DE602004029838D1 - Dünnschicht-Resonator von Luftspaltbauart, Duplexer mit dem Resonator und deren Herstellungsverfahren - Google Patents

Dünnschicht-Resonator von Luftspaltbauart, Duplexer mit dem Resonator und deren Herstellungsverfahren

Info

Publication number
DE602004029838D1
DE602004029838D1 DE602004029838T DE602004029838T DE602004029838D1 DE 602004029838 D1 DE602004029838 D1 DE 602004029838D1 DE 602004029838 T DE602004029838 T DE 602004029838T DE 602004029838 T DE602004029838 T DE 602004029838T DE 602004029838 D1 DE602004029838 D1 DE 602004029838D1
Authority
DE
Germany
Prior art keywords
resonator
duplexer
air
manufacturing process
type thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE602004029838T
Other languages
English (en)
Inventor
Yun-Kwon Park
In-Sang Song
Byeoung-Ju Ha
Ii-Jong Song
Duck-Hwan Kim
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samsung Electronics Co Ltd
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Publication of DE602004029838D1 publication Critical patent/DE602004029838D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
    • H03H9/205—Constructional features of resonators consisting of piezoelectric or electrostrictive material having multiple resonators
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/02007—Details of bulk acoustic wave devices
    • H03H9/02086—Means for compensation or elimination of undesirable effects
    • H03H9/02094—Means for compensation or elimination of undesirable effects of adherence
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
    • H03H9/17—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
    • H03H9/171—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator implemented with thin-film techniques, i.e. of the film bulk acoustic resonator [FBAR] type
    • H03H9/172—Means for mounting on a substrate, i.e. means constituting the material interface confining the waves to a volume
    • H03H9/173—Air-gaps
DE602004029838T 2003-04-18 2004-04-14 Dünnschicht-Resonator von Luftspaltbauart, Duplexer mit dem Resonator und deren Herstellungsverfahren Expired - Lifetime DE602004029838D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR20030024720 2003-04-18
KR10-2003-0049918A KR100498041B1 (ko) 2003-04-18 2003-07-21 기판 접합을 이용하여 제조된 단일칩 듀플렉서 및 그 제조방법

Publications (1)

Publication Number Publication Date
DE602004029838D1 true DE602004029838D1 (de) 2010-12-16

Family

ID=37371841

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602004029838T Expired - Lifetime DE602004029838D1 (de) 2003-04-18 2004-04-14 Dünnschicht-Resonator von Luftspaltbauart, Duplexer mit dem Resonator und deren Herstellungsverfahren

Country Status (2)

Country Link
KR (1) KR100498041B1 (de)
DE (1) DE602004029838D1 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100666693B1 (ko) 2004-11-23 2007-01-11 삼성전자주식회사 모놀리식 듀플렉서
KR100822469B1 (ko) * 2005-12-07 2008-04-16 삼성전자주식회사 복수개의 소자를 상호 격리시키기 위한 에어캐비티를구비한 시스템 온 칩 구조물, 듀플렉서, 및 그 제조 방법
JP6414559B2 (ja) * 2016-02-22 2018-10-31 株式会社村田製作所 スイッチ付ダイプレクサモジュールおよびダイプレクサモジュール
CN107231138A (zh) * 2016-12-29 2017-10-03 杭州左蓝微电子技术有限公司 带有支撑结构的薄膜体声波谐振器及其制备方法
CN107222181A (zh) * 2016-12-29 2017-09-29 杭州左蓝微电子技术有限公司 基于soi基片的薄膜体声波谐振器及其制备方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3567827B2 (ja) * 1999-11-02 2004-09-22 株式会社村田製作所 誘電体フィルタ、複合誘電体フィルタ、誘電体デュプレクサ、誘電体ダイプレクサおよび通信装置
KR100384399B1 (ko) * 2000-11-28 2003-05-22 주식회사 케이이씨 듀플렉서의 주파수 격리회로
KR100382765B1 (ko) * 2001-06-15 2003-05-09 삼성전자주식회사 송수신용 수동소자와 그 집적모듈 및 그 제조방법

Also Published As

Publication number Publication date
KR20040090891A (ko) 2004-10-27
KR100498041B1 (ko) 2005-07-01

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