DE602004000647D1 - Mikrolinsenraster - Google Patents

Mikrolinsenraster

Info

Publication number
DE602004000647D1
DE602004000647D1 DE602004000647T DE602004000647T DE602004000647D1 DE 602004000647 D1 DE602004000647 D1 DE 602004000647D1 DE 602004000647 T DE602004000647 T DE 602004000647T DE 602004000647 T DE602004000647 T DE 602004000647T DE 602004000647 D1 DE602004000647 D1 DE 602004000647D1
Authority
DE
Germany
Prior art keywords
microlens grid
microlens
grid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE602004000647T
Other languages
English (en)
Other versions
DE602004000647T2 (de
Inventor
Ichiro Suehiro
Naoki Sadayori
Yuji Hotta
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nitto Denko Corp
Original Assignee
Nitto Denko Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Denko Corp filed Critical Nitto Denko Corp
Publication of DE602004000647D1 publication Critical patent/DE602004000647D1/de
Application granted granted Critical
Publication of DE602004000647T2 publication Critical patent/DE602004000647T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0012—Arrays characterised by the manufacturing method
    • G02B3/0031—Replication or moulding, e.g. hot embossing, UV-casting, injection moulding
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/02—Polymeric products of isocyanates or isothiocyanates of isocyanates or isothiocyanates only
    • C08G18/025—Polymeric products of isocyanates or isothiocyanates of isocyanates or isothiocyanates only the polymeric products containing carbodiimide groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/71—Monoisocyanates or monoisothiocyanates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/72—Polyisocyanates or polyisothiocyanates
    • C08G18/721—Two or more polyisocyanates not provided for in one single group C08G18/73 - C08G18/80
    • C08G18/724—Combination of aromatic polyisocyanates with (cyclo)aliphatic polyisocyanates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/72—Polyisocyanates or polyisothiocyanates
    • C08G18/74—Polyisocyanates or polyisothiocyanates cyclic
    • C08G18/76—Polyisocyanates or polyisothiocyanates cyclic aromatic
    • C08G18/7607—Compounds of C08G18/7614 and of C08G18/7657
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G02B1/041—Lenses

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Polyurethanes Or Polyureas (AREA)
DE602004000647T 2003-01-17 2004-01-16 Mikrolinsenraster Expired - Fee Related DE602004000647T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003010408 2003-01-17
JP2003010408A JP4231702B2 (ja) 2003-01-17 2003-01-17 マイクロレンズアレイ

Publications (2)

Publication Number Publication Date
DE602004000647D1 true DE602004000647D1 (de) 2006-05-24
DE602004000647T2 DE602004000647T2 (de) 2006-09-07

Family

ID=32588575

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602004000647T Expired - Fee Related DE602004000647T2 (de) 2003-01-17 2004-01-16 Mikrolinsenraster

Country Status (4)

Country Link
US (1) US6961185B2 (de)
EP (1) EP1439406B1 (de)
JP (1) JP4231702B2 (de)
DE (1) DE602004000647T2 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TR200102665A2 (tr) * 2001-09-24 2003-04-21 Kapkin Koray Değişken görünümlü cam kaplama malzemesi.
JP4249996B2 (ja) * 2003-02-10 2009-04-08 日東電工株式会社 ポリカルボジイミド共重合体からなるレンズ材料
JP2005167092A (ja) * 2003-12-04 2005-06-23 Nitto Denko Corp 光半導体装置の製造方法
US7189591B2 (en) * 2003-12-19 2007-03-13 Nitto Denko Corporation Process for producing light-emitting semiconductor device
JP2006140362A (ja) * 2004-11-15 2006-06-01 Nitto Denko Corp 光半導体素子封止用シートおよび該シートを用いた光半導体装置の製造方法
CN100468814C (zh) * 2004-12-15 2009-03-11 鸿富锦精密工业（深圳）有限公司 有机发光显示器
KR101183928B1 (ko) * 2005-07-19 2012-10-11 삼성디스플레이 주식회사 액정표시장치의 제조방법
JP4345729B2 (ja) * 2005-08-31 2009-10-14 セイコーエプソン株式会社 マイクロレンズ基板、液晶パネルおよび投射型表示装置
JP2009202579A (ja) * 2008-02-01 2009-09-10 Seiko Epson Corp ラインヘッド用レンズアレイ、ラインヘッドおよび画像形成装置
JP2010054640A (ja) 2008-08-27 2010-03-11 Nitto Denko Corp マイクロレンズアレイ
US20110063725A1 (en) * 2009-09-17 2011-03-17 Eyesaver International Lenticular Display
JP2012230289A (ja) * 2011-04-27 2012-11-22 Seiko Epson Corp アレイ基板の製造方法及びアレイ基板並びにスクリーンの製造方法及びスクリーン
ES2573781T3 (es) * 2011-06-29 2016-06-10 Covestro Deutschland Ag Elastómeros de poliuretano de alta calidad y su preparación
JP6060106B2 (ja) * 2014-04-09 2017-01-11 富士フイルム株式会社 輝度向上膜、偏光板、および画像表示装置

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2802978A1 (de) 1978-01-24 1979-07-26 Bayer Ag Verwendung von aromatischen polyestern fuer optische geraeteteile
EP0351073B1 (de) * 1988-07-14 1994-09-21 MITSUI TOATSU CHEMICALS, Inc. Linse, ein Kunstharz mit hohem Brechungsindex enthaltend und Verfahren zur Herstellung der Linse
JP3289202B2 (ja) 1992-11-17 2002-06-04 オムロン株式会社 マイクロレンズアレイ、マイクロレンズ及びマイクロレンズの製造方法
JPH107794A (ja) * 1996-06-25 1998-01-13 Mitsui Petrochem Ind Ltd ポリカルボジイミド共重合体及びその製造方法
JPH1020295A (ja) * 1996-07-04 1998-01-23 Dainippon Printing Co Ltd 画像記録装置
EP1054270A4 (de) * 1996-07-22 2004-07-28 Maikurooputo Co Ltd Verfahren zur herstellung einer flachen platten-mikrolinse und flache platten-mikrolinse
JPH1060272A (ja) * 1996-08-16 1998-03-03 Nippon Polyurethane Ind Co Ltd カルボキシル基含有樹脂用ポリカルボジイミド硬化剤組成物、これを用いた接着剤及び塗料
JPH11211902A (ja) 1998-01-21 1999-08-06 Micro Opt:Kk 平板型マイクロレンズアレイ
JPH11326603A (ja) * 1998-05-19 1999-11-26 Seiko Epson Corp マイクロレンズアレイ及びその製造方法並びに表示装置
JP3824425B2 (ja) * 1998-06-17 2006-09-20 日本板硝子株式会社 平板型マイクロレンズアレイ
JP2000275405A (ja) 1999-03-29 2000-10-06 Canon Inc マイクロ構造体アレイの作製方法、マイクロレンズアレイ用金型の作製方法、及びこれを用いたマイクロレンズアレイの作製方法
JP2000304906A (ja) 1999-04-23 2000-11-02 Toppan Printing Co Ltd 固体撮像素子用マイクロレンズアレイ及びそれを用いた固体撮像素子
JP2000321675A (ja) * 1999-05-14 2000-11-24 Toppan Printing Co Ltd マイクロレンズアレイシートとその製造方法及びそのシートを用いた背面透過型スクリーン
JP2001201609A (ja) * 2000-01-19 2001-07-27 Nippon Sheet Glass Co Ltd 平板状マイクロレンズの製造方法及びこの方法で製造された平板状マイクロレンズ
JP2001272507A (ja) 2000-03-28 2001-10-05 Omron Corp マイクロレンズアレイ
JP2002196104A (ja) * 2000-12-27 2002-07-10 Seiko Epson Corp マイクロレンズアレイ及びその製造方法並びに光学装置

Also Published As

Publication number Publication date
JP4231702B2 (ja) 2009-03-04
EP1439406B1 (de) 2006-04-19
DE602004000647T2 (de) 2006-09-07
EP1439406A1 (de) 2004-07-21
US20040167310A1 (en) 2004-08-26
US6961185B2 (en) 2005-11-01
JP2004226431A (ja) 2004-08-12

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee