DE60218795D1 - Vorrichtung zur Messung der Blendenöffnung einer Probe für optisches Nahfeld, und Verfahren zur deren Messung - Google Patents

Vorrichtung zur Messung der Blendenöffnung einer Probe für optisches Nahfeld, und Verfahren zur deren Messung

Info

Publication number
DE60218795D1
DE60218795D1 DE60218795T DE60218795T DE60218795D1 DE 60218795 D1 DE60218795 D1 DE 60218795D1 DE 60218795 T DE60218795 T DE 60218795T DE 60218795 T DE60218795 T DE 60218795T DE 60218795 D1 DE60218795 D1 DE 60218795D1
Authority
DE
Germany
Prior art keywords
measuring
aperture
sample
near field
optical near
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60218795T
Other languages
English (en)
Other versions
DE60218795T2 (de
Inventor
Gi-Myung Woo
Petrov Nikolai
Myung-Bok Lee
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samsung Electronics Co Ltd
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Application granted granted Critical
Publication of DE60218795D1 publication Critical patent/DE60218795D1/de
Publication of DE60218795T2 publication Critical patent/DE60218795T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/08—Measuring arrangements characterised by the use of optical techniques for measuring diameters
    • G01B11/12—Measuring arrangements characterised by the use of optical techniques for measuring diameters internal diameters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
    • G01Q60/18—SNOM [Scanning Near-Field Optical Microscopy] or apparatus therefor, e.g. SNOM probes
    • G01Q60/22—Probes, their manufacture, or their related instrumentation, e.g. holders
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y35/00—Methods or apparatus for measurement or analysis of nanostructures

Landscapes

  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Radiology & Medical Imaging (AREA)
  • General Health & Medical Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biophysics (AREA)
  • Optics & Photonics (AREA)
  • Analytical Chemistry (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
DE60218795T 2001-09-18 2002-08-30 Vorrichtung zur Messung der Blendenöffnung einer Probe für optisches Nahfeld, und Verfahren zur deren Messung Expired - Fee Related DE60218795T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR2001057575 2001-09-18
KR10-2001-0057575A KR100434542B1 (ko) 2001-09-18 2001-09-18 근접장용 광 프로브 개구 측정장치 및 방법

Publications (2)

Publication Number Publication Date
DE60218795D1 true DE60218795D1 (de) 2007-04-26
DE60218795T2 DE60218795T2 (de) 2007-07-05

Family

ID=19714393

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60218795T Expired - Fee Related DE60218795T2 (de) 2001-09-18 2002-08-30 Vorrichtung zur Messung der Blendenöffnung einer Probe für optisches Nahfeld, und Verfahren zur deren Messung

Country Status (6)

Country Link
US (1) US6791071B2 (de)
EP (1) EP1293990B1 (de)
JP (1) JP3802860B2 (de)
KR (1) KR100434542B1 (de)
CN (1) CN1405784A (de)
DE (1) DE60218795T2 (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7361171B2 (en) 2003-05-20 2008-04-22 Raydiance, Inc. Man-portable optical ablation system
US9022037B2 (en) 2003-08-11 2015-05-05 Raydiance, Inc. Laser ablation method and apparatus having a feedback loop and control unit
US8921733B2 (en) 2003-08-11 2014-12-30 Raydiance, Inc. Methods and systems for trimming circuits
US20050035097A1 (en) * 2003-08-11 2005-02-17 Richard Stoltz Altering the emission of an ablation beam for safety or control
US8173929B1 (en) 2003-08-11 2012-05-08 Raydiance, Inc. Methods and systems for trimming circuits
US8135050B1 (en) 2005-07-19 2012-03-13 Raydiance, Inc. Automated polarization correction
US20070167835A1 (en) * 2005-07-25 2007-07-19 Massachusetts Institute Of Technology Tri modal spectroscopic imaging
US8232687B2 (en) 2006-04-26 2012-07-31 Raydiance, Inc. Intelligent laser interlock system
US7444049B1 (en) 2006-01-23 2008-10-28 Raydiance, Inc. Pulse stretcher and compressor including a multi-pass Bragg grating
US8189971B1 (en) 2006-01-23 2012-05-29 Raydiance, Inc. Dispersion compensation in a chirped pulse amplification system
US7822347B1 (en) 2006-03-28 2010-10-26 Raydiance, Inc. Active tuning of temporal dispersion in an ultrashort pulse laser system
JP4820998B2 (ja) * 2006-04-20 2011-11-24 国立大学法人電気通信大学 位相特異点検出方法、及び、位相特異点検出装置、並びに、プログラム
US8125704B2 (en) 2008-08-18 2012-02-28 Raydiance, Inc. Systems and methods for controlling a pulsed laser by combining laser signals
WO2012021748A1 (en) 2010-08-12 2012-02-16 Raydiance, Inc. Polymer tubing laser micromachining
KR20140018183A (ko) 2010-09-16 2014-02-12 레이디안스, 아이엔씨. 적층 재료의 레이저 기반 처리
US8554037B2 (en) 2010-09-30 2013-10-08 Raydiance, Inc. Hybrid waveguide device in powerful laser systems
JP5557399B2 (ja) 2012-08-30 2014-07-23 独立行政法人情報通信研究機構 マルチコアファイバを含む空間分割多重装置及び自己ホモダイン検波方法
KR102060893B1 (ko) * 2018-05-29 2020-02-11 한국광기술원 전광선속 측정 장치
CN110082077B (zh) * 2019-06-19 2024-05-28 无锡奥普特自动化技术有限公司 光纤数值孔径测量仪

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4086491A (en) * 1977-02-04 1978-04-25 The United States Of America As Represented By The Secretary Of The Navy Direct measurement of the electron beam of a scanning electron microscope
JPS6071934A (ja) * 1983-09-29 1985-04-23 Sumitomo Electric Ind Ltd 単一モ−ドフアイバのスポツトサイズ測定方法
JPH01180403A (ja) * 1988-01-12 1989-07-18 Furukawa Electric Co Ltd:The 微小孔径の測定方法
DE69118117T2 (de) * 1990-11-19 1996-10-24 At & T Corp., New York, N.Y. Optisches Nahfeldabtastmikroskop und dessen Anwendungen
JP2823970B2 (ja) * 1991-04-05 1998-11-11 浜松ホトニクス株式会社 近接場走査光学顕微鏡
US5663798A (en) * 1995-05-08 1997-09-02 Dr. Khaled Karrai Und Dr. Miles Haines Gesellschaft Burgerlichen Rechts Far-field characterization of sub-wavelength sized apertures
JPH09203739A (ja) * 1996-01-25 1997-08-05 Nikon Corp プローブ位置制御装置および走査型近接場顕微鏡
DE19620192A1 (de) * 1996-05-20 1997-11-27 Zeiss Carl Fa Abtastgerät, insbesondere Rastersondenmikroskop
JP3249419B2 (ja) * 1997-03-12 2002-01-21 セイコーインスツルメンツ株式会社 走査型近接場光学顕微鏡

Also Published As

Publication number Publication date
JP3802860B2 (ja) 2006-07-26
EP1293990A3 (de) 2006-05-17
KR20030024428A (ko) 2003-03-26
DE60218795T2 (de) 2007-07-05
US6791071B2 (en) 2004-09-14
EP1293990B1 (de) 2007-03-14
US20030057352A1 (en) 2003-03-27
JP2003139514A (ja) 2003-05-14
EP1293990A2 (de) 2003-03-19
CN1405784A (zh) 2003-03-26
KR100434542B1 (ko) 2004-06-05

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee