DE60210553D1 - Flussmittelfreies Löten mit Wasserstoff mittels Zugabe von Elektronen - Google Patents

Flussmittelfreies Löten mit Wasserstoff mittels Zugabe von Elektronen

Info

Publication number
DE60210553D1
DE60210553D1 DE60210553T DE60210553T DE60210553D1 DE 60210553 D1 DE60210553 D1 DE 60210553D1 DE 60210553 T DE60210553 T DE 60210553T DE 60210553 T DE60210553 T DE 60210553T DE 60210553 D1 DE60210553 D1 DE 60210553D1
Authority
DE
Germany
Prior art keywords
providing
target assembly
reducing gas
flux
hydrogen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60210553T
Other languages
English (en)
Other versions
DE60210553T2 (de
Inventor
Chun Christine Dong
Wayne Thomas Mcdermott
Richard E Patrick
Brenda F Ross
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Air Products and Chemicals Inc
Original Assignee
Air Products and Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Products and Chemicals Inc filed Critical Air Products and Chemicals Inc
Application granted granted Critical
Publication of DE60210553D1 publication Critical patent/DE60210553D1/de
Publication of DE60210553T2 publication Critical patent/DE60210553T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/3489—Composition of fluxes; Methods of application thereof; Other methods of activating the contact surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K1/00—Soldering, e.g. brazing, or unsoldering
    • B23K1/20—Preliminary treatment of work or areas to be soldered, e.g. in respect of a galvanic coating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K1/00—Soldering, e.g. brazing, or unsoldering
    • B23K1/20—Preliminary treatment of work or areas to be soldered, e.g. in respect of a galvanic coating
    • B23K1/206—Cleaning
DE60210553T 2001-09-10 2002-09-03 Flussmittelfreies Löten mit Wasserstoff mittels Zugabe von Elektronen Expired - Lifetime DE60210553T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US949580 2001-09-10
US09/949,580 US6776330B2 (en) 2001-09-10 2001-09-10 Hydrogen fluxless soldering by electron attachment

Publications (2)

Publication Number Publication Date
DE60210553D1 true DE60210553D1 (de) 2006-05-24
DE60210553T2 DE60210553T2 (de) 2007-01-11

Family

ID=25489274

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60210553T Expired - Lifetime DE60210553T2 (de) 2001-09-10 2002-09-03 Flussmittelfreies Löten mit Wasserstoff mittels Zugabe von Elektronen

Country Status (8)

Country Link
US (1) US6776330B2 (de)
EP (1) EP1291111B1 (de)
JP (1) JP3828471B2 (de)
KR (1) KR100510910B1 (de)
CN (1) CN1215744C (de)
AT (1) ATE322954T1 (de)
DE (1) DE60210553T2 (de)
TW (1) TW574083B (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI274622B (en) * 2003-04-28 2007-03-01 Air Prod & Chem Apparatus and method for removal of surface oxides via fluxless technique involving electron attachment and remote ion generation
US8361340B2 (en) * 2003-04-28 2013-01-29 Air Products And Chemicals, Inc. Removal of surface oxides by electron attachment
US7079370B2 (en) 2003-04-28 2006-07-18 Air Products And Chemicals, Inc. Apparatus and method for removal of surface oxides via fluxless technique electron attachment and remote ion generation
CA2465195C (en) * 2003-04-28 2012-06-19 Air Products And Chemicals, Inc. Electrode assembly for the removal of surface oxides by electron attachment
US7897029B2 (en) * 2008-03-04 2011-03-01 Air Products And Chemicals, Inc. Removal of surface oxides by electron attachment
US7387738B2 (en) * 2003-04-28 2008-06-17 Air Products And Chemicals, Inc. Removal of surface oxides by electron attachment for wafer bumping applications
KR100572151B1 (ko) * 2004-11-22 2006-04-24 한국전자통신연구원 Ｓｎ-Ｉｎ계 솔더를 이용한 반도체 칩의 본딩 방법
US7434719B2 (en) * 2005-12-09 2008-10-14 Air Products And Chemicals, Inc. Addition of D2 to H2 to detect and calibrate atomic hydrogen formed by dissociative electron attachment
US20070193026A1 (en) * 2006-02-23 2007-08-23 Chun Christine Dong Electron attachment assisted formation of electrical conductors
US20070299239A1 (en) * 2006-06-27 2007-12-27 Air Products And Chemicals, Inc. Curing Dielectric Films Under A Reducing Atmosphere
US8454850B2 (en) * 2009-09-02 2013-06-04 Air Products And Chemicals, Inc. Method for the removal of surface oxides by electron attachment
US20120196051A1 (en) * 2011-01-28 2012-08-02 United Technologies Corporation Deposition Apparatus and Methods
US9006975B2 (en) * 2011-02-09 2015-04-14 Air Products And Chemicals, Inc. Apparatus and method for removal of surface oxides via fluxless technique involving electron attachment
TWI624319B (zh) * 2015-04-01 2018-05-21 Composite tungsten carbide tool manufacturing method
CN106279645A (zh) * 2016-08-29 2017-01-04 佛山市高明区尚润盈科技有限公司 一种光致变色聚乳酸材料的制备方法
KR102045186B1 (ko) * 2016-11-22 2019-11-14 센주긴조쿠고교 가부시키가이샤 납땜 방법

Family Cites Families (30)

