DE602005009838D1 - Lithographische druckplatten mit hoher auflagenstabilität - Google Patents

Lithographische druckplatten mit hoher auflagenstabilität

Info

Publication number
DE602005009838D1
DE602005009838D1 DE602005009838T DE602005009838T DE602005009838D1 DE 602005009838 D1 DE602005009838 D1 DE 602005009838D1 DE 602005009838 T DE602005009838 T DE 602005009838T DE 602005009838 T DE602005009838 T DE 602005009838T DE 602005009838 D1 DE602005009838 D1 DE 602005009838D1
Authority
DE
Germany
Prior art keywords
stability
lithographic printing
printing plates
high stainless
stainless
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602005009838T
Other languages
English (en)
Inventor
Hans-Joachim Timpe
Ursula Mueller
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kodak Graphic Communications GmbH
Original Assignee
Kodak Graphic Communications GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kodak Graphic Communications GmbH filed Critical Kodak Graphic Communications GmbH
Publication of DE602005009838D1 publication Critical patent/DE602005009838D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Materials For Photolithography (AREA)
  • Paints Or Removers (AREA)
  • Laminated Bodies (AREA)
DE602005009838T 2004-07-16 2005-07-14 Lithographische druckplatten mit hoher auflagenstabilität Active DE602005009838D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102004034362A DE102004034362A1 (de) 2004-07-16 2004-07-16 Lithographie-Druckplatten mit hoher Auflagenbeständigkeit
PCT/EP2005/007686 WO2006008073A2 (en) 2004-07-16 2005-07-14 Lithographic printing plates with high print run stability

Publications (1)

Publication Number Publication Date
DE602005009838D1 true DE602005009838D1 (de) 2008-10-30

Family

ID=35612870

Family Applications (2)

Application Number Title Priority Date Filing Date
DE102004034362A Withdrawn DE102004034362A1 (de) 2004-07-16 2004-07-16 Lithographie-Druckplatten mit hoher Auflagenbeständigkeit
DE602005009838T Active DE602005009838D1 (de) 2004-07-16 2005-07-14 Lithographische druckplatten mit hoher auflagenstabilität

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE102004034362A Withdrawn DE102004034362A1 (de) 2004-07-16 2004-07-16 Lithographie-Druckplatten mit hoher Auflagenbeständigkeit

Country Status (6)

Country Link
US (1) US20070184381A1 (de)
EP (1) EP1774404B1 (de)
JP (1) JP2008506978A (de)
CN (1) CN101142531B (de)
DE (2) DE102004034362A1 (de)
WO (1) WO2006008073A2 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008129981A1 (ja) * 2007-04-18 2008-10-30 Konica Minolta Medical & Graphic, Inc. 感光性平版印刷版材料
JP5581614B2 (ja) * 2008-07-31 2014-09-03 Ｊｓｒ株式会社 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示素子
JP5430899B2 (ja) * 2008-09-12 2014-03-05 旭化成イーマテリアルズ株式会社 レーザー彫刻印刷原版及びレーザー彫刻印刷版
JP2010286796A (ja) * 2009-06-15 2010-12-24 Asahi Kasei E-Materials Corp 感光性樹脂組成物
JP5515714B2 (ja) * 2009-12-16 2014-06-11 Ｊｓｒ株式会社 着色組成物、カラーフィルタおよびカラー液晶表示素子
JP6019596B2 (ja) * 2011-03-08 2016-11-02 住友化学株式会社 着色感光性樹脂組成物
JP2015017176A (ja) * 2013-07-10 2015-01-29 富士フイルム株式会社 フィルムとその製造方法、光学フィルム、偏光板保護フィルム、偏光板および画像表示装置
JP6869095B2 (ja) * 2017-04-28 2021-05-12 富士フイルム株式会社 転写材料、転写材料の製造方法、パターンの形成方法、及び金属パターンの形成方法
KR101996262B1 (ko) * 2017-09-01 2019-10-01 (주)휴넷플러스 차단성 수지 조성물, 광경화 차단막의 제조방법 및 전자소자

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2718735C2 (de) * 1977-04-27 1986-06-05 Patent-Treuhand-Gesellschaft für elektrische Glühlampen mbH, 8000 München Quecksilberdampfhochdruckentladung
DE3760773D1 (en) * 1986-07-25 1989-11-16 Oki Electric Ind Co Ltd Negative resist material, method for its manufacture and method for using it
JPS63279245A (ja) * 1987-05-12 1988-11-16 Fujitsu Ltd ネガ型レジスト組成物
JP2675162B2 (ja) * 1989-02-23 1997-11-12 沖電気工業株式会社 感光性樹脂組成物およびこれを用いたパターン形成方法
JPH03263047A (ja) * 1990-03-14 1991-11-22 Oki Electric Ind Co Ltd 感光性樹脂
JPH04147261A (ja) * 1990-10-11 1992-05-20 Konica Corp 湿し水不要感光性平版印刷版
JP2848690B2 (ja) * 1990-11-09 1999-01-20 昭和電工株式会社 セメント質硬化体のコーティング方法
JP2739387B2 (ja) * 1991-04-25 1998-04-15 富士写真フイルム株式会社 水無し平版印刷版及びその製版方法
CA2078361A1 (en) * 1991-09-17 1993-03-18 Seiji Arimatsu Method for directly making printing plates using ink-jet system
JP4381636B2 (ja) * 2001-11-05 2009-12-09 新日鐵化学株式会社 シリコーン樹脂組成物及びシリコーン樹脂成形体
EP1336630A3 (de) * 2002-02-15 2003-12-10 Shipley Co. L.L.C. Funktionalisiertes Polymer
US7063017B2 (en) * 2002-12-19 2006-06-20 Panasonic Communications Co., Ltd. Printing plate and plate making method
US7297460B2 (en) * 2003-02-26 2007-11-20 Agfa-Gevaert Radiation curable ink compositions suitable for ink-jet printing
WO2004085501A1 (ja) * 2003-03-27 2004-10-07 Nippon Steel Chemical Co., Ltd. シリコーン樹脂組成物及びその成形体

Also Published As

Publication number Publication date
WO2006008073A3 (en) 2007-03-15
DE102004034362A1 (de) 2006-02-09
WO2006008073A2 (en) 2006-01-26
EP1774404A2 (de) 2007-04-18
JP2008506978A (ja) 2008-03-06
CN101142531A (zh) 2008-03-12
CN101142531B (zh) 2011-04-13
US20070184381A1 (en) 2007-08-09
EP1774404B1 (de) 2008-09-17

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition