DE602006004729D1 - Verfahren zum regeln des zuerst schmelzenden bereihtungen - Google Patents

Verfahren zum regeln des zuerst schmelzenden bereihtungen

Info

Publication number
DE602006004729D1
DE602006004729D1 DE602006004729T DE602006004729T DE602006004729D1 DE 602006004729 D1 DE602006004729 D1 DE 602006004729D1 DE 602006004729 T DE602006004729 T DE 602006004729T DE 602006004729 T DE602006004729 T DE 602006004729T DE 602006004729 D1 DE602006004729 D1 DE 602006004729D1
Authority
DE
Germany
Prior art keywords
phase
change material
services
regulating
melting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602006004729T
Other languages
English (en)
Inventor
Ludovic Goux
Dirk Wouters
Judith Lisoni
Thomas Gille
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Interuniversitair Microelektronica Centrum vzw IMEC
NXP BV
Original Assignee
Interuniversitair Microelektronica Centrum vzw IMEC
Koninklijke Philips Electronics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Interuniversitair Microelektronica Centrum vzw IMEC, Koninklijke Philips Electronics NV filed Critical Interuniversitair Microelektronica Centrum vzw IMEC
Publication of DE602006004729D1 publication Critical patent/DE602006004729D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00—Solid-state devices without a potential-jump barrier or surface barrier, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/801—Constructional details of multistable switching devices
    • H10N70/881—Switching materials
    • H10N70/882—Compounds of sulfur, selenium or tellurium, e.g. chalcogenides
    • H10N70/8828—Tellurides, e.g. GeSbTe
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00—Solid-state devices without a potential-jump barrier or surface barrier, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/011—Manufacture or treatment of multistable switching devices
    • H10N70/061—Patterning of the switching material
    • H10N70/063—Patterning of the switching material by etching of pre-deposited switching material layers, e.g. lithography
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00—Solid-state devices without a potential-jump barrier or surface barrier, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/20—Multistable switching devices, e.g. memristors
    • H10N70/231—Multistable switching devices, e.g. memristors based on solid-state phase change, e.g. between amorphous and crystalline phases, Ovshinsky effect
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00—Solid-state devices without a potential-jump barrier or surface barrier, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/801—Constructional details of multistable switching devices
    • H10N70/821—Device geometry
    • H10N70/823—Device geometry adapted for essentially horizontal current flow, e.g. bridge type devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00—Solid-state devices without a potential-jump barrier or surface barrier, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/801—Constructional details of multistable switching devices
    • H10N70/881—Switching materials
    • H10N70/884—Other compounds of groups 13-15, e.g. elemental or compound semiconductors
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
    • G11C13/0004—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements comprising amorphous/crystalline phase transition cells
DE602006004729T 2005-05-19 2006-05-18 Verfahren zum regeln des zuerst schmelzenden bereihtungen Active DE602006004729D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US68345905P 2005-05-19 2005-05-19
PCT/IB2006/051575 WO2006123305A1 (en) 2005-05-19 2006-05-18 Method for controlling the 'first-to-melt' region in a pcm cell and devices obtained thereof

Publications (1)

Publication Number Publication Date
DE602006004729D1 true DE602006004729D1 (de) 2009-02-26

Family

ID=36942608

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602006004729T Active DE602006004729D1 (de) 2005-05-19 2006-05-18 Verfahren zum regeln des zuerst schmelzenden bereihtungen

Country Status (7)

Country Link
US (1) US8008644B2 (de)
EP (1) EP1886317B8 (de)
JP (1) JP4862113B2 (de)
CN (1) CN101213612B (de)
AT (1) ATE420440T1 (de)
DE (1) DE602006004729D1 (de)
WO (1) WO2006123305A1 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101166834B1 (ko) 2007-06-20 2012-07-19 타이완 세미콘덕터 매뉴팩쳐링 컴퍼니 리미티드 전자 부품 및 그 제조 방법
JP5846906B2 (ja) 2008-04-01 2016-01-20 エヌエックスピー ビー ヴィＮｘｐ Ｂ．Ｖ． バーチカル型相変化メモリセル
JP5451740B2 (ja) 2008-04-01 2014-03-26 エヌエックスピー ビー ヴィ 多重ビット相変化メモリセル
US8735862B2 (en) * 2011-04-11 2014-05-27 Micron Technology, Inc. Memory cells, methods of forming memory cells and methods of forming memory arrays
US8932900B2 (en) 2011-08-24 2015-01-13 Taiwan Semiconductor Manufacturing Company, Ltd. Phase change memory and method of fabricating same
CN103346258B (zh) * 2013-07-19 2015-08-26 中国科学院上海微系统与信息技术研究所 相变存储单元及其制备方法
US10103325B2 (en) * 2016-12-15 2018-10-16 Winbond Electronics Corp. Resistance change memory device and fabrication method thereof

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6809401B2 (en) * 2000-10-27 2004-10-26 Matsushita Electric Industrial Co., Ltd. Memory, writing apparatus, reading apparatus, writing method, and reading method
US6566700B2 (en) * 2001-10-11 2003-05-20 Ovonyx, Inc. Carbon-containing interfacial layer for phase-change memory
DE60137788D1 (de) * 2001-12-27 2009-04-09 St Microelectronics Srl Architektur einer nichtflüchtigen Phasenwechsel -Speichermatrix
US7151273B2 (en) * 2002-02-20 2006-12-19 Micron Technology, Inc. Silver-selenide/chalcogenide glass stack for resistance variable memory
KR100543445B1 (ko) * 2003-03-04 2006-01-23 삼성전자주식회사 상변화 기억 소자 및 그 형성방법
KR100532462B1 (ko) * 2003-08-22 2005-12-01 삼성전자주식회사 상 변화 메모리 장치의 기입 전류 량을 제어하는프로그래밍 방법 및 프로그래밍 방법을 구현하는 기입드라이버 회로
KR100569550B1 (ko) * 2003-12-13 2006-04-10 주식회사 하이닉스반도체 상 변화 저항 셀 및 이를 이용한 불휘발성 메모리 장치
US7897952B2 (en) * 2005-05-19 2011-03-01 Nxp B.V. Phase-change memory cell with a patterned layer

Also Published As

Publication number Publication date
EP1886317A1 (de) 2008-02-13
CN101213612B (zh) 2010-09-29
WO2006123305A1 (en) 2006-11-23
CN101213612A (zh) 2008-07-02
ATE420440T1 (de) 2009-01-15
EP1886317B8 (de) 2009-04-08
US8008644B2 (en) 2011-08-30
JP2008541474A (ja) 2008-11-20
EP1886317B1 (de) 2009-01-07
JP4862113B2 (ja) 2012-01-25
US20080265237A1 (en) 2008-10-30

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Legal Events

Date Code Title Description
8327 Change in the person/name/address of the patent owner

Owner name: NXP B.V., EINDHOVEN, NL

Owner name: INTERUNIVERSITAIR MICROELEKTRONICA CENTRUM VZW, BE

8364 No opposition during term of opposition