DE60217587D1 - Substrathalter und ein Belichtungsapparat - Google Patents

Substrathalter und ein Belichtungsapparat

Info

Publication number
DE60217587D1
DE60217587D1 DE60217587T DE60217587T DE60217587D1 DE 60217587 D1 DE60217587 D1 DE 60217587D1 DE 60217587 T DE60217587 T DE 60217587T DE 60217587 T DE60217587 T DE 60217587T DE 60217587 D1 DE60217587 D1 DE 60217587D1
Authority
DE
Germany
Prior art keywords
exposure apparatus
substrate holder
holder
substrate
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60217587T
Other languages
English (en)
Inventor
Toshinobu Tokita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2001225574A external-priority patent/JP2003037157A/ja
Priority claimed from JP2001229889A external-priority patent/JP2003045945A/ja
Application filed by Canon Inc filed Critical Canon Inc
Application granted granted Critical
Publication of DE60217587D1 publication Critical patent/DE60217587D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G03F9/7053—Non-optical, e.g. mechanical, capacitive, using an electron beam, acoustic or thermal waves
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/703—Gap setting, e.g. in proximity printer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
DE60217587T 2001-07-26 2002-07-25 Substrathalter und ein Belichtungsapparat Expired - Lifetime DE60217587D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001225574A JP2003037157A (ja) 2001-07-26 2001-07-26 基板保持装置、露光装置、デバイス製造方法、半導体製造工場および半導体製造装置の保守方法
JP2001229889A JP2003045945A (ja) 2001-07-30 2001-07-30 基板チャック及び露光装置

Publications (1)

Publication Number Publication Date
DE60217587D1 true DE60217587D1 (de) 2007-03-08

Family

ID=26619296

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60217587T Expired - Lifetime DE60217587D1 (de) 2001-07-26 2002-07-25 Substrathalter und ein Belichtungsapparat

Country Status (3)

Country Link
US (1) US6836316B2 (de)
EP (1) EP1280188B1 (de)
DE (1) DE60217587D1 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE60139801D1 (de) * 2000-02-17 2009-10-15 Panasonic Corp Vorrichtung und verfahren zur elektrischen bauteilbestückung
JP2003007601A (ja) * 2001-06-26 2003-01-10 Canon Inc ２つの物体の間隔測定方法とそれを用いた半導体露光方法、および間隔測定装置、半導体露光装置
JP2004022655A (ja) * 2002-06-13 2004-01-22 Canon Inc 半導体露光装置及びその制御方法、並びに半導体デバイスの製造方法
US7212015B2 (en) * 2003-03-13 2007-05-01 Canon Kabushiki Kaisha Capacitance sensor type measuring apparatus
JP2005044893A (ja) * 2003-07-24 2005-02-17 Canon Inc 基板保持装置
JP2006165371A (ja) * 2004-12-09 2006-06-22 Canon Inc 転写装置およびデバイス製造方法
WO2007013619A1 (ja) * 2005-07-28 2007-02-01 Kyocera Corporation 試料保持具とこれを用いた試料吸着装置およびこれを用いた試料処理方法
TWI541615B (zh) 2007-07-13 2016-07-11 瑪波微影Ｉｐ公司 在微影裝置中交換晶圓的方法
US8705010B2 (en) 2007-07-13 2014-04-22 Mapper Lithography Ip B.V. Lithography system, method of clamping and wafer table
DE102009018434B4 (de) * 2009-04-22 2023-11-30 Ev Group Gmbh Aufnahmeeinrichtung zur Aufnahme von Halbleitersubstraten
JP2014513869A (ja) * 2011-04-22 2014-06-05 マッパー・リソグラフィー・アイピー・ビー．ブイ． ウェーハのようなターゲットを処理するためのリソグラフィシステム、及びウェーハのようなターゲットを処理するためのリソグラフィシステムを動作させる方法
US11378531B1 (en) 2021-02-01 2022-07-05 Applied Materials Israel Ltd. Method for focusing an electron beam on a wafer having a transparent substrate

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69133413D1 (de) * 1990-05-07 2004-10-21 Canon Kk Substratträger des Vakuumtyps
JPH0851143A (ja) * 1992-07-20 1996-02-20 Nikon Corp 基板保持装置
US5738165A (en) * 1993-05-07 1998-04-14 Nikon Corporation Substrate holding apparatus
US5822171A (en) * 1994-02-22 1998-10-13 Applied Materials, Inc. Electrostatic chuck with improved erosion resistance
JP3487368B2 (ja) * 1994-09-30 2004-01-19 株式会社ニコン 走査型露光装置
US5563689A (en) * 1995-05-26 1996-10-08 T/R Systems Developer module with electromagnetic shutter
US5923408A (en) * 1996-01-31 1999-07-13 Canon Kabushiki Kaisha Substrate holding system and exposure apparatus using the same
JP3814359B2 (ja) * 1996-03-12 2006-08-30 キヤノン株式会社 Ｘ線投影露光装置及びデバイス製造方法
JP3526162B2 (ja) 1997-02-04 2004-05-10 キヤノン株式会社 基板保持装置および露光装置
JP3377165B2 (ja) 1997-05-19 2003-02-17 キヤノン株式会社 半導体露光装置
TW594426B (en) * 1999-06-11 2004-06-21 Asml Netherlands Bv Lithographic projection apparatus, integrated circuit manufacturing method and integrated circuit made thereby
EP1059566B1 (de) * 1999-06-11 2006-08-23 ASML Netherlands B.V. Lithographischer Projektionsapparat
WO2001011431A2 (en) 1999-08-06 2001-02-15 Applied Materials, Inc. Method and apparatus of holding semiconductor wafers for lithography and other wafer processes
EP1291910B1 (de) * 2000-01-28 2007-01-10 Hitachi Tokyo Electronics Co., Ltd. Wafer-spannfutter, belichtungssystem und verfahren zur herstellung eines halbleiterbauelements
JP2001332609A (ja) * 2000-03-13 2001-11-30 Nikon Corp 基板保持装置及び露光装置

Also Published As

Publication number Publication date
EP1280188B1 (de) 2007-01-17
EP1280188A2 (de) 2003-01-29
US6836316B2 (en) 2004-12-28
EP1280188A3 (de) 2004-02-18
US20030020891A1 (en) 2003-01-30

Similar Documents

Publication Publication Date Title
DE60232568D1 (de) Belichtungsapparat
DE60223630D1 (de) Lithographisches Gerät und zugehöriges Herstellungsverfahren
SG96605A1 (en) Substrate holding apparatus and exposure apparatus including substrate holding apparatus
IL215923A0 (en) Optical element and exposure apparatus
DE60229591D1 (de) Trägerplattenvorrichtung
TWI341551B (en) Stage apparatus and light exposing apparatus
EP1502291A4 (de) Belichtungsvorrichtung und bauelementeherstellungsverfahren damit
DE60141186D1 (de) Substratverarbeitungsvorrichtung
DE60238230D1 (de) Shearographischer Messapparat
DE60227135D1 (de) Bilderzeugungsapparat
DE60216014D1 (de) Bilderzeugungsgerät
DE60221180D1 (de) Lithographischer Apparat
DE60231353D1 (de) Gerät zur Unterstützung von Einkäufen
DE60143794D1 (de) Druckverfahren und -Vorrichtung
DE60228664D1 (de) Bilderzeugungsgerät
DE60308582D1 (de) Fixiervorrichtung und damit versehenes Bilderzeugungsgerät
DK1926093T3 (da) Optagebærer og apparat til scanning af optagebæreren
DE60217587D1 (de) Substrathalter und ein Belichtungsapparat
DE60205438D1 (de) Bildfixiergerät und Bildfixierungsverfahren
DE60234804D1 (de) Von Belichtungsunterschieden unabhängige Bildwiederauffindungsmethode und entsprechendes Gerät
DE60228783D1 (de) Bilderzeugungsgerät
DE60217474D1 (de) Rakelhalter
DE60228669D1 (de) Bilderzeugungsgerät
DE602004020849D1 (de) Optisches Beleuchtungssystem und damit versehener Belichtungsapparat
SG103376A1 (en) Lithographic apparatus, device manufacturing method, and method of manufacturing and optical element

Legal Events

Date Code Title Description
8332 No legal effect for de