DE60121302T2 - Form zur nanobedruckung - Google Patents

Form zur nanobedruckung Download PDF

Info

Publication number
DE60121302T2
DE60121302T2 DE60121302T DE60121302T DE60121302T2 DE 60121302 T2 DE60121302 T2 DE 60121302T2 DE 60121302 T DE60121302 T DE 60121302T DE 60121302 T DE60121302 T DE 60121302T DE 60121302 T2 DE60121302 T2 DE 60121302T2
Authority
DE
Germany
Prior art keywords
metal
mold
metal mold
group
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60121302T
Other languages
German (de)
English (en)
Other versions
DE60121302D1 (de
Inventor
Torbjörn LING
Lars Montelius
Babak Heidari
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Obducat AB
Original Assignee
Obducat AB
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from SE0000173A external-priority patent/SE517093C2/sv
Application filed by Obducat AB filed Critical Obducat AB
Application granted granted Critical
Publication of DE60121302D1 publication Critical patent/DE60121302D1/de
Publication of DE60121302T2 publication Critical patent/DE60121302T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/887—Nanoimprint lithography, i.e. nanostamp

Landscapes

  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
DE60121302T 2000-01-21 2001-01-19 Form zur nanobedruckung Expired - Lifetime DE60121302T2 (de)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US17728400P 2000-01-21 2000-01-21
SE0000173 2000-01-21
SE0000173A SE517093C2 (sv) 2000-01-21 2000-01-21 Form för nanoprägling
US177284P 2000-01-21
PCT/SE2001/000087 WO2001053889A1 (en) 2000-01-21 2001-01-19 A mold for nano imprinting

Publications (2)

Publication Number Publication Date
DE60121302D1 DE60121302D1 (de) 2006-08-17
DE60121302T2 true DE60121302T2 (de) 2007-06-28

Family

ID=26654958

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60121302T Expired - Lifetime DE60121302T2 (de) 2000-01-21 2001-01-19 Form zur nanobedruckung

Country Status (6)

Country Link
US (1) US6923930B2 (US20030127580A1-20030710-C00010.png)
EP (1) EP1257878B1 (US20030127580A1-20030710-C00010.png)
AT (1) ATE332517T1 (US20030127580A1-20030710-C00010.png)
AU (1) AU2001228987A1 (US20030127580A1-20030710-C00010.png)
DE (1) DE60121302T2 (US20030127580A1-20030710-C00010.png)
WO (1) WO2001053889A1 (US20030127580A1-20030710-C00010.png)

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KR100827741B1 (ko) 2000-07-17 2008-05-07 보드 오브 리전츠, 더 유니버시티 오브 텍사스 시스템 임프린트 리소그래피 공정을 위한 자동 유체 분배 방법 및시스템
EP1352295B1 (en) 2000-10-12 2015-12-23 Board of Regents, The University of Texas System Template for room temperature, low pressure micro- and nano-imprint lithography
SE519573C2 (sv) * 2001-07-05 2003-03-11 Obducat Ab Stamp med antividhäftningsskikt samt sätt att framställa och sätt att reparera en sådan stamp
US7037639B2 (en) 2002-05-01 2006-05-02 Molecular Imprints, Inc. Methods of manufacturing a lithography template
AU2003239022A1 (en) * 2002-06-20 2004-01-06 Obducat Ab Mold tool method of manufacturing a mold tool and storage medium formed by use of the mold tool
WO2004045858A1 (en) * 2002-11-21 2004-06-03 Council Of Scientific And Industrial Research Colored nanolithography on glass and plastic substrates
US8268446B2 (en) 2003-09-23 2012-09-18 The University Of North Carolina At Chapel Hill Photocurable perfluoropolyethers for use as novel materials in microfluidic devices
ATE501464T1 (de) * 2003-11-21 2011-03-15 Obducat Ab Nanoimprint lithographie in mehrschichtsystemem
US9040090B2 (en) 2003-12-19 2015-05-26 The University Of North Carolina At Chapel Hill Isolated and fixed micro and nano structures and methods thereof
AU2004318602B2 (en) 2003-12-19 2009-12-10 The University Of North Carolina At Chapel Hill Methods for fabricating isolated micro- and nano- structures using soft or imprint lithography
KR100595515B1 (ko) * 2003-12-31 2006-07-03 엘지전자 주식회사 미세 구조물 성형용 금형 및 미세 구조 성형용 금형의단층막 이형제 코팅 방법
DE102004002851A1 (de) * 2004-01-19 2005-08-11 Maschinenfabrik Rieter Ag Vliesführungseinrichtung einer Kämmmaschine
US20070275193A1 (en) * 2004-02-13 2007-11-29 Desimone Joseph M Functional Materials and Novel Methods for the Fabrication of Microfluidic Devices
US7730834B2 (en) * 2004-03-04 2010-06-08 Asml Netherlands B.V. Printing apparatus and device manufacturing method
WO2005119360A1 (en) * 2004-05-28 2005-12-15 Obducat Ab Modified metal mold for use in imprinting processes
EP1600811A1 (en) * 2004-05-28 2005-11-30 Obducat AB Modified metal molds for use in imprinting processes
US20050272599A1 (en) * 2004-06-04 2005-12-08 Kenneth Kramer Mold release layer
JP2005353725A (ja) * 2004-06-09 2005-12-22 Shinko Electric Ind Co Ltd 基板上への能動素子の形成方法および基板
TWI240328B (en) * 2004-08-27 2005-09-21 Univ Nat Cheng Kung Pretreatment process of substrate in micro-nano imprinting technology
US7676088B2 (en) * 2004-12-23 2010-03-09 Asml Netherlands B.V. Imprint lithography
US7490547B2 (en) * 2004-12-30 2009-02-17 Asml Netherlands B.V. Imprint lithography
US20060144274A1 (en) * 2004-12-30 2006-07-06 Asml Netherlands B.V. Imprint lithography
US20060144814A1 (en) * 2004-12-30 2006-07-06 Asml Netherlands B.V. Imprint lithography
US7686970B2 (en) * 2004-12-30 2010-03-30 Asml Netherlands B.V. Imprint lithography
US7354698B2 (en) * 2005-01-07 2008-04-08 Asml Netherlands B.V. Imprint lithography
WO2006084202A2 (en) * 2005-02-03 2006-08-10 The University Of North Carolina At Chapel Hill Low surface energy polymeric material for use in liquid crystal displays
US7922474B2 (en) * 2005-02-17 2011-04-12 Asml Netherlands B.V. Imprint lithography
US7523701B2 (en) * 2005-03-07 2009-04-28 Asml Netherlands B.V. Imprint lithography method and apparatus
US7611348B2 (en) * 2005-04-19 2009-11-03 Asml Netherlands B.V. Imprint lithography
US7762186B2 (en) * 2005-04-19 2010-07-27 Asml Netherlands B.V. Imprint lithography
US7767129B2 (en) * 2005-05-11 2010-08-03 Micron Technology, Inc. Imprint templates for imprint lithography, and methods of patterning a plurality of substrates
US7442029B2 (en) * 2005-05-16 2008-10-28 Asml Netherlands B.V. Imprint lithography
US20060267231A1 (en) * 2005-05-27 2006-11-30 Asml Netherlands B.V. Imprint lithography
US7692771B2 (en) * 2005-05-27 2010-04-06 Asml Netherlands B.V. Imprint lithography
US7708924B2 (en) * 2005-07-21 2010-05-04 Asml Netherlands B.V. Imprint lithography
US7418902B2 (en) * 2005-05-31 2008-09-02 Asml Netherlands B.V. Imprint lithography including alignment
US7377764B2 (en) * 2005-06-13 2008-05-27 Asml Netherlands B.V. Imprint lithography
US20070023976A1 (en) * 2005-07-26 2007-02-01 Asml Netherlands B.V. Imprint lithography
WO2007133235A2 (en) * 2005-08-08 2007-11-22 Liquidia Technologies, Inc. Micro and nano-structure metrology
EP2537657A3 (en) 2005-08-09 2016-05-04 The University of North Carolina At Chapel Hill Methods and materials for fabricating microfluidic devices
KR100693992B1 (ko) 2005-08-20 2007-03-12 이헌 자기정렬단일층의 이형코팅이 용이한 니켈 스탬프 및제조방법
US8011915B2 (en) * 2005-11-04 2011-09-06 Asml Netherlands B.V. Imprint lithography
US7878791B2 (en) * 2005-11-04 2011-02-01 Asml Netherlands B.V. Imprint lithography
US20070138699A1 (en) * 2005-12-21 2007-06-21 Asml Netherlands B.V. Imprint lithography
US7517211B2 (en) * 2005-12-21 2009-04-14 Asml Netherlands B.V. Imprint lithography
US8015939B2 (en) 2006-06-30 2011-09-13 Asml Netherlands B.V. Imprintable medium dispenser
US8318253B2 (en) * 2006-06-30 2012-11-27 Asml Netherlands B.V. Imprint lithography
US7388661B2 (en) * 2006-10-20 2008-06-17 Hewlett-Packard Development Company, L.P. Nanoscale structures, systems, and methods for use in nano-enhanced raman spectroscopy (NERS)
US7391511B1 (en) 2007-01-31 2008-06-24 Hewlett-Packard Development Company, L.P. Raman signal-enhancing structures and Raman spectroscopy systems including such structures
WO2008118861A2 (en) * 2007-03-23 2008-10-02 The University Of North Carolina At Chapel Hill Discrete size and shape specific organic nanoparticles designed to elicit an immune response
US20100304087A1 (en) * 2007-06-04 2010-12-02 Maruzen Petrochemical Co., Ltd Mold, Fine Pattern Product, and Method of Manufacturing Those
US20080315459A1 (en) * 2007-06-21 2008-12-25 3M Innovative Properties Company Articles and methods for replication of microstructures and nanofeatures
US20090041986A1 (en) * 2007-06-21 2009-02-12 3M Innovative Properties Company Method of making hierarchical articles
US20090114618A1 (en) * 2007-06-21 2009-05-07 3M Innovative Properties Company Method of making hierarchical articles
US20090038636A1 (en) * 2007-08-09 2009-02-12 Asml Netherlands B.V. Cleaning method
US7854877B2 (en) 2007-08-14 2010-12-21 Asml Netherlands B.V. Lithography meandering order
US8144309B2 (en) 2007-09-05 2012-03-27 Asml Netherlands B.V. Imprint lithography
EP2563453B1 (en) 2010-04-28 2017-02-08 Kimberly-Clark Worldwide, Inc. Nanopatterned medical device with enhanced cellular interaction and method for its forming
US8945688B2 (en) 2011-01-03 2015-02-03 General Electric Company Process of forming a material having nano-particles and a material having nano-particles
KR20140079429A (ko) 2011-10-27 2014-06-26 킴벌리-클라크 월드와이드, 인크. 생체활성 제제를 전달하기 위한 이식형 기구

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NL8401922A (nl) * 1984-06-18 1986-01-16 Philips Nv Matrijs en werkwijze voor de vervaardiging van producten uit polyurethaan en verlichtingsarmatuur vervaardigd volgens de werkwijze.
JPH0580530A (ja) 1991-09-24 1993-04-02 Hitachi Ltd 薄膜パターン製造方法
US5358604A (en) 1992-09-29 1994-10-25 Microelectronics And Computer Technology Corp. Method for producing conductive patterns
US5512131A (en) 1993-10-04 1996-04-30 President And Fellows Of Harvard College Formation of microstamped patterns on surfaces and derivative articles
US6309580B1 (en) 1995-11-15 2001-10-30 Regents Of The University Of Minnesota Release surfaces, particularly for use in nanoimprint lithography
US5772905A (en) 1995-11-15 1998-06-30 Regents Of The University Of Minnesota Nanoimprint lithography
DE19815130A1 (de) 1998-04-03 1999-10-14 Bosch Gmbh Robert Herstellung eines metallischen Stempels zur Definition von Nanostrukturen
US6656398B2 (en) * 2001-06-19 2003-12-02 Corning Incorporated Process of making a pattern in a film
US6743368B2 (en) * 2002-01-31 2004-06-01 Hewlett-Packard Development Company, L.P. Nano-size imprinting stamp using spacer technique
US6829988B2 (en) * 2003-05-16 2004-12-14 Suss Microtec, Inc. Nanoimprinting apparatus and method

Also Published As

Publication number Publication date
WO2001053889A1 (en) 2001-07-26
EP1257878B1 (en) 2006-07-05
DE60121302D1 (de) 2006-08-17
US20030127580A1 (en) 2003-07-10
AU2001228987A1 (en) 2001-07-31
EP1257878A1 (en) 2002-11-20
ATE332517T1 (de) 2006-07-15
US6923930B2 (en) 2005-08-02

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