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US3742213A (en) 1971-01-28 1973-06-26 Franklin Gno Corp Apparatus and methods for detecting, separating, concentrating and measuring electronegative trace vapors
FR2653633B1 (fr) 1989-10-19 1991-12-20 Commissariat Energie Atomique Dispositif de traitement chimique assiste par un plasma de diffusion.
US5223691A (en) * 1991-06-03 1993-06-29 Motorola, Inc. Plasma based soldering method requiring no additional heat sources or flux
US5345056A (en) * 1991-12-12 1994-09-06 Motorola, Inc. Plasma based soldering by indirect heating
FR2697456B1 (fr) 1992-10-30 1994-12-23 Air Liquide Procédé et dispositif de fluxage par voie sèche.
US5409543A (en) 1992-12-22 1995-04-25 Sandia Corporation Dry soldering with hot filament produced atomic hydrogen
US5304297A (en) * 1993-02-26 1994-04-19 Rockwell International Corporation Reducing agent regeneration system
US5735451A (en) * 1993-04-05 1998-04-07 Seiko Epson Corporation Method and apparatus for bonding using brazing material
US6007637A (en) 1993-06-11 1999-12-28 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Process and apparatus for the dry treatment of metal surfaces
US6021940A (en) 1993-12-15 2000-02-08 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Method and apparatus for reflow soldering metallic surfaces
FR2713528B1 (fr) 1993-12-15 1996-01-12 Air Liquide Procédé et dispositif de fluxage par voie sèche de surfaces métalliques avant brasage ou étamage.
FR2713666B1 (fr) 1993-12-15 1996-01-12 Air Liquide Procédé et dispositif de dépôt à basse température d'un film contenant du silicium sur un substrat métallique.
FR2713667B1 (fr) 1993-12-15 1996-01-12 Air Liquide Procédé et dispositif de dépôt à basse température d'un film contenant du silicium sur un substrat non métallique.
JP3521587B2 (ja) 1995-02-07 2004-04-19 セイコーエプソン株式会社 基板周縁の不要物除去方法及び装置並びにそれを用いた塗布方法
FR2735054B1 (fr) * 1995-06-09 1997-07-25 Air Liquide Procede de fluxage par voie seche de surfaces metalliques avant brasage ou etamage utilisant une atmosphere comportant de la vapeur d'eau
FR2735053B1 (fr) 1995-06-09 1997-07-25 Air Liquide Procede et dispositif de brasage a la vague integrant une operation de fluxage par voie seche
KR100512521B1 (ko) * 1996-04-15 2005-11-21 어낵시스 발처스 악티엔게젤샤프트 세정방법의사용방법,세정방법,결합방법및공작재료쌍
CH692446A5 (de) 1996-04-15 2002-06-28 Esec Sa Verfahren zur Herstellung von Werkstücken und von Teilen hierfür
US5928527A (en) 1996-04-15 1999-07-27 The Boeing Company Surface modification using an atmospheric pressure glow discharge plasma source
JP3617188B2 (ja) * 1996-05-23 2005-02-02 富士電機機器制御株式会社 はんだ付方法
US5941448A (en) 1996-06-07 1999-08-24 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Method for dry fluxing of metallic surfaces, before soldering or tinning, using an atmosphere which includes water vapor
FR2750620B1 (fr) 1996-07-02 1998-09-25 Air Liquide Dispositif d'excitation de gaz
DE19654250A1 (de) 1996-08-26 1998-03-05 Fraunhofer Ges Forschung Verfahren und Vorrichtung zum Herstellen oxidationsempfindlicher Lötverbindunden
DE19643865C2 (de) 1996-10-30 1999-04-08 Schott Glas Plasmaunterstütztes chemisches Abscheidungsverfahren (CVD) mit entfernter Anregung eines Anregungsgases (Remote-Plasma-CVD-Verfahren) zur Beschichtung oder zur Behandlung großflächiger Substrate und Vorrichtung zur Durchführung desselben
US6194036B1 (en) 1997-10-20 2001-02-27 The Regents Of The University Of California Deposition of coatings using an atmospheric pressure plasma jet
JPH11221668A (ja) * 1998-02-05 1999-08-17 Nishimoto Denki Seisakusho:Kk 洗浄を必要としない半田付け方法
US6037241A (en) 1998-02-19 2000-03-14 First Solar, Llc Apparatus and method for depositing a semiconductor material
US6174500B1 (en) 1998-06-02 2001-01-16 Mitsubishi Denki Kabushiki Kaisha Negative ion generating apparatus
US6196446B1 (en) 1999-09-13 2001-03-06 Lucent Technologies Inc. Automated fluxless soldering using inert gas
US6193135B1 (en) 1999-09-13 2001-02-27 Lucent Technologies Inc. System for providing back-lighting of components during fluxless soldering

Also Published As

Publication number Publication date
TW574083B (en) 2004-02-01
DE60210553T2 (de) 2007-01-11
EP1291111B1 (de) 2006-04-12
CN1215744C (zh) 2005-08-17
ATE322954T1 (de) 2006-04-15
JP3828471B2 (ja) 2006-10-04
JP2003126958A (ja) 2003-05-08
KR20030022704A (ko) 2003-03-17
KR100510910B1 (ko) 2005-08-25
US6776330B2 (en) 2004-08-17
US20030047591A1 (en) 2003-03-13
EP1291111A1 (de) 2003-03-12
CN1406106A (zh) 2003-03-26

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Legal Events

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8364 No opposition during term of opposition