DE602007006397D1 - ung in einem Plasmareaktor - Google Patents
ung in einem PlasmareaktorInfo
- Publication number
- DE602007006397D1 DE602007006397D1 DE602007006397T DE602007006397T DE602007006397D1 DE 602007006397 D1 DE602007006397 D1 DE 602007006397D1 DE 602007006397 T DE602007006397 T DE 602007006397T DE 602007006397 T DE602007006397 T DE 602007006397T DE 602007006397 D1 DE602007006397 D1 DE 602007006397D1
- Authority
- DE
- Germany
- Prior art keywords
- plasma reactor
- reactor
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/6875—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a plurality of individual support members, e.g. support posts or protrusions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67069—Apparatus for fluid treatment for etching for drying etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68778—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by supporting substrates others than wafers, e.g. chips
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Drying Of Semiconductors (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/566,113 US20080131622A1 (en) | 2006-12-01 | 2006-12-01 | Plasma reactor substrate mounting surface texturing |
Publications (1)
Publication Number | Publication Date |
---|---|
DE602007006397D1 true DE602007006397D1 (de) | 2010-06-24 |
Family
ID=39232835
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE602007006397T Active DE602007006397D1 (de) | 2006-12-01 | 2007-10-26 | ung in einem Plasmareaktor |
Country Status (7)
Country | Link |
---|---|
US (2) | US20080131622A1 (de) |
EP (1) | EP1928017B1 (de) |
JP (1) | JP5578762B2 (de) |
KR (1) | KR100939588B1 (de) |
CN (1) | CN101191203B (de) |
DE (1) | DE602007006397D1 (de) |
TW (1) | TWI354349B (de) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20080131622A1 (en) * | 2006-12-01 | 2008-06-05 | White John M | Plasma reactor substrate mounting surface texturing |
US20080289686A1 (en) * | 2007-05-23 | 2008-11-27 | Tae Kyung Won | Method and apparatus for depositing a silicon layer on a transmitting conductive oxide layer suitable for use in solar cell applications |
US7964430B2 (en) * | 2007-05-23 | 2011-06-21 | Applied Materials, Inc. | Silicon layer on a laser transparent conductive oxide layer suitable for use in solar cell applications |
CN101978473B (zh) * | 2008-03-20 | 2015-11-25 | 应用材料公司 | 具有滚轧成型表面的基座和制造所述基座的方法 |
US20100059182A1 (en) * | 2008-09-05 | 2010-03-11 | Jusung Engineering Co., Ltd. | Substrate processing apparatus |
US20100180426A1 (en) * | 2009-01-21 | 2010-07-22 | Applied Materials, Inc. | Particle reduction treatment for gas delivery system |
US20120154974A1 (en) * | 2010-12-16 | 2012-06-21 | Applied Materials, Inc. | High efficiency electrostatic chuck assembly for semiconductor wafer processing |
CN103908934A (zh) * | 2013-11-28 | 2014-07-09 | 大连隆星新材料有限公司 | 聚乙烯蜡微粉制备装置 |
WO2019203978A1 (en) * | 2018-04-17 | 2019-10-24 | Applied Materials, Inc. | Texturizing a surface without bead blasting |
CN110349828B (zh) * | 2019-06-20 | 2021-12-03 | Tcl华星光电技术有限公司 | 干蚀刻设备 |
Family Cites Families (40)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4801785A (en) * | 1986-01-14 | 1989-01-31 | Raychem Corporation | Electrical devices |
US5200157A (en) * | 1986-02-17 | 1993-04-06 | Toshiba Ceramics Co., Ltd. | Susceptor for vapor-growth deposition |
US5096536A (en) * | 1990-06-12 | 1992-03-17 | Micron Technology, Inc. | Method and apparatus useful in the plasma etching of semiconductor materials |
US4974369A (en) * | 1990-06-28 | 1990-12-04 | William Dixon | Two-dimensionally grooved sanding pad |
US5104514A (en) * | 1991-05-16 | 1992-04-14 | The United States Of America As Represented By The Secretary Of The Navy | Protective coating system for aluminum |
US5384682A (en) * | 1993-03-22 | 1995-01-24 | Toto Ltd. | Electrostatic chuck |
US5581874A (en) * | 1994-03-28 | 1996-12-10 | Tokyo Electron Limited | Method of forming a bonding portion |
US5531835A (en) * | 1994-05-18 | 1996-07-02 | Applied Materials, Inc. | Patterned susceptor to reduce electrostatic force in a CVD chamber |
US5548470A (en) * | 1994-07-19 | 1996-08-20 | International Business Machines Corporation | Characterization, modeling, and design of an electrostatic chuck with improved wafer temperature uniformity |
US5583736A (en) * | 1994-11-17 | 1996-12-10 | The United States Of America As Represented By The Department Of Energy | Micromachined silicon electrostatic chuck |
US5844205A (en) * | 1996-04-19 | 1998-12-01 | Applied Komatsu Technology, Inc. | Heated substrate support structure |
US6055927A (en) * | 1997-01-14 | 2000-05-02 | Applied Komatsu Technology, Inc. | Apparatus and method for white powder reduction in silicon nitride deposition using remote plasma source cleaning technology |
CH692520A5 (de) * | 1997-04-24 | 2002-07-15 | Mettler Toledo Gmbh | Verfahren zur Herstellung einer umlaufenden mediumsdichten Verbindung zwischen koaxialen Glasrohren unter Einschluss einer elektrischen Leiterbahn und elektrochemischer Sensor damit. |
JP3160229B2 (ja) * | 1997-06-06 | 2001-04-25 | 日本エー・エス・エム株式会社 | プラズマcvd装置用サセプタ及びその製造方法 |
US6024044A (en) * | 1997-10-09 | 2000-02-15 | Applied Komatsu Technology, Inc. | Dual frequency excitation of plasma for film deposition |
JP3283459B2 (ja) * | 1997-12-17 | 2002-05-20 | 日本エー・エス・エム株式会社 | 半導体処理用の基板保持装置 |
US6064031A (en) * | 1998-03-20 | 2000-05-16 | Mcdonnell Douglas Corporation | Selective metal matrix composite reinforcement by laser deposition |
FR2783970B1 (fr) * | 1998-09-25 | 2000-11-03 | Commissariat Energie Atomique | Dispositif autorisant le traitement d'un substrat dans une machine prevue pour traiter de plus grands substrats et systeme de montage d'un substrat dans ce dispositif |
JP2001209981A (ja) * | 1999-02-09 | 2001-08-03 | Ricoh Co Ltd | 光ディスク基板成膜装置、光ディスク基板成膜方法、基板ホルダーの製造方法、基板ホルダー、光ディスクおよび相変化記録型光ディスク |
JP3911902B2 (ja) * | 1999-04-16 | 2007-05-09 | 東京エレクトロン株式会社 | 処理装置及び金属部品の表面処理方法 |
JP3293801B2 (ja) * | 1999-06-22 | 2002-06-17 | 九州日本電気株式会社 | 枚葉式プラズマアッシング装置 |
US6423175B1 (en) * | 1999-10-06 | 2002-07-23 | Taiwan Semiconductor Manufacturing Co., Ltd | Apparatus and method for reducing particle contamination in an etcher |
US6196001B1 (en) * | 1999-10-12 | 2001-03-06 | Alliedsignal Inc. | Environment controlled WIP cart |
TW473792B (en) * | 2000-01-20 | 2002-01-21 | Ngk Insulators Ltd | Electrostatic chuck |
ATE280436T1 (de) * | 2000-06-22 | 2004-11-15 | Unaxis Balzers Ag | Beschichtungsanlage für scheibenförmige werkstücke |
US7094670B2 (en) * | 2000-08-11 | 2006-08-22 | Applied Materials, Inc. | Plasma immersion ion implantation process |
SG106588A1 (en) * | 2000-10-10 | 2004-10-29 | Inst Data Storage | Method for producing thin film magnetic devices having increased orientation ratio |
JP2002134487A (ja) * | 2000-10-25 | 2002-05-10 | Hitachi Ltd | 半導体装置の製造方法 |
JP3758979B2 (ja) * | 2001-02-27 | 2006-03-22 | 京セラ株式会社 | 静電チャック及び処理装置 |
JP2002334921A (ja) * | 2001-05-10 | 2002-11-22 | Matsushita Electric Ind Co Ltd | プラズマ処理装置 |
US6510888B1 (en) * | 2001-08-01 | 2003-01-28 | Applied Materials, Inc. | Substrate support and method of fabricating the same |
JP4040423B2 (ja) * | 2002-10-16 | 2008-01-30 | キヤノン株式会社 | 基板保持装置 |
KR20040036984A (ko) * | 2002-10-25 | 2004-05-04 | 엘지.필립스 엘시디 주식회사 | 플라즈마 에칭챔버의 아크발생 방지구조 |
US8372205B2 (en) * | 2003-05-09 | 2013-02-12 | Applied Materials, Inc. | Reducing electrostatic charge by roughening the susceptor |
US20040221959A1 (en) * | 2003-05-09 | 2004-11-11 | Applied Materials, Inc. | Anodized substrate support |
JP2005018992A (ja) | 2003-06-23 | 2005-01-20 | Ibiden Co Ltd | プラズマ発生装置用電極埋設部材 |
US7375946B2 (en) * | 2004-08-16 | 2008-05-20 | Applied Materials, Inc. | Method and apparatus for dechucking a substrate |
US7429410B2 (en) * | 2004-09-20 | 2008-09-30 | Applied Materials, Inc. | Diffuser gravity support |
US8173228B2 (en) * | 2006-01-27 | 2012-05-08 | Applied Materials, Inc. | Particle reduction on surfaces of chemical vapor deposition processing apparatus |
US20080131622A1 (en) * | 2006-12-01 | 2008-06-05 | White John M | Plasma reactor substrate mounting surface texturing |
-
2006
- 2006-12-01 US US11/566,113 patent/US20080131622A1/en not_active Abandoned
-
2007
- 2007-10-24 JP JP2007276150A patent/JP5578762B2/ja not_active Expired - Fee Related
- 2007-10-25 TW TW096140130A patent/TWI354349B/zh not_active IP Right Cessation
- 2007-10-25 KR KR1020070107664A patent/KR100939588B1/ko active IP Right Grant
- 2007-10-26 DE DE602007006397T patent/DE602007006397D1/de active Active
- 2007-10-26 CN CN2007101653541A patent/CN101191203B/zh not_active Expired - Fee Related
- 2007-10-26 EP EP07021043A patent/EP1928017B1/de not_active Not-in-force
-
2009
- 2009-11-30 US US12/628,016 patent/US20100144160A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
EP1928017B1 (de) | 2010-05-12 |
TWI354349B (en) | 2011-12-11 |
KR20080050304A (ko) | 2008-06-05 |
US20080131622A1 (en) | 2008-06-05 |
CN101191203B (zh) | 2010-12-01 |
JP2008138283A (ja) | 2008-06-19 |
US20100144160A1 (en) | 2010-06-10 |
CN101191203A (zh) | 2008-06-04 |
TW200828493A (en) | 2008-07-01 |
KR100939588B1 (ko) | 2010-02-01 |
JP5578762B2 (ja) | 2014-08-27 |
EP1928017A1 (de) | 2008-06-04 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |