DE60205493D1 - Verfahren und vorrichtung zur herstellung von pulver aus verbundmaterial - Google Patents

Verfahren und vorrichtung zur herstellung von pulver aus verbundmaterial

Info

Publication number
DE60205493D1
DE60205493D1 DE60205493T DE60205493T DE60205493D1 DE 60205493 D1 DE60205493 D1 DE 60205493D1 DE 60205493 T DE60205493 T DE 60205493T DE 60205493 T DE60205493 T DE 60205493T DE 60205493 D1 DE60205493 D1 DE 60205493D1
Authority
DE
Germany
Prior art keywords
reactor
treatment gas
producing powder
kernel
composite material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60205493T
Other languages
English (en)
Other versions
DE60205493T2 (de
Inventor
Pavel Koulik
Evguenii Petrov
Mark Ivanov
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Apit Corp SA Sion
Original Assignee
Apit Corp SA Sion
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Apit Corp SA Sion filed Critical Apit Corp SA Sion
Application granted granted Critical
Publication of DE60205493D1 publication Critical patent/DE60205493D1/de
Publication of DE60205493T2 publication Critical patent/DE60205493T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32321—Discharge generated by other radiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2/00—Processes or devices for granulating materials, e.g. fertilisers in general; Rendering particulate materials free flowing in general, e.g. making them hydrophobic
    • B01J2/006—Coating of the granules without description of the process or the device by which the granules are obtained
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32816—Pressure
    • H01J37/32825—Working under atmospheric pressure or higher
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2475—Generating plasma using acoustic pressure discharges

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Acoustics & Sound (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Glanulating (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)
DE60205493T 2001-08-31 2002-09-02 Verfahren und vorrichtung zur herstellung von pulver aus verbundmaterial Expired - Fee Related DE60205493T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP01120974 2001-08-31
EP01120974 2001-08-31
PCT/IB2002/003551 WO2003018185A2 (fr) 2001-08-31 2002-09-02 Procede de fabrication de poudre de grains composites et dispositif pour la mise en oeuvre du procede

Publications (2)

Publication Number Publication Date
DE60205493D1 true DE60205493D1 (de) 2005-09-15
DE60205493T2 DE60205493T2 (de) 2006-06-01

Family

ID=8178494

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60205493T Expired - Fee Related DE60205493T2 (de) 2001-08-31 2002-09-02 Verfahren und vorrichtung zur herstellung von pulver aus verbundmaterial

Country Status (7)

Country Link
US (1) US7172790B2 (de)
EP (1) EP1420876B1 (de)
JP (1) JP2005503250A (de)
AT (1) ATE301496T1 (de)
DE (1) DE60205493T2 (de)
ES (1) ES2247370T3 (de)
WO (1) WO2003018185A2 (de)

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US7288293B2 (en) * 2001-03-27 2007-10-30 Apit Corp. S.A. Process for plasma surface treatment and device for realizing the process
JP5628472B2 (ja) * 2004-04-19 2014-11-19 エスディーシーマテリアルズ， インコーポレイテッド 気相合成による高スループットの材料発見方法
US8574408B2 (en) 2007-05-11 2013-11-05 SDCmaterials, Inc. Fluid recirculation system for use in vapor phase particle production system
US8268405B2 (en) * 2005-08-23 2012-09-18 Uwm Research Foundation, Inc. Controlled decoration of carbon nanotubes with aerosol nanoparticles
US8240190B2 (en) * 2005-08-23 2012-08-14 Uwm Research Foundation, Inc. Ambient-temperature gas sensor
EP2178350B1 (de) * 2007-07-12 2016-04-13 Imagineering, Inc. Steuerung für plasmabildungsbereich und plasmaprozessor
US8575059B1 (en) 2007-10-15 2013-11-05 SDCmaterials, Inc. Method and system for forming plug and play metal compound catalysts
US8470112B1 (en) 2009-12-15 2013-06-25 SDCmaterials, Inc. Workflow for novel composite materials
US8652992B2 (en) 2009-12-15 2014-02-18 SDCmaterials, Inc. Pinning and affixing nano-active material
US9149797B2 (en) 2009-12-15 2015-10-06 SDCmaterials, Inc. Catalyst production method and system
US8545652B1 (en) 2009-12-15 2013-10-01 SDCmaterials, Inc. Impact resistant material
EP2512656A4 (de) * 2009-12-15 2014-05-28 Sdcmaterails Inc Fortschrittliche katalysatoren für feinchemie- und pharmazieanwendungen
US9126191B2 (en) 2009-12-15 2015-09-08 SDCmaterials, Inc. Advanced catalysts for automotive applications
US8803025B2 (en) 2009-12-15 2014-08-12 SDCmaterials, Inc. Non-plugging D.C. plasma gun
US9119309B1 (en) 2009-12-15 2015-08-25 SDCmaterials, Inc. In situ oxide removal, dispersal and drying
US8557727B2 (en) 2009-12-15 2013-10-15 SDCmaterials, Inc. Method of forming a catalyst with inhibited mobility of nano-active material
US8669202B2 (en) 2011-02-23 2014-03-11 SDCmaterials, Inc. Wet chemical and plasma methods of forming stable PtPd catalysts
JP2013008770A (ja) * 2011-06-23 2013-01-10 Iwatani Internatl Corp 成膜装置での堆積物クリーニング方法
MX2014001718A (es) 2011-08-19 2014-03-26 Sdcmaterials Inc Sustratos recubiertos para uso en catalisis y convertidores cataliticos y metodos para recubrir sustratos con composiciones de recubrimiento delgado.
JP5818176B2 (ja) * 2012-01-13 2015-11-18 国立大学法人大阪大学 活性種照射装置、活性種照射方法
US9511352B2 (en) 2012-11-21 2016-12-06 SDCmaterials, Inc. Three-way catalytic converter using nanoparticles
US9156025B2 (en) 2012-11-21 2015-10-13 SDCmaterials, Inc. Three-way catalytic converter using nanoparticles
WO2015013545A1 (en) 2013-07-25 2015-01-29 SDCmaterials, Inc. Washcoats and coated substrates for catalytic converters
JP2016535664A (ja) 2013-10-22 2016-11-17 エスディーシーマテリアルズ， インコーポレイテッド リーンＮＯｘトラップの組成物
MX2016004991A (es) 2013-10-22 2016-08-01 Sdcmaterials Inc Diseño de catalizador para motores de combustion diesel de servicio pesado.
CN106470752A (zh) 2014-03-21 2017-03-01 Sdc材料公司 用于被动nox吸附(pna)系统的组合物
US9533909B2 (en) 2014-03-31 2017-01-03 Corning Incorporated Methods and apparatus for material processing using atmospheric thermal plasma reactor
US9550694B2 (en) * 2014-03-31 2017-01-24 Corning Incorporated Methods and apparatus for material processing using plasma thermal source
JP6514230B2 (ja) * 2014-11-11 2019-05-15 株式会社Ｆｕｊｉ 大気圧プラズマ処理装置、およびプラズマ処理方法
US20160200618A1 (en) 2015-01-08 2016-07-14 Corning Incorporated Method and apparatus for adding thermal energy to a glass melt
EP3363270B1 (de) 2015-10-12 2019-12-25 Trumpf Laser- und Systemtechnik GmbH Verfahren und vorrichtung zur erzeugung von plasma- bzw. laserpulsen mittels hochfrequenz-anregungspulsen, insbesondere ein gasentladungslaser, sowie steuereinheit für einen hochfrequenz-anregungspuls-generator
EP3758866A4 (de) 2018-06-08 2021-09-08 Hewlett-Packard Development Company, L.P. Pulverbettmaterialien

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US3247014A (en) * 1963-05-29 1966-04-19 Battelle Development Corp Method of coating solid particles
US4612432A (en) * 1984-09-14 1986-09-16 Monolithic Memories, Inc. Etching plasma generator diffusor and cap
US4859493A (en) * 1987-03-31 1989-08-22 Lemelson Jerome H Methods of forming synthetic diamond coatings on particles using microwaves
US5364562A (en) * 1990-04-17 1994-11-15 Xingwu Wang Aerosol-plasma deposition of insulating oxide powder
JPH05246786A (ja) * 1991-07-02 1993-09-24 L'air Liquide コア粉体の存在下で化学蒸着法により珪素ベース超微粒子をコア粉に均一に塗布する方法
JP3283889B2 (ja) * 1991-07-24 2002-05-20 株式会社きもと 防錆処理方法
US5569502A (en) * 1992-09-11 1996-10-29 Semiconductor Energy Laboratory Co., Ltd. Film formation apparatus and method for forming a film
JP3545783B2 (ja) * 1993-08-12 2004-07-21 株式会社日清製粉グループ本社 被覆粒子の製造方法
US5408066A (en) * 1993-10-13 1995-04-18 Trapani; Richard D. Powder injection apparatus for a plasma spray gun
US5609921A (en) * 1994-08-26 1997-03-11 Universite De Sherbrooke Suspension plasma spray
US5876683A (en) * 1995-11-02 1999-03-02 Glumac; Nicholas Combustion flame synthesis of nanophase materials
US6365235B2 (en) * 1995-11-13 2002-04-02 Tepla Ag Surface treatment method and device therefor
JP2000506559A (ja) * 1996-02-06 2000-05-30 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー プラズマ活性種による解凝集粒子の処理
US6015597A (en) * 1997-11-26 2000-01-18 3M Innovative Properties Company Method for coating diamond-like networks onto particles
KR100279963B1 (ko) * 1997-12-30 2001-04-02 윤종용 반도체소자제조용가스디퓨져및이를설치한반응로
JP4004675B2 (ja) 1999-01-29 2007-11-07 株式会社日清製粉グループ本社 酸化物被覆金属微粒子の製造方法
US6415736B1 (en) 1999-06-30 2002-07-09 Lam Research Corporation Gas distribution apparatus for semiconductor processing
US6472632B1 (en) * 1999-09-15 2002-10-29 Nanoscale Engineering And Technology Corporation Method and apparatus for direct electrothermal-physical conversion of ceramic into nanopowder

Also Published As

Publication number Publication date
WO2003018185A3 (fr) 2003-09-18
ES2247370T3 (es) 2006-03-01
WO2003018185A2 (fr) 2003-03-06
EP1420876B1 (de) 2005-08-10
DE60205493T2 (de) 2006-06-01
US7172790B2 (en) 2007-02-06
US20040238345A1 (en) 2004-12-02
ATE301496T1 (de) 2005-08-15
JP2005503250A (ja) 2005-02-03
EP1420876A2 (de) 2004-05-26

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee