DE60036145D1 - Anlage zur Abgasidentifizierung - Google Patents

Anlage zur Abgasidentifizierung

Info

Publication number
DE60036145D1
DE60036145D1 DE60036145T DE60036145T DE60036145D1 DE 60036145 D1 DE60036145 D1 DE 60036145D1 DE 60036145 T DE60036145 T DE 60036145T DE 60036145 T DE60036145 T DE 60036145T DE 60036145 D1 DE60036145 D1 DE 60036145D1
Authority
DE
Germany
Prior art keywords
gas
generator
source
plant
exhaust gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60036145T
Other languages
English (en)
Other versions
DE60036145T2 (de
Inventor
Eric Chevalier
Philippe Maquin
Roland Bernard
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Alcatel Lucent SAS
Original Assignee
Alcatel Lucent SAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alcatel Lucent SAS filed Critical Alcatel Lucent SAS
Publication of DE60036145D1 publication Critical patent/DE60036145D1/de
Application granted granted Critical
Publication of DE60036145T2 publication Critical patent/DE60036145T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/66Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence
    • G01N21/68Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence using high frequency electric fields

Landscapes

  • Health & Medical Sciences (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
  • Automatic Analysis And Handling Materials Therefor (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Chemical Vapour Deposition (AREA)
DE60036145T 1999-01-22 2000-01-13 Anlage zur Abgasidentifizierung Expired - Lifetime DE60036145T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR9900723A FR2788854B1 (fr) 1999-01-22 1999-01-22 Systeme et procede d'identification d'effluents gazeux, equipement pourvu d'un tel systeme
FR9900723 1999-01-22

Publications (2)

Publication Number Publication Date
DE60036145D1 true DE60036145D1 (de) 2007-10-11
DE60036145T2 DE60036145T2 (de) 2008-05-21

Family

ID=9541144

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60036145T Expired - Lifetime DE60036145T2 (de) 1999-01-22 2000-01-13 Anlage zur Abgasidentifizierung

Country Status (6)

Country Link
US (1) US6643014B2 (de)
EP (1) EP1022559B1 (de)
JP (2) JP2000214092A (de)
AT (1) ATE371858T1 (de)
DE (1) DE60036145T2 (de)
FR (1) FR2788854B1 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109959647A (zh) * 2019-04-17 2019-07-02 广东省新材料研究所 一种光谱诊断辅助装置

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6791692B2 (en) * 2000-11-29 2004-09-14 Lightwind Corporation Method and device utilizing plasma source for real-time gas sampling
GB0101835D0 (en) * 2001-01-24 2001-03-07 Casect Ltd Analysable package
US7123361B1 (en) 2003-03-05 2006-10-17 Verionix Incorporated Microplasma emission spectrometer
JP5404984B2 (ja) * 2003-04-24 2014-02-05 東京エレクトロン株式会社 プラズマモニタリング方法、プラズマモニタリング装置及びプラズマ処理装置
US7072028B2 (en) * 2003-07-25 2006-07-04 Lightwind Corporation Method and apparatus for chemical monitoring
FR2865314B1 (fr) * 2004-01-20 2006-04-28 Cit Alcatel Station de controle et de purge de mini-environnement
US7309842B1 (en) 2004-03-19 2007-12-18 Verionix Incorporated Shielded monolithic microplasma source for prevention of continuous thin film formation
DE102004061269A1 (de) * 2004-12-10 2006-06-14 Siemens Ag Verfahren zum Reinigen eines Werkstückes mit Halogenionen
FR2880105B1 (fr) * 2004-12-23 2007-04-20 Cie Financiere Alcatel Sa Dispositif et procede de pilotage de l'operation de deshydratation durant un traitement de lyophilisation
FR2887072A1 (fr) * 2005-06-08 2006-12-15 Alcatel Sa Systeme spectographique ameliore avec source plasma
GB2441582A (en) * 2006-09-01 2008-03-12 Gencoa Ltd Process monitoring and control
US20080090310A1 (en) * 2006-10-13 2008-04-17 Tokyo Electron Limited Substrate processing apparatus and substrate processing termination detection method
FR2907219B1 (fr) * 2006-10-17 2008-12-12 Alcatel Sa Caracterisation de gaz par spectrometrie optique a emission
US9997325B2 (en) 2008-07-17 2018-06-12 Verity Instruments, Inc. Electron beam exciter for use in chemical analysis in processing systems
FR2955927B1 (fr) * 2010-02-01 2012-04-06 Alcatel Lucent Dispositif et procede de pilotage d'une operation de deshydratation durant un traitement de lyophilisation
CN103048377B (zh) * 2011-10-17 2015-06-10 中国科学院化学研究所 极紫外(euv)光刻胶超高真空热处理检测装置与方法
CA2905931C (en) 2013-03-13 2021-10-26 Radom Corporation Microwave plasma spectrometer using dielectric resonator
DE102014000343A1 (de) * 2014-01-11 2015-07-16 Dräger Safety AG & Co. KGaA Gasmessgerät
ES2589964B1 (es) * 2015-04-17 2017-09-05 Abengoa Solar New Technologies, S.A. Sistema y método de análisis del gas presente en el espacio interanular de receptores solares de tubo
US10337998B2 (en) 2017-02-17 2019-07-02 Radom Corporation Plasma generator assembly for mass spectroscopy
KR101931324B1 (ko) * 2017-09-14 2018-12-20 (주)나노텍 셀프 플라즈마 챔버의 오염 억제 장치
CN111197157A (zh) * 2018-11-16 2020-05-26 长鑫存储技术有限公司 具有工艺腔室实时监控功能的半导体制造装置

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3521959A (en) * 1967-08-29 1970-07-28 Atomic Energy Commission Method for direct spectrographic analysis of molten metals
US3843257A (en) * 1971-11-30 1974-10-22 Monsanto Res Corp Microwave-excited emission detector
US3958883A (en) * 1974-07-10 1976-05-25 Baird-Atomic, Inc. Radio frequency induced plasma excitation of optical emission spectroscopic samples
DE2649912A1 (de) * 1975-11-28 1977-06-08 Macourt Trennung und analyse von teilchenueberzuegen
US4629887A (en) * 1983-03-08 1986-12-16 Allied Corporation Plasma excitation system
JPH01129140A (ja) * 1987-11-16 1989-05-22 Hitachi Ltd プラズマ発光分光分析装置
JP2675561B2 (ja) * 1987-12-18 1997-11-12 株式会社日立製作所 プラズマ微量元素分折装置
JPH01227048A (ja) * 1988-03-08 1989-09-11 Fujitsu Ltd 粒子組成分析装置
US4857136A (en) * 1988-06-23 1989-08-15 John Zajac Reactor monitoring system and method
JPH0754293B2 (ja) * 1989-01-09 1995-06-07 横河電機株式会社 微粒子測定装置
JPH0411460U (de) * 1990-05-22 1992-01-30
US5671045A (en) * 1993-10-22 1997-09-23 Masachusetts Institute Of Technology Microwave plasma monitoring system for the elemental composition analysis of high temperature process streams
DE19505104A1 (de) * 1995-02-15 1996-08-22 Patent Treuhand Ges Fuer Elektrische Gluehlampen Mbh Verfahren und Anordnung zur Bestimmung der Reinheit und/oder des Drucks von Gasen für elektrische Lampen
JP3571404B2 (ja) * 1995-03-03 2004-09-29 アネルバ株式会社 プラズマcvd装置及びその場クリーニング後処理方法
US5825485A (en) * 1995-11-03 1998-10-20 Cohn; Daniel R. Compact trace element sensor which utilizes microwave generated plasma and which is portable by an individual
DE19544506C2 (de) * 1995-11-29 2000-08-10 Peter R Perzl Vorrichtung und Verfahren zur Analyse von Flüssigkeitszusammensetzungen mit Hilfe direkter Glimmentladung
US5986747A (en) * 1998-09-24 1999-11-16 Applied Materials, Inc. Apparatus and method for endpoint detection in non-ionizing gaseous reactor environments
US6366346B1 (en) * 1998-11-19 2002-04-02 Applied Materials, Inc. Method and apparatus for optical detection of effluent composition

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109959647A (zh) * 2019-04-17 2019-07-02 广东省新材料研究所 一种光谱诊断辅助装置

Also Published As

Publication number Publication date
ATE371858T1 (de) 2007-09-15
US20030160956A1 (en) 2003-08-28
US6643014B2 (en) 2003-11-04
FR2788854A1 (fr) 2000-07-28
EP1022559B1 (de) 2007-08-29
EP1022559A1 (de) 2000-07-26
JP2000214092A (ja) 2000-08-04
FR2788854B1 (fr) 2001-05-04
JP2010078616A (ja) 2010-04-08
DE60036145T2 (de) 2008-05-21

Similar Documents

Publication Publication Date Title
DE60036145D1 (de) Anlage zur Abgasidentifizierung
DE60101209D1 (de) Verfahren und Vorrichtung zur sequentiellen Plasmabehandlung
EP0819317A4 (de) Gerat zur erregung einer elektrodenlosen lampe durch mikrowellenstrahlung
BR9608565A (pt) Aparelho de pulverização de plasma acionado por microondas e processo de pulvirização
TW377452B (en) Method and apparatus for powering an electrodeless lamp with reduced radio frequency interference
KR970071945A (ko) 플라즈마처리방법 및 장치
GB2264808A (en) Plasma mass spectrometer
ATE271717T1 (de) Vorrichtung zur erzeugung von leistungsfähigen mikrowellenplasmen
WO2002044687A3 (en) Method and device utilizing plasma source for real-time gas sampling
AU2003230264A1 (en) Plasma assisted dry processing
EP0702393A3 (de) Plasmabearbeitungsgerät zur Mikrowellen-Einstrahlung aus einem rechteckigen Wellenleiter durch einem langgestrekten Schlitz in der Plasmakammer
TW200509247A (en) Surface wave plasma treatment apparatus using multi-slot antenna
ATE187033T1 (de) Vorrichtung zur erzeugung von plasmen mittels mikrowellen
EP0395798A3 (de) Mikrowellenresonanzhohlraum
ATE223616T1 (de) Vorrichtung zur erzeugung angeregter/ionisierter teilchen in einem plasma
WO2001022783A3 (en) Apparatus and method for generating ultraviolet radiation
Tuszewski et al. A Pulsed Inductively Coupled Plasma Source for Atomic Hydrogen Ion Implantation
JPH03236231A (ja) 半導体集積回路製造装置
IT1194332B (it) Composti atti al trattamento terapeutico delle alternazioni biliari,in particolare della bile litogena e dei calcoli colesterolici e composizioni farmaceutiche che li contengono
IT1194286B (it) Composto ad attivita' gabaergica
IT1194397B (it) Struttura elettrodica per reazioni elettrochimiche con sviluppo di gas
IT1193542B (it) Procedimento e macchina a crochet per la formazione di un tessuto a maglia con fili di ordito intrecciati,e tessuto cosi' ottenuto
JPS6481224A (en) Dry etching device
IT1194390B (it) Chemioterapico delle vie urinarie
IT1194493B (it) Derivato chinolonico

Legal Events

Date Code Title Description
8364 No opposition during term of opposition