DE60217989T8 - Verwendung eines spektroskopischen Ellipsometers - Google Patents

Verwendung eines spektroskopischen Ellipsometers Download PDF

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Publication number
DE60217989T8
DE60217989T8 DE60217989T DE60217989T DE60217989T8 DE 60217989 T8 DE60217989 T8 DE 60217989T8 DE 60217989 T DE60217989 T DE 60217989T DE 60217989 T DE60217989 T DE 60217989T DE 60217989 T8 DE60217989 T8 DE 60217989T8
Authority
DE
Germany
Prior art keywords
spectroscopic ellipsometer
ellipsometer
spectroscopic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60217989T
Other languages
English (en)
Other versions
DE60217989T2 (de
DE60217989D1 (de
Inventor
Toyoki Kanzaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Horiba Ltd
Original Assignee
Horiba Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Horiba Ltd filed Critical Horiba Ltd
Application granted granted Critical
Publication of DE60217989D1 publication Critical patent/DE60217989D1/de
Publication of DE60217989T2 publication Critical patent/DE60217989T2/de
Publication of DE60217989T8 publication Critical patent/DE60217989T8/de
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry

Landscapes

  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Spectrometry And Color Measurement (AREA)
DE60217989T 2001-04-25 2002-04-16 Verwendung eines spektroskopischen Ellipsometers Expired - Fee Related DE60217989T8 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001127495A JP4399126B2 (ja) 2001-04-25 2001-04-25 分光エリプソメータ
JP2001127495 2001-04-25

Publications (3)

Publication Number Publication Date
DE60217989D1 DE60217989D1 (de) 2007-03-22
DE60217989T2 DE60217989T2 (de) 2007-09-06
DE60217989T8 true DE60217989T8 (de) 2007-12-13

Family

ID=18976353

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60217989T Expired - Fee Related DE60217989T8 (de) 2001-04-25 2002-04-16 Verwendung eines spektroskopischen Ellipsometers

Country Status (4)

Country Link
US (1) US6943880B2 (de)
EP (1) EP1253418B1 (de)
JP (1) JP4399126B2 (de)
DE (1) DE60217989T8 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7301631B1 (en) 2004-09-17 2007-11-27 J.A. Woollam Co., Inc. Control of uncertain angle of incidence of beam from Arc lamp
US6784991B2 (en) * 2001-06-18 2004-08-31 Therma-Wave, Inc. Diffractive optical elements and grid polarizers in focusing spectroscopic ellipsometers
JP2008275632A (ja) * 2003-05-20 2008-11-13 Dainippon Screen Mfg Co Ltd 分光エリプソメータ
DE10333119B3 (de) 2003-07-21 2005-05-25 Infineon Technologies Ag Nichtinvasives Verfahren zur Charakterisierung und Identifizierung eingebetteter Mikrostrukturen
US7738105B1 (en) 2004-04-23 2010-06-15 Liphardt Martin M System and method of applying horizontally oriented arc-lamps in ellipsometer or the like systems
US8189193B1 (en) 2004-04-23 2012-05-29 J.A. Woollam Co., Inc. System and method of applying horizontally oriented arc-lamps in ellipsometer or the like systems
JP4694179B2 (ja) * 2004-11-18 2011-06-08 株式会社トプコン 表面検査装置
US7522263B2 (en) * 2005-12-27 2009-04-21 Asml Netherlands B.V. Lithographic apparatus and method
WO2008035685A1 (fr) * 2006-09-19 2008-03-27 Olympus Medical Systems Corporation Dispositif de mesure de polarisation
JP2008191144A (ja) * 2007-01-11 2008-08-21 Japan Aerospace Exploration Agency 光学式分光偏光計測装置
US8416409B2 (en) 2010-06-04 2013-04-09 Lockheed Martin Corporation Method of ellipsometric reconnaissance
US10018815B1 (en) 2014-06-06 2018-07-10 J.A. Woolam Co., Inc. Beam focusing and reflective optics
US9921395B1 (en) 2015-06-09 2018-03-20 J.A. Woollam Co., Inc. Beam focusing and beam collecting optics with wavelength dependent filter element adjustment of beam area
US9442016B2 (en) 2014-06-06 2016-09-13 J.A. Woollam Co., Inc Reflective focusing optics
US10338362B1 (en) 2014-06-06 2019-07-02 J.A. Woollam Co., Inc. Beam focusing and reflecting optics with enhanced detector system
US11162897B2 (en) 2019-05-15 2021-11-02 Onto Innovation Inc. Optical metrology device using numerical aperture reduction
CN113358579A (zh) * 2021-05-21 2021-09-07 上海精测半导体技术有限公司 一种宽光谱椭偏光学系统

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5166752A (en) * 1990-01-11 1992-11-24 Rudolph Research Corporation Simultaneous multiple angle/multiple wavelength ellipsometer and method
DE69226514T2 (de) 1991-01-11 1999-04-08 Rudolph Res Corp Gleichzeitiges vielfach-winkel/vielfach-wellenlängen ellipsometer und methode
US5764365A (en) 1993-11-09 1998-06-09 Nova Measuring Instruments, Ltd. Two-dimensional beam deflector
IL107549A (en) 1993-11-09 1996-01-31 Nova Measuring Instr Ltd Device for measuring the thickness of thin films
US5608526A (en) * 1995-01-19 1997-03-04 Tencor Instruments Focused beam spectroscopic ellipsometry method and system
US6734967B1 (en) * 1995-01-19 2004-05-11 Kla-Tencor Technologies Corporation Focused beam spectroscopic ellipsometry method and system
US5969818A (en) 1998-03-03 1999-10-19 J. A. Woollam Co. Inc. Beam folding optics system and method of use with application in ellipsometry and polarimetry
US5963327A (en) 1998-03-03 1999-10-05 J.A. Woollam Co. Inc. Total internal reflection electromagnetic radiation beam entry to, and exit from, ellipsometer, polarimeter, reflectometer and the like systems
US5798837A (en) 1997-07-11 1998-08-25 Therma-Wave, Inc. Thin film optical measurement system and method with calibrating ellipsometer
US5991022A (en) * 1997-12-09 1999-11-23 N&K Technology, Inc. Reflectance spectrophotometric apparatus with toroidal mirrors
WO2002079760A2 (en) * 2001-03-30 2002-10-10 Therma-Wave, Inc. Polarimetric scatterometer for critical dimension measurements of periodic structures

Also Published As

Publication number Publication date
EP1253418A2 (de) 2002-10-30
DE60217989T2 (de) 2007-09-06
JP2002323304A (ja) 2002-11-08
US6943880B2 (en) 2005-09-13
US20020159063A1 (en) 2002-10-31
EP1253418A3 (de) 2004-02-04
EP1253418B1 (de) 2007-02-07
JP4399126B2 (ja) 2010-01-13
DE60217989D1 (de) 2007-03-22

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Legal Events

Date Code Title Description
8381 Inventor (new situation)

Inventor name: KANZAKI, TOYOKI, KYOTO, JP

8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee