DE60133751D1 - Generierung einer bibliothek von periodischen beugungsgittersignalen - Google Patents

Generierung einer bibliothek von periodischen beugungsgittersignalen

Info

Publication number
DE60133751D1
DE60133751D1 DE60133751T DE60133751T DE60133751D1 DE 60133751 D1 DE60133751 D1 DE 60133751D1 DE 60133751 T DE60133751 T DE 60133751T DE 60133751 T DE60133751 T DE 60133751T DE 60133751 D1 DE60133751 D1 DE 60133751D1
Authority
DE
Germany
Prior art keywords
library
generating
passage signals
periodic passage
periodic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60133751T
Other languages
English (en)
Other versions
DE60133751T2 (de
Inventor
Xinhui Niu
Nickhil Jakatdar
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TEL Timbre Technologies Inc
Original Assignee
TEL Timbre Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TEL Timbre Technologies Inc filed Critical TEL Timbre Technologies Inc
Publication of DE60133751D1 publication Critical patent/DE60133751D1/de
Application granted granted Critical
Publication of DE60133751T2 publication Critical patent/DE60133751T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F11/00—Error detection; Error correction; Monitoring
    • G06F11/22—Detection or location of defective computer hardware by testing during standby operation or during idle time, e.g. start-up testing
    • G06F11/26—Functional testing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70625—Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/705—Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Pathology (AREA)
  • Theoretical Computer Science (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Immunology (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • General Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Quality & Reliability (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
DE60133751T 2000-09-15 2001-09-06 Generierung einer bibliothek von periodischen beugungsgittersignalen Expired - Fee Related DE60133751T2 (de)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US23301700P 2000-09-15 2000-09-15
US233017P 2000-09-15
US09/907,488 US6943900B2 (en) 2000-09-15 2001-07-16 Generation of a library of periodic grating diffraction signals
US907488 2001-07-16
PCT/US2001/027552 WO2002023231A2 (en) 2000-09-15 2001-09-06 Generation of a library of periodic grating diffraction signals

Publications (2)

Publication Number Publication Date
DE60133751D1 true DE60133751D1 (de) 2008-06-05
DE60133751T2 DE60133751T2 (de) 2009-07-02

Family

ID=26926555

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60133751T Expired - Fee Related DE60133751T2 (de) 2000-09-15 2001-09-06 Generierung einer bibliothek von periodischen beugungsgittersignalen

Country Status (10)

Country Link
US (3) US6943900B2 (de)
EP (1) EP1319191B1 (de)
JP (1) JP3740534B2 (de)
KR (1) KR100499428B1 (de)
CN (1) CN1265215C (de)
AU (1) AU2001288775A1 (de)
DE (1) DE60133751T2 (de)
IL (2) IL149596A0 (de)
TW (1) TWI233058B (de)
WO (1) WO2002023231A2 (de)

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US20020035455A1 (en) 2002-03-21
US6943900B2 (en) 2005-09-13
EP1319191A2 (de) 2003-06-18
US20080249754A1 (en) 2008-10-09
WO2002023231A2 (en) 2002-03-21
US20050256687A1 (en) 2005-11-17
KR20020063184A (ko) 2002-08-01
WO2002023231A3 (en) 2003-03-27
CN1529827A (zh) 2004-09-15
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