DE602005019802D1 - Elektrodenkassette und System zum Messen der inneren Spannung von galvanischen Beschichtungen - Google Patents

Elektrodenkassette und System zum Messen der inneren Spannung von galvanischen Beschichtungen

Info

Publication number
DE602005019802D1
DE602005019802D1 DE602005019802T DE602005019802T DE602005019802D1 DE 602005019802 D1 DE602005019802 D1 DE 602005019802D1 DE 602005019802 T DE602005019802 T DE 602005019802T DE 602005019802 T DE602005019802 T DE 602005019802T DE 602005019802 D1 DE602005019802 D1 DE 602005019802D1
Authority
DE
Germany
Prior art keywords
measuring
internal stress
galvanic coatings
electrode cassette
cassette
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602005019802T
Other languages
English (en)
Inventor
Wataru Yamamoto
Katsunori Akiyama
Fumio Harada
Yutaka Tsuru
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Yamamoto MS Co Ltd
Original Assignee
Yamamoto MS Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yamamoto MS Co Ltd filed Critical Yamamoto MS Co Ltd
Publication of DE602005019802D1 publication Critical patent/DE602005019802D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L1/00—Measuring force or stress, in general
    • G01L1/20—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress
    • G01L1/22—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Automation & Control Theory (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Measurement Of Force In General (AREA)
  • Force Measurement Appropriate To Specific Purposes (AREA)
  • Testing Resistance To Weather, Investigating Materials By Mechanical Methods (AREA)
DE602005019802T 2004-02-03 2005-01-28 Elektrodenkassette und System zum Messen der inneren Spannung von galvanischen Beschichtungen Active DE602005019802D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004027300A JP4074592B2 (ja) 2004-02-03 2004-02-03 電極カートリッジ及びめっき内部応力測定システム

Publications (1)

Publication Number Publication Date
DE602005019802D1 true DE602005019802D1 (de) 2010-04-22

Family

ID=34675485

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602005019802T Active DE602005019802D1 (de) 2004-02-03 2005-01-28 Elektrodenkassette und System zum Messen der inneren Spannung von galvanischen Beschichtungen

Country Status (8)

Country Link
US (1) US7682493B2 (de)
EP (1) EP1561844B1 (de)
JP (1) JP4074592B2 (de)
KR (1) KR101148216B1 (de)
CN (1) CN1308664C (de)
DE (1) DE602005019802D1 (de)
HK (1) HK1076860A1 (de)
TW (1) TWI287631B (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101714535B1 (ko) * 2008-12-22 2017-03-09 삼성전자주식회사 탈이온화 장치 및 그 제어방법
TWI426255B (zh) * 2009-10-29 2014-02-11 Univ Nat Pingtung Sci & Tech 厚膜拉力測試裝置
WO2015198185A1 (en) * 2014-06-23 2015-12-30 Ecole Polytechnique Federale De Lausanne (Epfl) Electrochemical coating stress sensor, apparatus and method for accurately monitoring and controlling electrochemical reactions and material coating
JP6472631B2 (ja) * 2014-10-02 2019-02-20 日置電機株式会社 電気化学センサおよび電気化学測定装置
US9945045B2 (en) * 2015-12-02 2018-04-17 Ashwin-Ushas Corporation, Inc. Electrochemical deposition apparatus and methods of using the same
DE112018007274B4 (de) * 2018-03-13 2021-12-02 Yamamoto-Ms Co., Ltd. Beschichtungsvorrichtung und Beschichtungssystem
TWI769559B (zh) * 2020-10-16 2022-07-01 遠東科技大學 評估鍍膜層耐蝕性方法
CN112857624B (zh) * 2021-01-04 2021-12-24 北京科技大学 一种镀层内应力的测量装置及操作方法
CN114910114B (zh) * 2021-02-07 2023-12-12 哈尔滨工业大学 一种电铸过程中镀层内应力和镀液pH在线原位监测装置

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB112315A (en) * 1917-01-04 1918-01-04 John Francis O'rourke Improved Process of Making Tunnels.
US2675348A (en) * 1950-09-16 1954-04-13 Greenspan Lawrence Apparatus for metal plating
US4086154A (en) * 1976-07-26 1978-04-25 The Boeing Company Apparatus for determining stress in an electrodeposit
US4648944A (en) * 1985-07-18 1987-03-10 Martin Marietta Corporation Apparatus and method for controlling plating induced stress in electroforming and electroplating processes
US4786376A (en) * 1988-01-05 1988-11-22 The United States Of America As Represented By The Secretary Of The Air Force Electrodeposition without internal deposit stress
US4986130A (en) * 1989-10-19 1991-01-22 Engelhaupt Darell E Apparatus and method for monitoring stress as a coating is applied
US5149419A (en) * 1991-07-18 1992-09-22 Eastman Kodak Company Method for fabricating long array orifice plates
US5227046A (en) * 1991-10-07 1993-07-13 Unisys Corporation Low temperature tin-bismuth electroplating system
JPH09291395A (ja) * 1996-04-26 1997-11-11 Toyota Motor Corp めっき残留応力の制御方法
JP2000002598A (ja) * 1998-06-15 2000-01-07 Yamamoto Mekki Shikenki:Kk 高速電気めっきの内部応力試験装置
US7070686B2 (en) * 2000-03-27 2006-07-04 Novellus Systems, Inc. Dynamically variable field shaping element
DE19936036C2 (de) * 1999-07-30 2003-05-08 Claho Engineering Gmbh Verfahren und Vorrichtung zur Herstellung eines dreidimensionalen metallischen Bauteils
JP3730836B2 (ja) * 2000-05-24 2006-01-05 株式会社山本鍍金試験器 電気めっき試験器の陰極カートリッジ
JP3328812B2 (ja) * 2000-10-06 2002-09-30 株式会社山本鍍金試験器 電気めっき試験器の陰極カートリッジおよび陽極カートリッジ
JP2008002598A (ja) * 2006-06-23 2008-01-10 Toshiba Home Technology Corp 断熱材及びその製造方法

Also Published As

Publication number Publication date
EP1561844B1 (de) 2010-03-10
KR101148216B1 (ko) 2012-05-25
CN1651884A (zh) 2005-08-10
EP1561844A3 (de) 2008-03-26
KR20060041635A (ko) 2006-05-12
US20050189220A1 (en) 2005-09-01
TWI287631B (en) 2007-10-01
HK1076860A1 (en) 2006-01-27
CN1308664C (zh) 2007-04-04
JP4074592B2 (ja) 2008-04-09
US7682493B2 (en) 2010-03-23
EP1561844A2 (de) 2005-08-10
TW200535405A (en) 2005-11-01
JP2005221269A (ja) 2005-08-18

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