ATE501464T1 - Nanoimprint lithographie in mehrschichtsystemem - Google Patents

Nanoimprint lithographie in mehrschichtsystemem

Info

Publication number
ATE501464T1
ATE501464T1 AT03078683T AT03078683T ATE501464T1 AT E501464 T1 ATE501464 T1 AT E501464T1 AT 03078683 T AT03078683 T AT 03078683T AT 03078683 T AT03078683 T AT 03078683T AT E501464 T1 ATE501464 T1 AT E501464T1
Authority
AT
Austria
Prior art keywords
substrate
nanoimprint lithography
mould
layer system
pattern
Prior art date
Application number
AT03078683T
Other languages
English (en)
Inventor
Babak Heidari
Marc Beck
Original Assignee
Obducat Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Obducat Ab filed Critical Obducat Ab
Application granted granted Critical
Publication of ATE501464T1 publication Critical patent/ATE501464T1/de

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
    • B81C1/00444—Surface micromachining, i.e. structuring layers on the substrate
    • B81C1/0046—Surface micromachining, i.e. structuring layers on the substrate using stamping, e.g. imprinting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/56—Coatings, e.g. enameled or galvanised; Releasing, lubricating or separating agents
    • B29C33/60—Releasing, lubricating or separating agents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Composite Materials (AREA)
  • Materials Engineering (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
AT03078683T 2003-11-21 2003-11-21 Nanoimprint lithographie in mehrschichtsystemem ATE501464T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP03078683A EP1533657B1 (de) 2003-11-21 2003-11-21 Nanoimprint Lithographie in Mehrschichtsystemem

Publications (1)

Publication Number Publication Date
ATE501464T1 true ATE501464T1 (de) 2011-03-15

Family

ID=34429454

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03078683T ATE501464T1 (de) 2003-11-21 2003-11-21 Nanoimprint lithographie in mehrschichtsystemem

Country Status (4)

Country Link
US (2) US20060040058A1 (de)
EP (1) EP1533657B1 (de)
AT (1) ATE501464T1 (de)
DE (1) DE60336322D1 (de)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20120105062A (ko) 2003-12-19 2012-09-24 더 유니버시티 오브 노쓰 캐롤라이나 엣 채플 힐 소프트 또는 임프린트 리소그래피를 이용하여 분리된 마이크로- 및 나노- 구조를 제작하는 방법
US9040090B2 (en) 2003-12-19 2015-05-26 The University Of North Carolina At Chapel Hill Isolated and fixed micro and nano structures and methods thereof
CN101604124B (zh) * 2005-06-08 2011-07-27 佳能株式会社 模子、图案形成方法以及图案形成设备
JP4290177B2 (ja) * 2005-06-08 2009-07-01 キヤノン株式会社 モールド、アライメント方法、パターン形成装置、パターン転写装置、及びチップの製造方法
US7854873B2 (en) 2005-06-10 2010-12-21 Obducat Ab Imprint stamp comprising cyclic olefin copolymer
ATE419560T1 (de) 2005-06-10 2009-01-15 Obducat Ab Kopieren eines musters mit hilfe eines zwischenstempels
US7759407B2 (en) 2005-07-22 2010-07-20 Molecular Imprints, Inc. Composition for adhering materials together
US8557351B2 (en) 2005-07-22 2013-10-15 Molecular Imprints, Inc. Method for adhering materials together
US8846195B2 (en) 2005-07-22 2014-09-30 Canon Nanotechnologies, Inc. Ultra-thin polymeric adhesion layer
US8808808B2 (en) 2005-07-22 2014-08-19 Molecular Imprints, Inc. Method for imprint lithography utilizing an adhesion primer layer
WO2007046110A1 (en) * 2005-10-19 2007-04-26 Indian Institute Of Technology, Kanpur A method and apparatus for the formation of patterns on surfaces and an assembly and alignment of the structure thereof
US7862756B2 (en) * 2006-03-30 2011-01-04 Asml Netherland B.V. Imprint lithography
US7780431B2 (en) * 2006-09-14 2010-08-24 Hewlett-Packard Development Company, L.P. Nanoimprint molds and methods of forming the same
EP2199049A4 (de) * 2007-09-13 2014-08-27 Asahi Glass Co Ltd TiO2-HALTIGES QUARZGLASSUBSTRAT
KR101502933B1 (ko) * 2008-07-17 2015-03-16 에이전시 포 사이언스, 테크놀로지 앤드 리서치 고분자 구조체 위의 임프린트 형성 방법
US8361546B2 (en) 2008-10-30 2013-01-29 Molecular Imprints, Inc. Facilitating adhesion between substrate and patterned layer
EP2199854B1 (de) 2008-12-19 2015-12-16 Obducat AB Hybridpolymerform für nanoimprintverfahren und verfahren zu seiner herstellung
EP2199855B1 (de) 2008-12-19 2016-07-20 Obducat Verfahren und Prozesse zur Modifizierung von Polymermaterialoberflächeninteraktionen
US20110165412A1 (en) * 2009-11-24 2011-07-07 Molecular Imprints, Inc. Adhesion layers in nanoimprint lithograhy
WO2013010111A2 (en) 2011-07-13 2013-01-17 University Of Utah Research Foundation Nanoimprint lithography
EP2892638A4 (de) 2012-09-06 2016-06-01 Univ Colorado Regents Filtrationsmembranen mit strukturen in nanomassstab
DE102012112550A1 (de) * 2012-12-18 2014-06-18 Lpkf Laser & Electronics Ag Verfahren zur Metallisierung eines Werkstücks sowie ein Schichtaufbau aus einem Werkstück und einer Metallschicht
CN104625559B (zh) * 2015-01-08 2017-03-15 哈尔滨工业大学 一种金属微热压印成形模具装置及方法
EP3596544B1 (de) * 2017-03-16 2021-09-22 Université d'Aix-Marseille Nano-imprint-lithografieverfahren und daraus erhältliches, strukturiertes substrat
CN108931884A (zh) * 2017-05-27 2018-12-04 蓝思科技（长沙）有限公司 压印膜及压印装置
JP2024521012A (ja) * 2021-04-30 2024-05-28 マジック リープ， インコーポレイテッド 曲面に対するインプリントリソグラフィプロセスおよび方法
US12353128B2 (en) * 2021-06-03 2025-07-08 Viavi Solutions Inc. Method of replicating a microstructure pattern
JP7737105B2 (ja) * 2021-07-06 2025-09-10 信越化学工業株式会社 再生インプリントモールドの製造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3972924A (en) * 1975-03-24 1976-08-03 The United States Of America As Represented By The Secretary Of Agriculture 1-(1H,1H-perfluorooctyl)-1,3-trimethylenediphosphonic tetrachloride
US5277788A (en) * 1990-10-01 1994-01-11 Aluminum Company Of America Twice-anodized aluminum article having an organo-phosphorus monolayer and process for making the article
US6309580B1 (en) * 1995-11-15 2001-10-30 Regents Of The University Of Minnesota Release surfaces, particularly for use in nanoimprint lithography
US6284345B1 (en) * 1997-12-08 2001-09-04 Washington University Designer particles of micron and submicron dimension
US6517995B1 (en) * 1999-09-14 2003-02-11 Massachusetts Institute Of Technology Fabrication of finely featured devices by liquid embossing
SE515607C2 (sv) * 1999-12-10 2001-09-10 Obducat Ab Anordning och metod vid tillverkning av strukturer
US6923930B2 (en) * 2000-01-21 2005-08-02 Obducat Aktiebolag Mold for nano imprinting
JP2002270541A (ja) * 2001-03-08 2002-09-20 Matsushita Electric Ind Co Ltd モールド、モールドの製造方法及びパターン形成方法
WO2003000236A1 (en) * 2001-06-23 2003-01-03 Lyotropic Therapeutics, Inc Particles with improved solubilization capacity
US20030017424A1 (en) * 2001-07-18 2003-01-23 Miri Park Method and apparatus for fabricating complex grating structures
US6824882B2 (en) * 2002-05-31 2004-11-30 3M Innovative Properties Company Fluorinated phosphonic acids

Also Published As

Publication number Publication date
US20060040058A1 (en) 2006-02-23
EP1533657B1 (de) 2011-03-09
EP1533657A1 (de) 2005-05-25
DE60336322D1 (de) 2011-04-21
US20080138460A1 (en) 2008-06-12

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