
JP2002079190A (ja) 2000-09-06 2002-03-19 Dainippon Screen Mfg Co Ltd 基板洗浄部材、ならびにこれを用いた基板洗浄装置および基板洗浄方法
JP4832664B2 (ja) * 2001-05-21 2011-12-07 日本ミクロコーティング株式会社 接触子クリーニングシート及び方法

Also Published As

Publication number Publication date
WO2004000474A1 (ja) 2003-12-31
EP1514615A1 (de) 2005-03-16
EP1514615A4 (de) 2005-10-19
EP1514615B1 (de) 2010-05-05
KR100770501B1 (ko) 2007-10-25
KR20050013140A (ko) 2005-02-02

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition