AU2001288775A1 - Generation of a library of periodic grating diffraction signals - Google Patents

Generation of a library of periodic grating diffraction signals

Info

Publication number
AU2001288775A1
AU2001288775A1 AU2001288775A AU8877501A AU2001288775A1 AU 2001288775 A1 AU2001288775 A1 AU 2001288775A1 AU 2001288775 A AU2001288775 A AU 2001288775A AU 8877501 A AU8877501 A AU 8877501A AU 2001288775 A1 AU2001288775 A1 AU 2001288775A1
Authority
AU
Australia
Prior art keywords
library
generation
periodic grating
diffraction signals
grating diffraction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001288775A
Inventor
Nickhil Jakatdar
Xinhui Niu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TEL Timbre Technologies Inc
Original Assignee
TEL Timbre Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TEL Timbre Technologies Inc filed Critical TEL Timbre Technologies Inc
Publication of AU2001288775A1 publication Critical patent/AU2001288775A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70625—Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F11/00—Error detection; Error correction; Monitoring
    • G06F11/22—Detection or location of defective computer hardware by testing during standby operation or during idle time, e.g. start-up testing
    • G06F11/26—Functional testing
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/705—Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions
AU2001288775A 2000-09-15 2001-09-06 Generation of a library of periodic grating diffraction signals Abandoned AU2001288775A1 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US23301700P 2000-09-15 2000-09-15
US60/233,017 2000-09-15
US09/907,488 2001-07-16
US09/907,488 US6943900B2 (en) 2000-09-15 2001-07-16 Generation of a library of periodic grating diffraction signals
PCT/US2001/027552 WO2002023231A2 (en) 2000-09-15 2001-09-06 Generation of a library of periodic grating diffraction signals

Publications (1)

Publication Number Publication Date
AU2001288775A1 true AU2001288775A1 (en) 2002-03-26

Family

ID=26926555

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001288775A Abandoned AU2001288775A1 (en) 2000-09-15 2001-09-06 Generation of a library of periodic grating diffraction signals

Country Status (10)

Country Link
US (3) US6943900B2 (en)
EP (1) EP1319191B1 (en)
JP (1) JP3740534B2 (en)
KR (1) KR100499428B1 (en)
CN (1) CN1265215C (en)
AU (1) AU2001288775A1 (en)
DE (1) DE60133751T2 (en)
IL (2) IL149596A0 (en)
TW (1) TWI233058B (en)
WO (1) WO2002023231A2 (en)

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