DE60217433D1 - Laser- Strahlgerät mit veränderbarem Öffnungswinkel - Google Patents

Laser- Strahlgerät mit veränderbarem Öffnungswinkel

Info

Publication number
DE60217433D1
DE60217433D1 DE60217433T DE60217433T DE60217433D1 DE 60217433 D1 DE60217433 D1 DE 60217433D1 DE 60217433 T DE60217433 T DE 60217433T DE 60217433 T DE60217433 T DE 60217433T DE 60217433 D1 DE60217433 D1 DE 60217433D1
Authority
DE
Germany
Prior art keywords
opening angle
blasting device
variable opening
laser blasting
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60217433T
Other languages
English (en)
Other versions
DE60217433T2 (de
Inventor
Fumio Ohtomo
Jun-Ichi Kodaira
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Topcon Corp
Original Assignee
Topcon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Topcon Corp filed Critical Topcon Corp
Publication of DE60217433D1 publication Critical patent/DE60217433D1/de
Application granted granted Critical
Publication of DE60217433T2 publication Critical patent/DE60217433T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S33/00Geometrical instruments
    • Y10S33/21Geometrical instruments with laser

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Laser Beam Processing (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Mechanical Optical Scanning Systems (AREA)
  • Semiconductor Lasers (AREA)
  • Radiation-Therapy Devices (AREA)
DE60217433T 2001-03-28 2002-03-25 Laser- Strahlgerät mit veränderbarem Öffnungswinkel Expired - Lifetime DE60217433T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001094004 2001-03-28
JP2001094004A JP4614565B2 (ja) 2001-03-28 2001-03-28 レーザ光線照射装置

Publications (2)

Publication Number Publication Date
DE60217433D1 true DE60217433D1 (de) 2007-02-22
DE60217433T2 DE60217433T2 (de) 2007-11-29

Family

ID=18948271

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60217433T Expired - Lifetime DE60217433T2 (de) 2001-03-28 2002-03-25 Laser- Strahlgerät mit veränderbarem Öffnungswinkel

Country Status (4)

Country Link
US (1) US6679609B2 (de)
EP (1) EP1248137B1 (de)
JP (1) JP4614565B2 (de)
DE (1) DE60217433T2 (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3821712B2 (ja) * 2001-12-28 2006-09-13 株式会社トプコン ラインレーザ装置
US6892464B2 (en) * 2002-03-13 2005-05-17 Kabushiki Kaisha Topcon Laser sighting device
US6886287B1 (en) 2002-05-18 2005-05-03 John Curtis Bell Scope adjustment method and apparatus
US8468930B1 (en) 2002-05-18 2013-06-25 John Curtis Bell Scope adjustment method and apparatus
US9310165B2 (en) 2002-05-18 2016-04-12 John Curtis Bell Projectile sighting and launching control system
US7624528B1 (en) 2002-05-18 2009-12-01 John Curtis Bell Scope adjustment method and apparatus
US6856470B2 (en) * 2002-08-26 2005-02-15 Hitachi Koki Co., Ltd. Rod lens and laser marking apparatus
US20040221470A1 (en) * 2003-05-09 2004-11-11 Index Measuring Tape Co., Ltd. Tape rule having laser indicating mechanism
JP4282432B2 (ja) 2003-10-14 2009-06-24 株式会社トプコン 回転レーザ装置の受光装置
US7021114B2 (en) * 2004-04-16 2006-04-04 Boston Scientific Scimed, Inc. Stent crimper
US7664365B2 (en) * 2004-10-27 2010-02-16 Semiconductor Energy Laboratory Co., Ltd. Beam homogenizer, and laser irradiation method, laser irradiation apparatus, and laser annealing method of non-single crystalline semiconductor film using the same
US7497019B2 (en) 2005-08-04 2009-03-03 Irwin Industrial Tool Company Laser reference device
US7328516B2 (en) * 2005-08-05 2008-02-12 Irwin Industrial Tool Company Laser level
DE102007055439A1 (de) * 2007-11-21 2009-05-28 Hilti Aktiengesellschaft Rotationslaser mit Fernsteuerung
CN103791893A (zh) * 2014-02-12 2014-05-14 浙江合波光学科技有限公司 一种多点激光模组及激光打点仪

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3073994B2 (ja) * 1988-08-11 2000-08-07 株式会社モリタ製作所 放射角度可変レーザー照射装置
JP2564963B2 (ja) * 1990-03-29 1996-12-18 三菱電機株式会社 ターゲット及びこれを用いた三次元位置姿勢計測システム
US5140608A (en) * 1991-05-29 1992-08-18 Optrotech Ltd, Israel Company Optical system for focusing a light beam on to an image plane
US5838431A (en) * 1996-01-16 1998-11-17 Asahi Kogaku Kogyo Kabushiki Kaisha Laser marking device
JP3917231B2 (ja) * 1996-02-06 2007-05-23 株式会社半導体エネルギー研究所 レーザー照射装置およびレーザー照射方法
JP3330881B2 (ja) * 1996-02-13 2002-09-30 株式会社半導体エネルギー研究所 レーザー照射装置
JP3731022B2 (ja) * 1997-04-04 2006-01-05 株式会社トプコン 回転レーザー装置
JPH11101642A (ja) * 1997-09-29 1999-04-13 Asahi Optical Co Ltd ビーム像の水平調整方法およびビーム像水平調整装置
JPH11142780A (ja) * 1997-11-12 1999-05-28 Mitsubishi Electric Corp 光源装置及び投写型表示装置
JP4159153B2 (ja) * 1998-12-03 2008-10-01 株式会社トプコン 回転レーザ装置及び受光装置
US6399940B1 (en) * 1999-05-10 2002-06-04 Fanuc America Corporation Optical rotary position encoder
JP2000202673A (ja) * 2000-01-01 2000-07-25 Semiconductor Energy Lab Co Ltd レ―ザ―照射装置
DE60120079T8 (de) * 2000-10-31 2007-06-28 Dainippon Screen Mfg. Co., Ltd. Laserbestrahlungsgerät und Bildaufzeichnungsgerät
JP4712212B2 (ja) * 2001-03-28 2011-06-29 株式会社トプコン レーザ照準装置
JP4870283B2 (ja) * 2001-07-13 2012-02-08 株式会社トプコン レーザ照準装置

Also Published As

Publication number Publication date
EP1248137B1 (de) 2007-01-10
EP1248137A3 (de) 2005-01-05
US20020138996A1 (en) 2002-10-03
DE60217433T2 (de) 2007-11-29
EP1248137A2 (de) 2002-10-09
JP2002287080A (ja) 2002-10-03
US6679609B2 (en) 2004-01-20
JP4614565B2 (ja) 2011-01-19

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Legal Events

Date Code Title Description
8381 Inventor (new situation)

Inventor name: OHTOMO, FUMIO, TOKYO, JP

Inventor name: KODAIRA, JUN-ICHI, TOKYO, JP

8364 No opposition during term of opposition