DE60136364D1 - Harze für resiste und chemisch verstärkte resistzusammensetzungen - Google Patents

Harze für resiste und chemisch verstärkte resistzusammensetzungen

Info

Publication number
DE60136364D1
DE60136364D1 DE60136364T DE60136364T DE60136364D1 DE 60136364 D1 DE60136364 D1 DE 60136364D1 DE 60136364 T DE60136364 T DE 60136364T DE 60136364 T DE60136364 T DE 60136364T DE 60136364 D1 DE60136364 D1 DE 60136364D1
Authority
DE
Germany
Prior art keywords
resistant
resin
chemically reinforced
compositions
resistant compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60136364T
Other languages
English (en)
Inventor
Tadayuki Fujiwara
Yukiya Wakisaka
Toru Tokimitsu
Naoshi Murata
Yoshihiro Kamon
Hikaru Momose
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Rayon Co Ltd
Original Assignee
Mitsubishi Rayon Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2000211381A external-priority patent/JP3953712B2/ja
Application filed by Mitsubishi Rayon Co Ltd filed Critical Mitsubishi Rayon Co Ltd
Application granted granted Critical
Publication of DE60136364D1 publication Critical patent/DE60136364D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F20/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
DE60136364T 2000-07-12 2001-02-09 Harze für resiste und chemisch verstärkte resistzusammensetzungen Expired - Lifetime DE60136364D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2000211381A JP3953712B2 (ja) 1999-07-12 2000-07-12 レジスト用樹脂および化学増幅型レジスト組成物
PCT/JP2001/000946 WO2002004532A1 (fr) 2000-07-12 2001-02-09 Resines pour reserves et compositions de reserve pouvant etre amplifiees chimiquement

Publications (1)

Publication Number Publication Date
DE60136364D1 true DE60136364D1 (de) 2008-12-11

Family

ID=18707497

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60136364T Expired - Lifetime DE60136364D1 (de) 2000-07-12 2001-02-09 Harze für resiste und chemisch verstärkte resistzusammensetzungen

Country Status (6)

Country Link
US (1) US6927011B2 (de)
EP (1) EP1304340B1 (de)
KR (1) KR100734712B1 (de)
DE (1) DE60136364D1 (de)
TW (1) TW526389B (de)
WO (1) WO2002004532A1 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004514952A (ja) 2000-11-29 2004-05-20 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー ポリマー中の保護基、フォトレジスト、およびマイクロリソグラフィー法
CN1802603A (zh) 2003-07-17 2006-07-12 霍尼韦尔国际公司 用于高级微电子应用的平面化薄膜及其生产装置和方法
CN103140551B (zh) * 2010-09-30 2016-06-29 Jsr株式会社 放射线敏感性树脂组合物、聚合物及化合物
KR20140055050A (ko) * 2012-10-30 2014-05-09 제일모직주식회사 레지스트 하층막용 조성물 및 상기 레지스트 하층막용 조성물을 사용한 패턴 형성 방법
WO2020008734A1 (ja) * 2018-07-06 2020-01-09 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法、樹脂

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2881969B2 (ja) 1990-06-05 1999-04-12 富士通株式会社 放射線感光レジストとパターン形成方法
KR100206664B1 (ko) * 1995-06-28 1999-07-01 세키사와 다다시 화학증폭형 레지스트 조성물 및 레지스트 패턴의 형성방법
KR100261022B1 (ko) 1996-10-11 2000-09-01 윤종용 화학증폭형 레지스트 조성물
CN1141325C (zh) 1996-10-29 2004-03-10 三菱丽阳株式会社 低双折射聚合物、其制备方法和光拾取透镜
JP3712218B2 (ja) * 1997-01-24 2005-11-02 東京応化工業株式会社 化学増幅型ホトレジスト組成物
JP3972438B2 (ja) 1998-01-26 2007-09-05 住友化学株式会社 化学増幅型のポジ型レジスト組成物
WO1999050322A1 (fr) * 1998-03-27 1999-10-07 Mitsubishi Rayon Co., Ltd. Copolymere, son procede de preparation et composition de produit de reserve
KR100263906B1 (ko) 1998-06-02 2000-09-01 윤종용 백본이 환상구조를 가지는 감광성 폴리머 및 이를 포함하는 레지스트 조성물
JP3042618B2 (ja) 1998-07-03 2000-05-15 日本電気株式会社 ラクトン構造を有する（メタ）アクリレート誘導体、重合体、フォトレジスト組成物、及びパターン形成方法
WO2000001684A1 (fr) * 1998-07-03 2000-01-13 Nec Corporation Derives de (meth)acrylate porteurs d'une structure lactone, compositions polymeres et photoresists et procede de formation de modeles a l'aide de ceux-ci
JP4131062B2 (ja) * 1998-09-25 2008-08-13 信越化学工業株式会社 新規なラクトン含有化合物、高分子化合物、レジスト材料及びパターン形成方法
KR100281903B1 (ko) 1998-12-24 2001-03-02 윤종용 백본이 환상 구조를가지는 감광성 폴리머 및 이를 포함하는 레지스트 조성물
JP2000241976A (ja) 1999-02-22 2000-09-08 Mitsubishi Rayon Co Ltd レジスト用（共）重合体およびそれを用いたレジスト組成物
WO2000058297A2 (en) * 1999-03-30 2000-10-05 E.I. Du Pont De Nemours And Company PROCESS FOR THE PREPARATION OF α-METHYLENE LACTONES
JP3953712B2 (ja) 1999-07-12 2007-08-08 三菱レイヨン株式会社 レジスト用樹脂および化学増幅型レジスト組成物
US6642346B2 (en) * 2000-02-28 2003-11-04 E. I. Du Pont De Nemours And Company Coating compositions containing substituted and unsubstituted exomethylene lactone or lactam monomers
US6723790B2 (en) * 2000-06-21 2004-04-20 E. I. Du Pont De Nemours And Company Blends of poly[α-methylenelact(one)(am] homo- and copolymers
KR20030065577A (ko) * 2000-12-29 2003-08-06 이 아이 듀폰 디 네모아 앤드 캄파니 알파-메틸렌 락톤 단독 중합체 및 공중합체 조성물,그로부터 제조된 시트와 물품, 및 그의 제조 방법
KR100408400B1 (ko) * 2001-02-22 2003-12-06 삼성전자주식회사 산에 의해 분해가능한 보호기를 갖는 락톤기를 포함하는감광성 모노머, 감광성 폴리머 및 화학증폭형 레지스트조성물

Also Published As

Publication number Publication date
TW526389B (en) 2003-04-01
EP1304340A1 (de) 2003-04-23
KR100734712B1 (ko) 2007-07-02
EP1304340A4 (de) 2007-05-02
KR20030079907A (ko) 2003-10-10
US20030148214A1 (en) 2003-08-07
EP1304340B1 (de) 2008-10-29
WO2002004532A1 (fr) 2002-01-17
US6927011B2 (en) 2005-08-09

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